Frank Laske

Person

Weilburg, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Device feature specific edge placement error (EPE)
- Patent number 12,092,966
- Issue date Sep 17, 2024
- KLA Corporation
- Amnon Manassen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multi-stage, multi-zone substrate positioning systems
- Patent number 11,637,030
- Issue date Apr 25, 2023
- KLA Corporation
- Yoram Uziel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metrology and control of overlay and edge placement errors
- Patent number 10,533,848
- Issue date Jan 14, 2020
- KLA-Tencor Corporation
- Andrei V. Shchegrov
- G01 - MEASURING TESTING
Information Patent Grant
Systems and methods for device-correlated overlay metrology
- Patent number 10,474,040
- Issue date Nov 12, 2019
- KLA-Tencor Corporation
- Frank Laske
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Overlay measurements of overlapping target structures based on symm...
- Patent number 10,473,460
- Issue date Nov 12, 2019
- KLA-Tencor Corporation
- Nadav Gutman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for measuring positions of structures on a substrate and com...
- Patent number 10,337,852
- Issue date Jul 2, 2019
- KLA-Tencor Corporation
- Oliver Ache
- G01 - MEASURING TESTING
Information Patent Grant
Method and computer program product for controlling the positioning...
- Patent number 10,303,153
- Issue date May 28, 2019
- KLA-Tencor Corporation
- Slawomir Czerkas
- G05 - CONTROLLING REGULATING
Information Patent Grant
Apparatus and method for the measurement of pattern placement and s...
- Patent number 10,185,800
- Issue date Jan 22, 2019
- KLA-Tencor Corporation
- Stefan Eyring
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Measurement of overlay and edge placement errors with an electron b...
- Patent number 10,141,156
- Issue date Nov 27, 2018
- KLA-Tencor Corporation
- Mark Allen Neil
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for drift compensation on an electron beam based...
- Patent number 9,892,885
- Issue date Feb 13, 2018
- KLA-Tencor Corporation
- Frank Laske
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for correcting position measurements for optical errors and...
- Patent number 9,704,238
- Issue date Jul 11, 2017
- KLA-Tencor Corporation
- Stefan Eyring
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for measuring positions of structures on a mask and thereby...
- Patent number 9,424,636
- Issue date Aug 23, 2016
- KLA-Tencor Corporation
- Frank Laske
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for correcting position measurements for optical errors and...
- Patent number 9,201,312
- Issue date Dec 1, 2015
- KLA-Tencor Corporation
- Stefan Eyring
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Unique mark and method to determine critical dimension uniformity a...
- Patent number 8,804,137
- Issue date Aug 12, 2014
- KLA-Tencor Corporation
- DongSub Choi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for the reproducible determination of the position of struct...
- Patent number 8,352,886
- Issue date Jan 8, 2013
- KLA-Tencor MIE GmbH
- Frank Laske
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Device and method for determining an optical property of a mask
- Patent number 7,864,319
- Issue date Jan 4, 2011
- Vistec Semiconductor System GmbH
- Hans-Artur Boesser
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
DEVICE FEATURE SPECIFIC EDGE PLACEMENT ERROR (EPE)
- Publication number 20240168391
- Publication date May 23, 2024
- KLA Corporation
- Amnon Manassen
- G01 - MEASURING TESTING
Information Patent Application
HIGH-RESOLUTION EVALUATION OF OPTICAL METROLOGY TARGETS FOR PROCESS...
- Publication number 20240094639
- Publication date Mar 21, 2024
- KLA Corporation
- Nadav Gutman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR ACQUIRING ALIGNMENT MEASUREMENTS OF STRUCTURE...
- Publication number 20240093985
- Publication date Mar 21, 2024
- KLA Corporation
- Nimrod Shuall
- G01 - MEASURING TESTING
Information Patent Application
Image Modeling-Assisted Contour Extraction
- Publication number 20230420278
- Publication date Dec 28, 2023
- KLA Corporation
- Stefan Eyring
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DESIGN-ASSISTED LARGE FIELD OF VIEW METROLOGY
- Publication number 20230108539
- Publication date Apr 6, 2023
- Stefan Eyring
- G01 - MEASURING TESTING
Information Patent Application
Multi-Stage, Multi-Zone Substrate Positioning Systems
- Publication number 20200402827
- Publication date Dec 24, 2020
- KLA Corporation
- Yoram Uziel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Metrology and Control of Overlay and Edge Placement Errors
- Publication number 20190271542
- Publication date Sep 5, 2019
- KLA-Tencor Corporation
- Andrei V. Shchegrov
- G01 - MEASURING TESTING
Information Patent Application
METHOD FOR MEASURING POSITIONS OF STRUCTURES ON A SUBSTRATE AND COM...
- Publication number 20190186893
- Publication date Jun 20, 2019
- KLA-Tencor Corporation
- Oliver Ache
- G01 - MEASURING TESTING
Information Patent Application
Overlay Measurements of Overlapping Target Structures Based on Symm...
- Publication number 20190178639
- Publication date Jun 13, 2019
- KLA-Tencor Corporation
- Nadav Gutman
- G01 - MEASURING TESTING
Information Patent Application
SYSTEMS AND METHODS FOR DEVICE-CORRELATED OVERLAY METROLOGY
- Publication number 20190179231
- Publication date Jun 13, 2019
- KLA-Tencor Corporation
- Frank Laske
- G01 - MEASURING TESTING
Information Patent Application
Apparatus and Method for the Measurement of Pattern Placement and S...
- Publication number 20180165404
- Publication date Jun 14, 2018
- KLA-Tencor Corporation
- Stefan Eyring
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method and Computer Program Product for Controlling the Positioning...
- Publication number 20180120807
- Publication date May 3, 2018
- KLA-Tencor Corporation
- Slawomir Czerkas
- G05 - CONTROLLING REGULATING
Information Patent Application
Measurement of Overlay and Edge Placement Errors With an Electron B...
- Publication number 20180090296
- Publication date Mar 29, 2018
- KLA-Tencor Corporation
- Mark Allen Neil
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and Method for Drift Compensation on an Electron Beam Based...
- Publication number 20170278666
- Publication date Sep 28, 2017
- KLA-Tencor Corporation
- Frank Laske
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR CORRECTING POSITION MEASUREMENTS FOR OPTICAL ERRORS AND...
- Publication number 20160078609
- Publication date Mar 17, 2016
- KLA-Tencor Corporation
- Stefan Eyring
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD, SYSTEM AND COMPUTER PROGRAM PRODUCT FOR GENERATING HIGH DEN...
- Publication number 20150310160
- Publication date Oct 29, 2015
- KLA-Tencor Corporation
- Frank LASKE
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR MEASURING POSITIONS OF STRUCTURES ON A MASK AND THEREBY...
- Publication number 20150248756
- Publication date Sep 3, 2015
- KLA-Tencor Corporation
- Frank LASKE
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR CORRECTING POSITION MEASUREMENTS FOR OPTICAL ERRORS AND...
- Publication number 20140307949
- Publication date Oct 16, 2014
- Stefan Eyring
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method for the Reproducible Determination of the Position of Struct...
- Publication number 20110225554
- Publication date Sep 15, 2011
- KLA-TENCOR MIE GMBH
- Frank Laske
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
UNIQUE MARK AND METHOD TO DETERMINE CRITICAL DIMENSION UNIFORMITY A...
- Publication number 20110051150
- Publication date Mar 3, 2011
- KLA-Tencor Corporation
- DongSub Choi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Device and method for determining an optical property of a mask
- Publication number 20090066955
- Publication date Mar 12, 2009
- Vistec Semiconductor Systems GmbH
- Hans-Artur Boesser
- G01 - MEASURING TESTING

Frank Laske

Person

Patents Grantslast 30 patents

Device feature specific edge placement error (EPE)

Multi-stage, multi-zone substrate positioning systems

Metrology and control of overlay and edge placement errors

Systems and methods for device-correlated overlay metrology

Overlay measurements of overlapping target structures based on symm...

Method for measuring positions of structures on a substrate and com...

Method and computer program product for controlling the positioning...

Apparatus and method for the measurement of pattern placement and s...

Measurement of overlay and edge placement errors with an electron b...

System and method for drift compensation on an electron beam based...

Method for correcting position measurements for optical errors and...

Method for measuring positions of structures on a mask and thereby...

Method for correcting position measurements for optical errors and...

Unique mark and method to determine critical dimension uniformity a...

Method for the reproducible determination of the position of struct...

Device and method for determining an optical property of a mask

Patents Applicationslast 30 patents

DEVICE FEATURE SPECIFIC EDGE PLACEMENT ERROR (EPE)

HIGH-RESOLUTION EVALUATION OF OPTICAL METROLOGY TARGETS FOR PROCESS...

SYSTEM AND METHOD FOR ACQUIRING ALIGNMENT MEASUREMENTS OF STRUCTURE...

Image Modeling-Assisted Contour Extraction

DESIGN-ASSISTED LARGE FIELD OF VIEW METROLOGY

Multi-Stage, Multi-Zone Substrate Positioning Systems

Metrology and Control of Overlay and Edge Placement Errors

METHOD FOR MEASURING POSITIONS OF STRUCTURES ON A SUBSTRATE AND COM...

Overlay Measurements of Overlapping Target Structures Based on Symm...

SYSTEMS AND METHODS FOR DEVICE-CORRELATED OVERLAY METROLOGY

Apparatus and Method for the Measurement of Pattern Placement and S...

Method and Computer Program Product for Controlling the Positioning...

Measurement of Overlay and Edge Placement Errors With an Electron B...

System and Method for Drift Compensation on an Electron Beam Based...

METHOD FOR CORRECTING POSITION MEASUREMENTS FOR OPTICAL ERRORS AND...

METHOD, SYSTEM AND COMPUTER PROGRAM PRODUCT FOR GENERATING HIGH DEN...

METHOD FOR MEASURING POSITIONS OF STRUCTURES ON A MASK AND THEREBY...

METHOD FOR CORRECTING POSITION MEASUREMENTS FOR OPTICAL ERRORS AND...

Method for the Reproducible Determination of the Position of Struct...

UNIQUE MARK AND METHOD TO DETERMINE CRITICAL DIMENSION UNIFORMITY A...

Device and method for determining an optical property of a mask