Frank L Schadt III

Person

Wilmington, DE, US

People

Patents Grantslast 30 patents

Information Patent Grant
Process and materials for making contained layers and devices made...
- Patent number 9,312,485
- Issue date Apr 12, 2016
- E. I. Du Pont de Nemours and Company
- Adam Fennimore
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for membrane protection during reactive ion/plasma etching p...
- Patent number 8,431,491
- Issue date Apr 30, 2013
- E. I. Du Pont de Nemours and Company
- Chester E. Balut
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fluorinated polymers, photoresists and processes for microlithography
- Patent number 6,790,587
- Issue date Sep 14, 2004
- E. I. Du Pont de Nemours and Company
- Andrew Edward Feiring
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Nitrile/fluoroalcohol-containing photoresists and associated proces...
- Patent number 6,503,686
- Issue date Jan 7, 2003
- E. I. Du Pont de Nemours and Company
- Michael Fryd
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Flexible, flame-retardant, aqueous-processable photoimageable compo...
- Patent number 6,218,074
- Issue date Apr 17, 2001
- E. I. Du Pont de Nemours and Company
- Thomas Eugene Dueber
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Solvent dispersible interpenetrating polymer networks
- Patent number 5,985,998
- Issue date Nov 16, 1999
- E. I. Du Pont de Nemours and Company
- Eugene G. Sommerfeld
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Solvent dispersible interpenetrating polymer networks
- Patent number 5,886,101
- Issue date Mar 23, 1999
- E. I. Du Pont de Nemours and Company
- Eugene G. Sommerfeld
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Flexible, aqueous processable, photoimageable permanent coatings fo...
- Patent number 5,728,505
- Issue date Mar 17, 1998
- E. I. Du Pont de Nemours and Company
- Thomas Eugene Dueber
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Aqueous processable, multilayer, photoimageable permanent coatings...
- Patent number 5,643,657
- Issue date Jul 1, 1997
- E. I. Du Pont de Nemours and Company
- Thomas Eugene Dueber
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photographic element with antistatic polymers
- Patent number 4,810,624
- Issue date Mar 7, 1989
- E. I. DuPont de Nemours and Company
- William M. Hardam
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Crosslinkable antistatic polymers and their manufacture
- Patent number 4,668,748
- Issue date May 26, 1987
- E. I. Du Pont de Nemours and Company
- William M. Hardam
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Low coating weight silver halide element
- Patent number 4,460,679
- Issue date Jul 17, 1984
- E. I. Du Pont de Nemours and Company
- Frank L. Schadt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Dye mordanting development
- Patent number 4,383,023
- Issue date May 10, 1983
- E. I. Du Pont de Nemours and Company
- Frank L. Schadt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photographic element in which the antistatic layer is interlinked i...
- Patent number 4,225,665
- Issue date Sep 30, 1980
- E. I. Du Pont de Nemours and Company
- Frank L. Schadt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PROCESS AND MATERIALS FOR MAKING CONTAINED LAYERS AND DEVICES MADE...
- Publication number 20150318476
- Publication date Nov 5, 2015
- E.I. du Pont de Nemours and Company
- Adam FENNIMORE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INKJET INK COMPRISING ENCAPSULATED PIGMENT DISPERSIONS WITH TWO ENC...
- Publication number 20140249248
- Publication date Sep 4, 2014
- E I DU PONT DE NEMOURS AND COMPANY
- Hee Hyun Lee
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD OF PREPARING ENCAPSULATED PIGMENT DISPERSIONS WITH TWO ENCAP...
- Publication number 20140243449
- Publication date Aug 28, 2014
- E I DU PONT DE NEMOURS AND COMPANY
- Hee Hyun Lee
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Photoroesists Comprising Polymers Derived From Fluoroalcohol-Substi...
- Publication number 20070207413
- Publication date Sep 6, 2007
- Michael Karl Crawford
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Hydrofluoroalkanesulfonic acids from fluorovinyl ethers
- Publication number 20060276670
- Publication date Dec 7, 2006
- Christopher P. Junk
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Photoresist compositions and processes for preparing the same
- Publication number 20060247400
- Publication date Nov 2, 2006
- James R. Sounik
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Photoresists, fluoropolymers and processes for 157 nm microlithography
- Publication number 20050239984
- Publication date Oct 27, 2005
- Andrew E. Feiring
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Fluorinated polymers, photoresists and processes for microlithography
- Publication number 20050203262
- Publication date Sep 15, 2005
- Andrew Edward Feiring
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Protecting groups in polymers, photoresists and processes for micro...
- Publication number 20050191579
- Publication date Sep 1, 2005
- Andrew E. Feiring
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Low-polydispersity photoimageable acrylic polymers, photoresists an...
- Publication number 20050119378
- Publication date Jun 2, 2005
- William Brown Farnham
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Low-polydispersity photoimageable polymers and photoresists and pro...
- Publication number 20050112495
- Publication date May 26, 2005
- Andrew Edward Feiring
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Halo resistent, photoimagable coverlay compositions, having advanta...
- Publication number 20050079442
- Publication date Apr 14, 2005
- Thomas E. Dueber
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PREPARATION AND USE OF EXO-2-FLUOROALKYL(BICYCLO[2.2.1] HEPT-5-ENES)
- Publication number 20050058932
- Publication date Mar 17, 2005
- Andrew Edward Feiring
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Photoresists and processes for microlithography
- Publication number 20050058940
- Publication date Mar 17, 2005
- Frank Leonard Schadt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Fluorinated polymers, photoresists and processes for microlithography
- Publication number 20040265738
- Publication date Dec 30, 2004
- Andrew Edward Feiring
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Photoresist compositions and processes for preparing the same
- Publication number 20040248039
- Publication date Dec 9, 2004
- James R. Sounik
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Photoresist compositions and processes for preparing the same
- Publication number 20040242798
- Publication date Dec 2, 2004
- James R. Sounik
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Fluorinated polymers having ester groups and photoresists for micro...
- Publication number 20040180287
- Publication date Sep 16, 2004
- Andrew E Feiring
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Polymers blends and their use in photoresist compositions for micro...
- Publication number 20040137360
- Publication date Jul 15, 2004
- Larry L Berger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoresists with hydroxylated, photoacid-cleavable groups
- Publication number 20040126697
- Publication date Jul 1, 2004
- William Brown Farnham
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoacid generators in photoresist compositions for microlithography
- Publication number 20040106062
- Publication date Jun 3, 2004
- Viacheslav Alexandrovich Petrov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Polycyclic fluorine-containing polymers and photoresists for microl...
- Publication number 20040092686
- Publication date May 13, 2004
- Andrew E Feiring
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Multilayer elements containing photoresist compositions and their u...
- Publication number 20040038151
- Publication date Feb 26, 2004
- Larry L Berger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoresists, polymers and processes for microlithography
- Publication number 20040023150
- Publication date Feb 5, 2004
- Andrew E. Feiring
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Protecting groups in polymers, photoresists and processes for micro...
- Publication number 20040023157
- Publication date Feb 5, 2004
- Adrew E Feiring
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Copolymers for photoresists and processes therefor
- Publication number 20030215735
- Publication date Nov 20, 2003
- Robert Clayton Wheland
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Frank L Schadt III

Person

Patents Grantslast 30 patents

Process and materials for making contained layers and devices made...

Method for membrane protection during reactive ion/plasma etching p...

Fluorinated polymers, photoresists and processes for microlithography

Nitrile/fluoroalcohol-containing photoresists and associated proces...

Flexible, flame-retardant, aqueous-processable photoimageable compo...

Solvent dispersible interpenetrating polymer networks

Solvent dispersible interpenetrating polymer networks

Flexible, aqueous processable, photoimageable permanent coatings fo...

Aqueous processable, multilayer, photoimageable permanent coatings...

Photographic element with antistatic polymers

Crosslinkable antistatic polymers and their manufacture

Low coating weight silver halide element

Dye mordanting development

Photographic element in which the antistatic layer is interlinked i...

Patents Applicationslast 30 patents

PROCESS AND MATERIALS FOR MAKING CONTAINED LAYERS AND DEVICES MADE...

INKJET INK COMPRISING ENCAPSULATED PIGMENT DISPERSIONS WITH TWO ENC...

METHOD OF PREPARING ENCAPSULATED PIGMENT DISPERSIONS WITH TWO ENCAP...

Photoroesists Comprising Polymers Derived From Fluoroalcohol-Substi...

Hydrofluoroalkanesulfonic acids from fluorovinyl ethers

Photoresist compositions and processes for preparing the same

Photoresists, fluoropolymers and processes for 157 nm microlithography

Fluorinated polymers, photoresists and processes for microlithography

Protecting groups in polymers, photoresists and processes for micro...

Low-polydispersity photoimageable acrylic polymers, photoresists an...

Low-polydispersity photoimageable polymers and photoresists and pro...

Halo resistent, photoimagable coverlay compositions, having advanta...

PREPARATION AND USE OF EXO-2-FLUOROALKYL(BICYCLO[2.2.1] HEPT-5-ENES)

Photoresists and processes for microlithography

Fluorinated polymers, photoresists and processes for microlithography

Photoresist compositions and processes for preparing the same

Photoresist compositions and processes for preparing the same

Fluorinated polymers having ester groups and photoresists for micro...

Polymers blends and their use in photoresist compositions for micro...

Photoresists with hydroxylated, photoacid-cleavable groups

Photoacid generators in photoresist compositions for microlithography

Polycyclic fluorine-containing polymers and photoresists for microl...

Multilayer elements containing photoresist compositions and their u...

Photoresists, polymers and processes for microlithography

Protecting groups in polymers, photoresists and processes for micro...

Copolymers for photoresists and processes therefor