Gary S. Selwyn

Person

Hopewell Junction, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus for tuning field for plasma processing using c...
- Patent number 5,716,486
- Issue date Feb 10, 1998
- Gary S. Selwyn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for contamination control in plasma processing
- Patent number 5,387,777
- Issue date Feb 7, 1995
- International Business Machines Corporation
- Reid S. Bennett
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for contamination control in plasma processing
- Patent number 5,367,139
- Issue date Nov 22, 1994
- International Business Machines Corporation
- Reid S. Bennett
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for contamination control in processing appara...
- Patent number 5,298,720
- Issue date Mar 29, 1994
- International Business Machines Corporation
- Jerome J. Cuomo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Detection of interfaces with atomic resolution during material proc...
- Patent number 5,294,289
- Issue date Mar 15, 1994
- International Business Machines Corporation
- Tony F. Heinz
- B24 - GRINDING POLISHING
Information Patent Grant
Portable particle detector assembly
- Patent number 5,255,089
- Issue date Oct 19, 1993
- International Business Machines Corporation
- David E. Dybas
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
Plasma constituent analysis by interferometric techniques
- Patent number 5,225,888
- Issue date Jul 6, 1993
- International Business Machines Corporation
- Gary S. Selwyn
- G01 - MEASURING TESTING
Information Patent Grant
Plasma amplified photoelectron process endpoint detection apparatus
- Patent number 4,846,920
- Issue date Jul 11, 1989
- International Business Machine Corporation
- John H. Keller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Trench etch endpoint detection by LIF
- Patent number 4,675,072
- Issue date Jun 23, 1987
- International Business Machines Corporation
- Reid S. Bennett
- G01 - MEASURING TESTING

Gary S. Selwyn

Person

Patents Grantslast 30 patents

Method and apparatus for tuning field for plasma processing using c...

Methods and apparatus for contamination control in plasma processing

Methods and apparatus for contamination control in plasma processing

Method and apparatus for contamination control in processing appara...

Detection of interfaces with atomic resolution during material proc...

Portable particle detector assembly

Plasma constituent analysis by interferometric techniques

Plasma amplified photoelectron process endpoint detection apparatus

Trench etch endpoint detection by LIF