Fritz Erdmann

Person

Eltville, DE

People

Patents Grantslast 30 patents

Information Patent Grant
(1,2-naphthoquinone 2-diazide) sulfonic acid esters, radiation-sens...
- Patent number 5,563,018
- Issue date Oct 8, 1996
- Hoechst Aktiengesellschaft
- Gerhard Buhr
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Radiation-sensitive composition containing esterification product o...
- Patent number 5,358,823
- Issue date Oct 25, 1994
- Hoechst Aktiengesellschaft
- Wolfgang Zahn
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Oxadiazole compounds containing 4,6-bis-trichloromethyl-S-triazin-2...
- Patent number 5,216,158
- Issue date Jun 1, 1993
- Hoechst Aktiengesellschaft
- Georg Pawlowski
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Aromatic compounds substituted by 4,6-bis(trichloromethyl)-s-triazi...
- Patent number 5,064,959
- Issue date Nov 12, 1991
- Hoechst Aktiengesellschaft
- Georg Pawlowski
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Process for the preparation of an o-naphthoquinonediazide sulfonic...
- Patent number 4,873,169
- Issue date Oct 10, 1989
- Hoechst Aktiengesellschaft
- Fritz Erdmann
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Process of preparing light-sensitive naphthoquinonediazidesulfonic...
- Patent number 4,555,469
- Issue date Nov 26, 1985
- Hoechst Aktiengesellschaft
- Fritz Erdmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Light-sensitive polycondensation product containing diazonium and d...
- Patent number 4,492,748
- Issue date Jan 8, 1985
- Walter Lutz
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Light-sensitive mixture comprising a naphthoquinonediazidesulfonic...
- Patent number 4,424,270
- Issue date Jan 3, 1984
- Hoechst Aktiengesellschaft
- Fritz Erdmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive copying composition
- Patent number 4,266,000
- Issue date May 5, 1981
- Hoechst Aktiengesellschaft
- Paul Stahlhofen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Fritz Erdmann

Person

Patents Grantslast 30 patents

(1,2-naphthoquinone 2-diazide) sulfonic acid esters, radiation-sens...

Radiation-sensitive composition containing esterification product o...

Oxadiazole compounds containing 4,6-bis-trichloromethyl-S-triazin-2...

Aromatic compounds substituted by 4,6-bis(trichloromethyl)-s-triazi...

Process for the preparation of an o-naphthoquinonediazide sulfonic...

Process of preparing light-sensitive naphthoquinonediazidesulfonic...

Light-sensitive polycondensation product containing diazonium and d...

Light-sensitive mixture comprising a naphthoquinonediazidesulfonic...

Photosensitive copying composition