Fred C. Redeker

Person

Alameda, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Roller for location-specific wafer polishing
- Patent number 12,194,591
- Issue date Jan 14, 2025
- Applied Materials, Inc.
- Ekaterina A. Mikhaylichenko
- B24 - GRINDING POLISHING
Information Patent Grant
Roller for location-specific wafer polishing
- Patent number 12,138,733
- Issue date Nov 12, 2024
- Applied Materials, Inc.
- Ekaterina A. Mikhaylichenko
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing articles and integrated system and methods for manufactur...
- Patent number 12,023,853
- Issue date Jul 2, 2024
- Applied Materials, Inc.
- Kasiraman Krishnan
- B24 - GRINDING POLISHING
Information Patent Grant
Integrated abrasive polishing pads and manufacturing methods
- Patent number 11,980,992
- Issue date May 14, 2024
- Applied Materials, Inc.
- Ashavani Kumar
- B24 - GRINDING POLISHING
Information Patent Grant
CMP pad construction with composite material properties using addit...
- Patent number 11,958,162
- Issue date Apr 16, 2024
- Applied Materials, Inc.
- Rajeev Bajaj
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing system with annular platen or polishing pad
- Patent number 11,780,046
- Issue date Oct 10, 2023
- Applied Materials, Inc.
- Paul D. Butterfield
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing system with support post and annular platen or polishing pad
- Patent number 11,511,388
- Issue date Nov 29, 2022
- Applied Materials, Inc.
- Paul D. Butterfield
- B24 - GRINDING POLISHING
Information Patent Grant
Integrated abrasive polishing pads and manufacturing methods
- Patent number 11,471,999
- Issue date Oct 18, 2022
- Applied Materials, Inc.
- Ashavani Kumar
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Precursor formulations for polishing pads produced by an additive m...
- Patent number 11,446,788
- Issue date Sep 20, 2022
- Applied Materials, Inc.
- Rajeev Bajaj
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pads produced by an additive manufacturing process
- Patent number 10,875,145
- Issue date Dec 29, 2020
- Applied Materials, Inc.
- Rajeev Bajaj
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pads produced by an additive manufacturing process
- Patent number 10,821,573
- Issue date Nov 3, 2020
- Applied Materials, Inc.
- Rajeev Bajaj
- B33 - ADDITIVE MANUFACTURING TECHNOLOGY
Information Patent Grant
Multi-layered nano-fibrous CMP pads
- Patent number 10,800,000
- Issue date Oct 13, 2020
- Applied Materials, Inc.
- Robert D. Tolles
- B24 - GRINDING POLISHING
Information Patent Grant
Thin plastic polishing article for CMP applications
- Patent number 10,786,885
- Issue date Sep 29, 2020
- Applied Materials, Inc.
- Robert D. Tolles
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing system with annular platen or polishing pad for substrate...
- Patent number 10,562,147
- Issue date Feb 18, 2020
- Applied Materials, Inc.
- Paul D. Butterfield
- B24 - GRINDING POLISHING
Information Patent Grant
CMP pad construction with composite material properties using addit...
- Patent number 10,537,974
- Issue date Jan 21, 2020
- Applied Materials, Inc.
- Rajeev Bajaj
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing articles and integrated system and methods for manufactur...
- Patent number 10,493,691
- Issue date Dec 3, 2019
- Applied Materials, Inc.
- Kasiraman Krishnan
- B24 - GRINDING POLISHING
Information Patent Grant
Porous chemical mechanical polishing pads
- Patent number 10,456,886
- Issue date Oct 29, 2019
- Applied Materials, Inc.
- Sivapackia Ganapathiappan
- B33 - ADDITIVE MANUFACTURING TECHNOLOGY
Information Patent Grant
Polishing pads produced by an additive manufacturing process
- Patent number 10,384,330
- Issue date Aug 20, 2019
- Applied Materials, Inc.
- Rajeev Bajaj
- B24 - GRINDING POLISHING
Information Patent Grant
Printed chemical mechanical polishing pad
- Patent number 10,322,491
- Issue date Jun 18, 2019
- Applied Materials, Inc.
- Mahendra Christopher Orilall
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate features for inductive monitoring of conductive trench depth
- Patent number 10,199,281
- Issue date Feb 5, 2019
- Applied Materials, Inc.
- Wei Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a UV curable CMP polishing pad
- Patent number 10,086,500
- Issue date Oct 2, 2018
- Applied Materials, Inc.
- Mahendra Christopher Orilall
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Substrate features for inductive monitoring of conductive trench depth
- Patent number 9,911,664
- Issue date Mar 6, 2018
- Applied Materials, Inc.
- Wei Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
CMP pad construction with composite material properties using addit...
- Patent number 9,873,180
- Issue date Jan 23, 2018
- Applied Materials, Inc.
- Rajeev Bajaj
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Polishing articles and integrated system and methods for manufactur...
- Patent number 9,776,361
- Issue date Oct 3, 2017
- Applied Materials, Inc.
- Kasiraman Krishnan
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
CMP pads having material composition that facilitates controlled co...
- Patent number 9,669,512
- Issue date Jun 6, 2017
- Applied Materials, Inc.
- Rajeev Bajaj
- B24 - GRINDING POLISHING
Information Patent Grant
Conditioning of grooving in polishing pads
- Patent number 9,486,893
- Issue date Nov 8, 2016
- Applied Materials, Inc.
- Hung Chen
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Material for cleaning a substrate
- Patent number 8,716,210
- Issue date May 6, 2014
- Lam Research Corporation
- Erik M. Freer
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Method and apparatus for cleaning a substrate using non-newtonian f...
- Patent number 8,671,959
- Issue date Mar 18, 2014
- Lam Research Corporation
- John M. de Larios
- B08 - CLEANING
Information Patent Grant
Method for removing contamination from a substrate and for making a...
- Patent number 8,608,859
- Issue date Dec 17, 2013
- Lam Research Corporation
- Erik M. Freer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for cleaning a semiconductor substrate
- Patent number 8,591,662
- Issue date Nov 26, 2013
- Lam Research Corporation
- Erik M. Freer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
POROUS CHEMICAL MECHANICAL POLISHING PADS
- Publication number 20230330805
- Publication date Oct 19, 2023
- Applied Materials, Inc.
- Sivapackia GANAPATHIAPPAN
- B24 - GRINDING POLISHING
Information Patent Application
INTEGRATED ABRASIVE POLISHING PADS AND MANUFACTURING METHODS
- Publication number 20230052048
- Publication date Feb 16, 2023
- Applied Materials, Inc.
- Ashavani KUMAR
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
POLISHING SYSTEM WITH ANNULAR PLATEN OR POLISHING PAD
- Publication number 20220410335
- Publication date Dec 29, 2022
- Applied Materials, Inc.
- Paul D. Butterfield
- B24 - GRINDING POLISHING
Information Patent Application
ROLLER FOR LOCATION-SPECIFIC WAFER POLISHING
- Publication number 20220281062
- Publication date Sep 8, 2022
- Applied Materials, Inc.
- Ekaterina A. Mikhaylichenko
- B24 - GRINDING POLISHING
Information Patent Application
CMP PAD CONSTRUCTION WITH COMPOSITE MATERIAL PROPERTIES USING ADDIT...
- Publication number 20200147750
- Publication date May 14, 2020
- Applied Materials, Inc.
- Rajeev BAJAJ
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING SYSTEM WITH SUPPORT POST AND ANNULAR PLATEN OR POLISHING PAD
- Publication number 20200114487
- Publication date Apr 16, 2020
- Applied Materials, Inc.
- Paul D. Butterfield
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING ARTICLES AND INTEGRATED SYSTEM AND METHODS FOR MANUFACTUR...
- Publication number 20200101657
- Publication date Apr 2, 2020
- Applied Materials, Inc.
- Kasiraman KRISHNAN
- B24 - GRINDING POLISHING
Information Patent Application
PRECURSOR FORMULATIONS FOR POLISHING PADS PRODUCED BY AN ADDITIVE M...
- Publication number 20200001433
- Publication date Jan 2, 2020
- Applied Materials, Inc.
- Rajeev BAJAJ
- B24 - GRINDING POLISHING
Information Patent Application
PRINTED CHEMICAL MECHANICAL POLISHING PAD
- Publication number 20190299357
- Publication date Oct 3, 2019
- Applied Materials, Inc.
- Mahendra Christopher ORILALL
- B24 - GRINDING POLISHING
Information Patent Application
POROUS CHEMICAL MECHANICAL POLISHING PADS
- Publication number 20190224809
- Publication date Jul 25, 2019
- Applied Materials, Inc.
- Sivapackia GANAPATHIAPPAN
- B33 - ADDITIVE MANUFACTURING TECHNOLOGY
Information Patent Application
INTEGRATED ABRASIVE POLISHING PADS AND MANUFACTURING METHODS
- Publication number 20190030678
- Publication date Jan 31, 2019
- Applied Materials, Inc.
- Ashavani KUMAR
- B24 - GRINDING POLISHING
Information Patent Application
UV CURABLE CMP POLISHING PAD AND METHOD OF MANUFACTURE
- Publication number 20190009388
- Publication date Jan 10, 2019
- Applied Materials, Inc.
- Mahendra Christopher Orilall
- B24 - GRINDING POLISHING
Information Patent Application
THIN PLASTIC POLISHING ARTICLE FOR CMP APPLICATIONS
- Publication number 20180207770
- Publication date Jul 26, 2018
- Applied Materials, Inc.
- Robert D. TOLLES
- B24 - GRINDING POLISHING
Information Patent Application
CMP PAD CONSTRUCTION WITH COMPOSITE MATERIAL PROPERTIES USING ADDIT...
- Publication number 20180161954
- Publication date Jun 14, 2018
- Applied Materials, Inc.
- Rajeev BAJAJ
- B24 - GRINDING POLISHING
Information Patent Application
SUBSTRATE FEATURES FOR INDUCTIVE MONITORING OF CONDUCTIVE TRENCH DEPTH
- Publication number 20180166347
- Publication date Jun 14, 2018
- Applied Materials, Inc.
- Wei Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLISHING SYSTEM WITH ANNULAR PLATEN OR POLISHING PAD FOR SUBSTRATE...
- Publication number 20180056477
- Publication date Mar 1, 2018
- Applied Materials, Inc.
- Paul D. Butterfield
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING ARTICLES AND INTEGRATED SYSTEM AND METHODS FOR MANUFACTUR...
- Publication number 20180043613
- Publication date Feb 15, 2018
- Applied Materials, Inc.
- Kasiraman KRISHNAN
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
MULTI-LAYERED NANO-FIBROUS CMP PADS
- Publication number 20180009079
- Publication date Jan 11, 2018
- Applied Materials, Inc.
- Robert D. TOLLES
- B24 - GRINDING POLISHING
Information Patent Application
POROUS CHEMICAL MECHANICAL POLISHING PADS
- Publication number 20170203406
- Publication date Jul 20, 2017
- Applied Materials, Inc.
- Sivapackia GANAPATHIAPPAN
- B33 - ADDITIVE MANUFACTURING TECHNOLOGY
Information Patent Application
UV CURABLE CMP POLISHING PAD AND METHOD OF MANUFACTURE
- Publication number 20160176021
- Publication date Jun 23, 2016
- Applied Materials, Inc.
- Mahendra Christopher Orilall
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
POLISHING PADS PRODUCED BY AN ADDITIVE MANUFACTURING PROCESS
- Publication number 20160114458
- Publication date Apr 28, 2016
- Applied Materials, Inc.
- Rajeev BAJAJ
- B33 - ADDITIVE MANUFACTURING TECHNOLOGY
Information Patent Application
CMP PAD CONSTRUCTION WITH COMPOSITE MATERIAL PROPERTIES USING ADDIT...
- Publication number 20160107290
- Publication date Apr 21, 2016
- Applied Materials, Inc.
- Rajeev BAJAJ
- B33 - ADDITIVE MANUFACTURING TECHNOLOGY
Information Patent Application
POLISHING PADS PRODUCED BY AN ADDITIVE MANUFACTURING PROCESS
- Publication number 20160107295
- Publication date Apr 21, 2016
- Applied Materials, Inc.
- Rajeev BAJAJ
- B33 - ADDITIVE MANUFACTURING TECHNOLOGY
Information Patent Application
PRINTED CHEMICAL MECHANICAL POLISHING PAD
- Publication number 20160107288
- Publication date Apr 21, 2016
- Applied Materials, Inc.
- Mahendra Christopher ORILALL
- B33 - ADDITIVE MANUFACTURING TECHNOLOGY
Information Patent Application
POLISHING PADS PRODUCED BY AN ADDITIVE MANUFACTURING PROCESS
- Publication number 20160107287
- Publication date Apr 21, 2016
- Rajeev BAJAJ
- B33 - ADDITIVE MANUFACTURING TECHNOLOGY
Information Patent Application
POLISHING ARTICLES AND INTEGRATED SYSTEM AND METHODS FOR MANUFACTUR...
- Publication number 20160107381
- Publication date Apr 21, 2016
- Applied Materials, Inc.
- Kasiraman KRISHNAN
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
CHEMICAL MECHANICAL POLISHING PAD WITH INTERNAL CHANNELS
- Publication number 20160101500
- Publication date Apr 14, 2016
- Applied Materials, Inc.
- Jason Garcheung FUNG
- B24 - GRINDING POLISHING
Information Patent Application
METHOD AND APPARATUS FOR HIGH EFFICIENCY POST CMP CLEAN USING ENGIN...
- Publication number 20160083676
- Publication date Mar 24, 2016
- Applied Materials, Inc.
- Ekaterina MIKHAYLICHENKO
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
SUBSTRATE FEATURES FOR INDUCTIVE MONITORING OF CONDUCTIVE TRENCH DEPTH
- Publication number 20150371907
- Publication date Dec 24, 2015
- Applied Materials, Inc.
- Wei Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONDITIONING OF GROOVING IN POLISHING PADS
- Publication number 20150336236
- Publication date Nov 26, 2015
- Applied Materials, Inc.
- Hung Chen
- B26 - HAND CUTTING TOOLS CUTTING SEVERING

Fred C. Redeker

Person

Patents Grantslast 30 patents

Roller for location-specific wafer polishing

Roller for location-specific wafer polishing

Polishing articles and integrated system and methods for manufactur...

Integrated abrasive polishing pads and manufacturing methods

CMP pad construction with composite material properties using addit...

Polishing system with annular platen or polishing pad

Polishing system with support post and annular platen or polishing pad

Integrated abrasive polishing pads and manufacturing methods

Precursor formulations for polishing pads produced by an additive m...

Polishing pads produced by an additive manufacturing process

Polishing pads produced by an additive manufacturing process

Multi-layered nano-fibrous CMP pads

Thin plastic polishing article for CMP applications

Polishing system with annular platen or polishing pad for substrate...

CMP pad construction with composite material properties using addit...

Polishing articles and integrated system and methods for manufactur...

Porous chemical mechanical polishing pads

Polishing pads produced by an additive manufacturing process

Printed chemical mechanical polishing pad

Substrate features for inductive monitoring of conductive trench depth

Method of manufacturing a UV curable CMP polishing pad

Substrate features for inductive monitoring of conductive trench depth

CMP pad construction with composite material properties using addit...

Polishing articles and integrated system and methods for manufactur...

CMP pads having material composition that facilitates controlled co...

Conditioning of grooving in polishing pads

Material for cleaning a substrate

Method and apparatus for cleaning a substrate using non-newtonian f...

Method for removing contamination from a substrate and for making a...

Methods for cleaning a semiconductor substrate

Patents Applicationslast 30 patents

POROUS CHEMICAL MECHANICAL POLISHING PADS

INTEGRATED ABRASIVE POLISHING PADS AND MANUFACTURING METHODS

POLISHING SYSTEM WITH ANNULAR PLATEN OR POLISHING PAD

ROLLER FOR LOCATION-SPECIFIC WAFER POLISHING

CMP PAD CONSTRUCTION WITH COMPOSITE MATERIAL PROPERTIES USING ADDIT...

POLISHING SYSTEM WITH SUPPORT POST AND ANNULAR PLATEN OR POLISHING PAD

POLISHING ARTICLES AND INTEGRATED SYSTEM AND METHODS FOR MANUFACTUR...

PRECURSOR FORMULATIONS FOR POLISHING PADS PRODUCED BY AN ADDITIVE M...

PRINTED CHEMICAL MECHANICAL POLISHING PAD

POROUS CHEMICAL MECHANICAL POLISHING PADS

INTEGRATED ABRASIVE POLISHING PADS AND MANUFACTURING METHODS

UV CURABLE CMP POLISHING PAD AND METHOD OF MANUFACTURE

THIN PLASTIC POLISHING ARTICLE FOR CMP APPLICATIONS

CMP PAD CONSTRUCTION WITH COMPOSITE MATERIAL PROPERTIES USING ADDIT...

SUBSTRATE FEATURES FOR INDUCTIVE MONITORING OF CONDUCTIVE TRENCH DEPTH

POLISHING SYSTEM WITH ANNULAR PLATEN OR POLISHING PAD FOR SUBSTRATE...

POLISHING ARTICLES AND INTEGRATED SYSTEM AND METHODS FOR MANUFACTUR...

MULTI-LAYERED NANO-FIBROUS CMP PADS

POROUS CHEMICAL MECHANICAL POLISHING PADS

UV CURABLE CMP POLISHING PAD AND METHOD OF MANUFACTURE

POLISHING PADS PRODUCED BY AN ADDITIVE MANUFACTURING PROCESS

CMP PAD CONSTRUCTION WITH COMPOSITE MATERIAL PROPERTIES USING ADDIT...

POLISHING PADS PRODUCED BY AN ADDITIVE MANUFACTURING PROCESS

PRINTED CHEMICAL MECHANICAL POLISHING PAD

POLISHING PADS PRODUCED BY AN ADDITIVE MANUFACTURING PROCESS

POLISHING ARTICLES AND INTEGRATED SYSTEM AND METHODS FOR MANUFACTUR...

CHEMICAL MECHANICAL POLISHING PAD WITH INTERNAL CHANNELS

METHOD AND APPARATUS FOR HIGH EFFICIENCY POST CMP CLEAN USING ENGIN...

SUBSTRATE FEATURES FOR INDUCTIVE MONITORING OF CONDUCTIVE TRENCH DEPTH

CONDITIONING OF GROOVING IN POLISHING PADS