Fengyuan Lai

Person

Tualatin, OR, US

People

Patents Grantslast 30 patents

Information Patent Grant
Oxidation resistant protective layer in chamber conditioning
- Patent number 11,761,079
- Issue date Sep 19, 2023
- Lam Research Corporation
- Fengyuan Lai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ex situ coating of chamber components for semiconductor processing
- Patent number 11,365,479
- Issue date Jun 21, 2022
- Lam Research Corporation
- Damodar Shanbhag
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ex situ coating of chamber components for semiconductor processing
- Patent number 10,760,158
- Issue date Sep 1, 2020
- Lam Research Corporation
- Damodar Shanbhag
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Remote plasma based deposition of graded or multi-layered silicon c...
- Patent number 10,297,442
- Issue date May 21, 2019
- Lam Research Corporation
- Bhadri N. Varadarajan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Densification of silicon carbide film using remote plasma treatment
- Patent number 9,837,270
- Issue date Dec 5, 2017
- Lam Research Corporation
- Bhadri N. Varadarajan
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
OXIDATION RESISTANT PROTECTIVE LAYER IN CHAMBER CONDITIONING
- Publication number 20230383401
- Publication date Nov 30, 2023
- LAM RESEARCH CORPORATION
- Fengyuan LAI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
EX SITU COATING OF CHAMBER COMPONENTS FOR SEMICONDUCTOR PROCESSING
- Publication number 20230002891
- Publication date Jan 5, 2023
- LAM RESEARCH CORPORATION
- Damodar Rajaram SHANBHAG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
EX SITU COATING OF CHAMBER COMPONENTS FOR SEMICONDUCTOR PROCESSING
- Publication number 20220275504
- Publication date Sep 1, 2022
- LAM RESEARCH CORPORATION
- Damodar Rajaram SHANBHAG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SixNy AS A NUCLEATION LAYER FOR SiCxOy
- Publication number 20220235463
- Publication date Jul 28, 2022
- LAM RESEARCH CORPORATION
- Guangbi Yuan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
OXIDATION RESISTANT PROTECTIVE LAYER IN CHAMBER CONDITIONING
- Publication number 20210164097
- Publication date Jun 3, 2021
- LAM RESEARCH CORPORATION
- Fengyuan Lai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EX SITU COATING OF CHAMBER COMPONENTS FOR SEMICONDUCTOR PROCESSING
- Publication number 20200347497
- Publication date Nov 5, 2020
- LAM RESEARCH CORPORATION
- Damodar Shanbhag
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
EX SITU COATING OF CHAMBER COMPONENTS FOR SEMICONDUCTOR PROCESSING
- Publication number 20190185999
- Publication date Jun 20, 2019
- LAM RESEARCH CORPORATION
- Damodar Shanbhag
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
REMOTE PLASMA BASED DEPOSITION OF GRADED OR MULTI-LAYERED SILICON C...
- Publication number 20180240664
- Publication date Aug 23, 2018
- LAM RESEARCH CORPORATION
- Bhadri N. Varadarajan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
REMOTE PLASMA BASED DEPOSITION OF GRADED OR MULTI-LAYERED SILICON C...
- Publication number 20180096842
- Publication date Apr 5, 2018
- LAM RESEARCH CORPORATION
- Bhadri N. Varadarajan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Fengyuan Lai

Person

Patents Grantslast 30 patents

Oxidation resistant protective layer in chamber conditioning

Ex situ coating of chamber components for semiconductor processing

Ex situ coating of chamber components for semiconductor processing

Remote plasma based deposition of graded or multi-layered silicon c...

Densification of silicon carbide film using remote plasma treatment

Patents Applicationslast 30 patents

OXIDATION RESISTANT PROTECTIVE LAYER IN CHAMBER CONDITIONING

EX SITU COATING OF CHAMBER COMPONENTS FOR SEMICONDUCTOR PROCESSING

EX SITU COATING OF CHAMBER COMPONENTS FOR SEMICONDUCTOR PROCESSING

SixNy AS A NUCLEATION LAYER FOR SiCxOy

OXIDATION RESISTANT PROTECTIVE LAYER IN CHAMBER CONDITIONING

EX SITU COATING OF CHAMBER COMPONENTS FOR SEMICONDUCTOR PROCESSING

EX SITU COATING OF CHAMBER COMPONENTS FOR SEMICONDUCTOR PROCESSING

REMOTE PLASMA BASED DEPOSITION OF GRADED OR MULTI-LAYERED SILICON C...

REMOTE PLASMA BASED DEPOSITION OF GRADED OR MULTI-LAYERED SILICON C...