Fumitoshi Oikawa

Person

Kanagawa, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Cleaning apparatus and polishing apparatus
- Patent number 12,205,831
- Issue date Jan 21, 2025
- Ebara Corporation
- Mitsuru Miyazaki
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate cleaning apparatus and cleaning method of substrate
- Patent number 12,100,587
- Issue date Sep 24, 2024
- Ebara Corporation
- Fumitoshi Oikawa
- B08 - CLEANING
Information Patent Grant
Cleaning apparatus and polishing apparatus
- Patent number 11,948,811
- Issue date Apr 2, 2024
- Ebara Corporation
- Mitsuru Miyazaki
- B08 - CLEANING
Information Patent Grant
Apparatus for cleaning substrate and substrate cleaning method
- Patent number 11,094,548
- Issue date Aug 17, 2021
- Ebara Corporation
- Shinji Kajita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for cleaning substrate
- Patent number 9,089,881
- Issue date Jul 28, 2015
- Ebara Corporation
- Xinming Wang
- B08 - CLEANING
Information Patent Grant
Roller shaft for semiconductor cleaning
- Patent number D710062
- Issue date Jul 29, 2014
- Ebara Corporation
- Tomoatsu Ishibashi
- D32 - Washing, cleaning, or drying machine
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 8,226,771
- Issue date Jul 24, 2012
- Ebara Corporation
- Fumitoshi Oikawa
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate cleaning apparatus
- Patent number 6,851,152
- Issue date Feb 8, 2005
- Ebara Corporation
- Hiroshi Sotozaki
- B08 - CLEANING
Information Patent Grant
Substrate cleaning apparatus and cleaning member
- Patent number 6,842,933
- Issue date Jan 18, 2005
- Ebara Corporation
- Fumitoshi Oikawa
- B08 - CLEANING
Information Patent Grant
Substrate cleaning apparatus and cleaning member
- Patent number 6,651,287
- Issue date Nov 25, 2003
- Ebara Corporation
- Fumitoshi Oikawa
- B08 - CLEANING
Information Patent Grant
Cleaning device and substrate cleaning apparatus
- Patent number 6,412,134
- Issue date Jul 2, 2002
- Ebara Corporation
- Fumitoshi Oikawa
- B08 - CLEANING
Information Patent Grant
Apparatus for cleaning substrate
- Patent number 6,248,009
- Issue date Jun 19, 2001
- Ebara Corporation
- Kenya Ito
- B08 - CLEANING

Patents Applicationslast 30 patents

Information Patent Application
CLEANING APPARATUS, SUBSTRATE PROCESSING APPARATUS, AND CLEANING ME...
- Publication number 20240321601
- Publication date Sep 26, 2024
- EBARA CORPORATION
- Fumitoshi OIKAWA
- B08 - CLEANING
Information Patent Application
CLEANING APPARATUS AND POLISHING APPARATUS
- Publication number 20240194498
- Publication date Jun 13, 2024
- EBARA CORPORATION
- Mitsuru MIYAZAKI
- B08 - CLEANING
Information Patent Application
SUBSTRATE CLEANING DEVICE AND METHOD OF CLEANING SUBSTRATE
- Publication number 20240082885
- Publication date Mar 14, 2024
- EBARA CORPORATION
- Fumitoshi Oikawa
- B08 - CLEANING
Information Patent Application
SUBSTRATE CLEANING APPARATUS AND SUBSTRATE CLEANING METHOD
- Publication number 20240075503
- Publication date Mar 7, 2024
- EBARA CORPORATION
- Fumitoshi OIKAWA
- B08 - CLEANING
Information Patent Application
SUBSTRATE CLEANING DEVICE AND METHOD OF CLEANING SUBSTRATE
- Publication number 20220203411
- Publication date Jun 30, 2022
- EBARA CORPORATION
- Fumitoshi Oikawa
- B08 - CLEANING
Information Patent Application
SUBSTRATE CLEANING DEVICES, SUBSTRATE PROCESSING APPARATUS, SUBSTRA...
- Publication number 20220016651
- Publication date Jan 20, 2022
- EBARA CORPORATION
- Fumitoshi Oikawa
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
CLEANING APPARATUS AND POLISHING APPARATUS
- Publication number 20210202273
- Publication date Jul 1, 2021
- EBARA CORPORATION
- Mitsuru MIYAZAKI
- B08 - CLEANING
Information Patent Application
SUBSTRATE CLEANING APPARATUS AND CLEANING METHOD OF SUBSTRATE
- Publication number 20210111018
- Publication date Apr 15, 2021
- EBARA CORPORATION
- Fumitoshi OIKAWA
- B08 - CLEANING
Information Patent Application
SUBSTRATE CLEANING DEVICE AND SUBSTRATE CLEANING METHOD
- Publication number 20190164769
- Publication date May 30, 2019
- EBARA CORPORATION
- Shinji KAJITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR CLEANING SUBSTRATE
- Publication number 20150287617
- Publication date Oct 8, 2015
- EBARA CORPORATION
- Xinming WANG
- B08 - CLEANING
Information Patent Application
SUBSTRATE CLEANING METHOD
- Publication number 20130000671
- Publication date Jan 3, 2013
- Xinming WANG
- B08 - CLEANING
Information Patent Application
METHOD AND APPARATUS FOR CLEANING SUBSTRATE
- Publication number 20110209727
- Publication date Sep 1, 2011
- Xinming WANG
- B08 - CLEANING
Information Patent Application
Substrate Processing Apparatus and Substrate Processing Method
- Publication number 20090301518
- Publication date Dec 10, 2009
- Fumitoshi Oikawa
- B08 - CLEANING
Information Patent Application
Substrate cleaning apparatus and cleaning member
- Publication number 20040074029
- Publication date Apr 22, 2004
- Fumitoshi Oikawa
- B08 - CLEANING
Information Patent Application
Substrate cleaning apparatus
- Publication number 20020029431
- Publication date Mar 14, 2002
- Fumitoshi Oikawa
- B08 - CLEANING
Information Patent Application
Substrate cleaning apparatus
- Publication number 20020022445
- Publication date Feb 21, 2002
- Hiroshi Sotozaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate cleaning apparatus and cleaning member
- Publication number 20020004962
- Publication date Jan 17, 2002
- Fumitoshi Oikawa
- H01 - BASIC ELECTRIC ELEMENTS

Fumitoshi Oikawa

Person

Patents Grantslast 30 patents

Cleaning apparatus and polishing apparatus

Substrate cleaning apparatus and cleaning method of substrate

Cleaning apparatus and polishing apparatus

Apparatus for cleaning substrate and substrate cleaning method

Method and apparatus for cleaning substrate

Roller shaft for semiconductor cleaning

Substrate processing apparatus and substrate processing method

Substrate cleaning apparatus

Substrate cleaning apparatus and cleaning member

Substrate cleaning apparatus and cleaning member

Cleaning device and substrate cleaning apparatus

Apparatus for cleaning substrate

Patents Applicationslast 30 patents

CLEANING APPARATUS, SUBSTRATE PROCESSING APPARATUS, AND CLEANING ME...

CLEANING APPARATUS AND POLISHING APPARATUS

SUBSTRATE CLEANING DEVICE AND METHOD OF CLEANING SUBSTRATE

SUBSTRATE CLEANING APPARATUS AND SUBSTRATE CLEANING METHOD

SUBSTRATE CLEANING DEVICE AND METHOD OF CLEANING SUBSTRATE

SUBSTRATE CLEANING DEVICES, SUBSTRATE PROCESSING APPARATUS, SUBSTRA...

CLEANING APPARATUS AND POLISHING APPARATUS

SUBSTRATE CLEANING APPARATUS AND CLEANING METHOD OF SUBSTRATE

SUBSTRATE CLEANING DEVICE AND SUBSTRATE CLEANING METHOD

METHOD AND APPARATUS FOR CLEANING SUBSTRATE

SUBSTRATE CLEANING METHOD

METHOD AND APPARATUS FOR CLEANING SUBSTRATE

Substrate Processing Apparatus and Substrate Processing Method

Substrate cleaning apparatus and cleaning member

Substrate cleaning apparatus

Substrate cleaning apparatus

Substrate cleaning apparatus and cleaning member