Frank Goodwin

Person

Clifton Park, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Extreme ultraviolet (EUV) lithography mask
- Patent number 10,802,393
- Issue date Oct 13, 2020
- GLOBALFOUNDRIES Inc.
- Lei Sun
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of identifying space within integrated circuit structure as...
- Patent number 10,622,266
- Issue date Apr 14, 2020
- GLOBALFOUNDRIES Inc.
- Erik A. Verduijn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Extreme ultraviolet mirrors and masks with improved reflectivity
- Patent number 10,468,149
- Issue date Nov 5, 2019
- GLOBALFOUNDRIES Inc.
- Yulu Chen
- G02 - OPTICS
Information Patent Grant
EUVL process structure fabrication methods
- Patent number 8,865,376
- Issue date Oct 21, 2014
- Sematech, Inc.
- Vibhu Jindal
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Plasma as a band pass filter for photo lithography
- Patent number 8,493,546
- Issue date Jul 23, 2013
- Sematech, Inc.
- Francis Goodwin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fluids for immersion lithography systems
- Patent number 7,291,569
- Issue date Nov 6, 2007
- Infineon Technologies AG
- Francis Goodwin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Closing disk for immersion head
- Patent number 7,286,205
- Issue date Oct 23, 2007
- Infineon Technologies AG
- Francis Goodwin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and arrangement for controlling focus parameters of an expos...
- Patent number 7,279,258
- Issue date Oct 9, 2007
- Infineon Technologies Richmond, LP
- Francis Goodwin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Measuring flare in semiconductor lithography
- Patent number 7,096,127
- Issue date Aug 22, 2006
- Infineon Technologies AG
- David Ziger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of determining the overlay accuracy of multiple patterns for...
- Patent number 6,948,149
- Issue date Sep 20, 2005
- Infineon Technologies, AG
- Francis Goodwin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming a gate contact in a semiconductor device
- Patent number 6,927,462
- Issue date Aug 9, 2005
- Infineon Technologes Richmond, LP
- Francis Goodwin
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MASK
- Publication number 20190113836
- Publication date Apr 18, 2019
- GLOBALFOUNDRIES INC.
- Lei SUN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS OF IDENTIFYING SPACE WITHIN INTEGRATED CIRCUIT STRUCTURE AS...
- Publication number 20180286681
- Publication date Oct 4, 2018
- GLOBALFOUNDRIES INC.
- Erik A. Verduijn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXTREME ULTRAVIOLET MIRRORS AND MASKS WITH IMPROVED REFLECTIVITY
- Publication number 20180226166
- Publication date Aug 9, 2018
- GLOBALFOUNDRIES INC.
- Yulu Chen
- G02 - OPTICS
Information Patent Application
EUVL PROCESS STRUCTURE FABRICATION METHODS
- Publication number 20140255828
- Publication date Sep 11, 2014
- Intel Corporation
- Vibhu JINDAL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Plasma as a Band Pass Filter for Photo Lithography
- Publication number 20110149260
- Publication date Jun 23, 2011
- Francis Goodwin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Inspection systems and methods
- Publication number 20080119060
- Publication date May 22, 2008
- Francis Goodwin
- G02 - OPTICS
Information Patent Application
Inspection systems and methods
- Publication number 20080078941
- Publication date Apr 3, 2008
- Francis Goodwin
- G01 - MEASURING TESTING
Information Patent Application
Lithography systems and methods
- Publication number 20070287073
- Publication date Dec 13, 2007
- Francis Goodwin
- G02 - OPTICS
Information Patent Application
Dynamic memory
- Publication number 20070189067
- Publication date Aug 16, 2007
- Francis Goodwin
- G11 - INFORMATION STORAGE
Information Patent Application
Debris apparatus, system, and method
- Publication number 20070182943
- Publication date Aug 9, 2007
- Francis Goodwin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Fluids for immersion lithography systems
- Publication number 20070004234
- Publication date Jan 4, 2007
- Francis Goodwin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Closing disk for immersion head
- Publication number 20060238900
- Publication date Oct 26, 2006
- Francis Goodwin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Measuring flare in semiconductor lithography
- Publication number 20060080046
- Publication date Apr 13, 2006
- David Ziger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and arrangement for controlling focus parameters of an expos...
- Publication number 20050202327
- Publication date Sep 15, 2005
- Francis Goodwin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF DETERMINING THE OVERLAY ACCURACY OF MULTIPLE PATTERNS FOR...
- Publication number 20050188342
- Publication date Aug 25, 2005
- Francis Goodwin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of forming a gate contact in a semiconductor device
- Publication number 20040043592
- Publication date Mar 4, 2004
- Infineon Technologies Richmond, LP
- Francis Goodwin
- H01 - BASIC ELECTRIC ELEMENTS

Frank Goodwin

Person

Patents Grantslast 30 patents

Extreme ultraviolet (EUV) lithography mask

Methods of identifying space within integrated circuit structure as...

Extreme ultraviolet mirrors and masks with improved reflectivity

EUVL process structure fabrication methods

Plasma as a band pass filter for photo lithography

Fluids for immersion lithography systems

Closing disk for immersion head

Method and arrangement for controlling focus parameters of an expos...

Measuring flare in semiconductor lithography

Method of determining the overlay accuracy of multiple patterns for...

Method of forming a gate contact in a semiconductor device

Patents Applicationslast 30 patents

EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MASK

METHODS OF IDENTIFYING SPACE WITHIN INTEGRATED CIRCUIT STRUCTURE AS...

EXTREME ULTRAVIOLET MIRRORS AND MASKS WITH IMPROVED REFLECTIVITY

EUVL PROCESS STRUCTURE FABRICATION METHODS

Plasma as a Band Pass Filter for Photo Lithography

Inspection systems and methods

Inspection systems and methods

Lithography systems and methods

Dynamic memory

Debris apparatus, system, and method

Fluids for immersion lithography systems

Closing disk for immersion head

Measuring flare in semiconductor lithography

Method and arrangement for controlling focus parameters of an expos...

METHOD OF DETERMINING THE OVERLAY ACCURACY OF MULTIPLE PATTERNS FOR...

Method of forming a gate contact in a semiconductor device