Fumio Murai

Person

Hinode, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Photomask and pattern forming method employing the same
- Patent number 7,115,344
- Issue date Oct 3, 2006
- Renesas Technology Corp.
- Norio Hasegawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor device and manufacturing method thereof
- Patent number 6,964,832
- Issue date Nov 15, 2005
- Hitachi, Ltd.
- Akemi Moniwa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabrication of patterns and semiconductor devices
- Patent number 6,845,497
- Issue date Jan 18, 2005
- Hitachi, Ltd.
- Fumio Murai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photomask and pattern forming method employing the same
- Patent number 6,733,953
- Issue date May 11, 2004
- Renesas Technology Corp.
- Norio Hasegawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor device and a manufacturing method of the same
- Patent number 6,709,880
- Issue date Mar 23, 2004
- Hitachi, Ltd.
- Jiro Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 6,586,341
- Issue date Jul 1, 2003
- Hitachi, Ltd.
- Akemi Moniwa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Substrate temperature control system and method for controlling tem...
- Patent number 6,518,548
- Issue date Feb 11, 2003
- Hitachi, Ltd.
- Masakazu Sugaya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for manufacturing semiconductor integrated circuit device
- Patent number 6,497,992
- Issue date Dec 24, 2002
- Hitachi, Ltd.
- Takashi Yunogami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate temperature control system and method for controlling tem...
- Patent number 6,394,797
- Issue date May 28, 2002
- Hitachi, Ltd.
- Masakazu Sugaya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photomask and pattern forming method employing the same
- Patent number 6,383,718
- Issue date May 7, 2002
- Hitachi, Ltd.
- Norio Hasegawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask and pattern forming method employing the same
- Patent number 6,258,513
- Issue date Jul 10, 2001
- Hitachi, Ltd.
- Norio Hasegawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask and pattern forming method employing the same
- Patent number 6,087,074
- Issue date Jul 11, 2000
- Hitachi, Ltd.
- Norio Hasegawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for manufacturing semiconductor integrated circuit device
- Patent number 6,057,081
- Issue date May 2, 2000
- Hitachi, Ltd.
- Takashi Yunogami
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask and pattern forming method employing the same
- Patent number 6,013,398
- Issue date Jan 11, 2000
- Hitachi, Ltd.
- Norio Hasegawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask and pattern forming method employing the same
- Patent number 5,851,703
- Issue date Dec 22, 1998
- Hitachi, Ltd.
- Norio Hasegawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure method and pattern data preparation system therefor, patte...
- Patent number 5,757,409
- Issue date May 26, 1998
- Hitachi, Ltd.
- Yoshihiko Okamoto
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Photomask and pattern forming method employing the same
- Patent number 5,656,400
- Issue date Aug 12, 1997
- Hitachi, Ltd.
- Norio Hasegawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Processed substrate obtained by a process for effecting suppression...
- Patent number 5,589,270
- Issue date Dec 31, 1996
- Hitachi, Ltd.
- Fumio Murai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask and pattern forming method employing the same
- Patent number 5,578,421
- Issue date Nov 26, 1996
- Hitachi, Ltd.
- Norio Hasegawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure method and pattern data preparation system therefor, patte...
- Patent number 5,557,314
- Issue date Sep 17, 1996
- Hitachi, Ltd.
- Yoshihiko Okamoto
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of forming pattern and making semiconductor device using rad...
- Patent number 5,441,849
- Issue date Aug 15, 1995
- Hitachi, Ltd.
- Hiroshi Shiraishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for suppression of electrification
- Patent number 5,437,893
- Issue date Aug 1, 1995
- Hitachi, Ltd.
- Fumio Murai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask and pattern forming method employing the same
- Patent number 5,429,896
- Issue date Jul 4, 1995
- Hitachi, Ltd.
- Norio Hasegawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
High-resolution lithography and semiconductor device manufacturing...
- Patent number 5,350,485
- Issue date Sep 27, 1994
- Hitachi, Ltd.
- Hiroshi Shiraishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Charged beam exposure method and apparatus as well as aperture stop...
- Patent number 5,334,845
- Issue date Aug 2, 1994
- Hitachi Limited
- Hiroaki Wakabayashi
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Pattern forming method
- Patent number 5,324,550
- Issue date Jun 28, 1994
- Hitachi, Ltd.
- Hidenori Yamaguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask and method for manufacturing semiconductor device using p...
- Patent number 5,318,868
- Issue date Jun 7, 1994
- Hitachi, Ltd.
- Norio Hasegawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Superconducting field effect transistor
- Patent number 5,317,168
- Issue date May 31, 1994
- Hitachi, Ltd.
- Toshikazu Nishino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern fabrication method using a charged particle beam and appara...
- Patent number 5,278,421
- Issue date Jan 11, 1994
- Hitachi, Ltd.
- Haruo Yoda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for suppression of electrification
- Patent number 5,256,454
- Issue date Oct 26, 1993
- Hitachi, Ltd.
- Fumio Murai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Photomask and pattern forming method employing the same
- Publication number 20080057408
- Publication date Mar 6, 2008
- RENESAS TECHNOLOGY CORP.
- Norio Hasegawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask and pattern forming method employing the same
- Publication number 20050158638
- Publication date Jul 21, 2005
- RENESAS TECHNOLOGY CORP.
- Norio Hasegawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask and pattern forming method employing the same
- Publication number 20040161707
- Publication date Aug 19, 2004
- RENESAS TECHNOLOGY CORP.
- Norio Hasegawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Semiconductor device and manufacturing method thereof
- Publication number 20030228758
- Publication date Dec 11, 2003
- Akemi Moniwa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for fabrication of patterns and semiconductor devices
- Publication number 20030093767
- Publication date May 15, 2003
- Fumio Murai
- B82 - NANO-TECHNOLOGY
Information Patent Application
Semiconductor device and a manufacturing method of the same
- Publication number 20030054580
- Publication date Mar 20, 2003
- Hitachi, Ltd.
- Jiro Yamamoto
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method of manufacturing semiconductor device
- Publication number 20020175298
- Publication date Nov 28, 2002
- Akemi Moniwa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Substrate temperature control system and method for controlling tem...
- Publication number 20020113056
- Publication date Aug 22, 2002
- Hitachi, Ltd.
- Masakazu Sugaya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Photomask and pattern forming method employing the same
- Publication number 20020102478
- Publication date Aug 1, 2002
- Hitachi, Ltd.
- Norio Hasegawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask and pattern forming method employing the same
- Publication number 20010036583
- Publication date Nov 1, 2001
- Hitachi, Ltd.
- Norio Hasegawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Fumio Murai

Person

Patents Grantslast 30 patents

Photomask and pattern forming method employing the same

Semiconductor device and manufacturing method thereof

Method for fabrication of patterns and semiconductor devices

Photomask and pattern forming method employing the same

Semiconductor device and a manufacturing method of the same

Method of manufacturing semiconductor device

Substrate temperature control system and method for controlling tem...

Process for manufacturing semiconductor integrated circuit device

Substrate temperature control system and method for controlling tem...

Photomask and pattern forming method employing the same

Photomask and pattern forming method employing the same

Photomask and pattern forming method employing the same

Process for manufacturing semiconductor integrated circuit device

Photomask and pattern forming method employing the same

Photomask and pattern forming method employing the same

Exposure method and pattern data preparation system therefor, patte...

Photomask and pattern forming method employing the same

Processed substrate obtained by a process for effecting suppression...

Photomask and pattern forming method employing the same

Exposure method and pattern data preparation system therefor, patte...

Method of forming pattern and making semiconductor device using rad...

Method for suppression of electrification

Photomask and pattern forming method employing the same

High-resolution lithography and semiconductor device manufacturing...

Charged beam exposure method and apparatus as well as aperture stop...

Pattern forming method

Photomask and method for manufacturing semiconductor device using p...

Superconducting field effect transistor

Pattern fabrication method using a charged particle beam and appara...

Method for suppression of electrification

Patents Applicationslast 30 patents

Photomask and pattern forming method employing the same

Photomask and pattern forming method employing the same

Photomask and pattern forming method employing the same

Semiconductor device and manufacturing method thereof

Method for fabrication of patterns and semiconductor devices

Semiconductor device and a manufacturing method of the same

Method of manufacturing semiconductor device

Substrate temperature control system and method for controlling tem...

Photomask and pattern forming method employing the same

Photomask and pattern forming method employing the same