Ge Yuan

Person

New Haven, CT, US

People

Patents Grantslast 30 patents

Information Patent Grant
Atomic layer etch and selective deposition process for extreme ultr...
- Patent number 12,062,538
- Issue date Aug 13, 2024
- Lam Research Corporation
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Removing metal contamination from surfaces of a processing chamber
- Patent number 11,842,888
- Issue date Dec 12, 2023
- Lam Research Corporation
- Jengyi Yu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and device concerning III-nitride edge emitting laser diode...
- Patent number 10,554,017
- Issue date Feb 4, 2020
- Yale University
- Jung Han
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ATOMIC LAYER ETCH AND SELECTIVE DEPOSITION PROCESS FOR EXTREME ULTR...
- Publication number 20240429045
- Publication date Dec 26, 2024
- LAM RESEARCH CORPORATION
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REMOVING METAL CONTAMINATION FROM SURFACES OF A PROCESSING CHAMBER
- Publication number 20240112896
- Publication date Apr 4, 2024
- LAM RESEARCH CORPORATION
- Jengyi YU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REMOVING METAL CONTAMINATION FROM SURFACES OF A PROCESSING CHAMBER
- Publication number 20230148265
- Publication date May 11, 2023
- LAM RESEARCH CORPORATION
- Jengyi YU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
POROUS III-NITRIDES AND METHODS OF USING AND MAKING THEREOF
- Publication number 20220384187
- Publication date Dec 1, 2022
- Yale University
- Jung Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ATOMIC LAYER ETCH AND SELECTIVE DEPOSITION PROCESS FOR EXTREME ULTR...
- Publication number 20220216050
- Publication date Jul 7, 2022
- LAM RESEARCH CORPORATION
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REMOVING METAL CONTAMINATION FROM SURFACES OF A PROCESSING CHAMBER
- Publication number 20220037132
- Publication date Feb 3, 2022
- LAM RESEARCH CORPORATION
- Jengyi YU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
A METHOD AND DEVICE CONCERNING III-NITRIDE EDGE EMITTING LASER DIOD...
- Publication number 20180152003
- Publication date May 31, 2018
- Yale University
- Jung Han
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Atomic layer etch and selective deposition process for extreme ultr...

Removing metal contamination from surfaces of a processing chamber

Method and device concerning III-nitride edge emitting laser diode...

Patents Applicationslast 30 patents

ATOMIC LAYER ETCH AND SELECTIVE DEPOSITION PROCESS FOR EXTREME ULTR...

REMOVING METAL CONTAMINATION FROM SURFACES OF A PROCESSING CHAMBER

REMOVING METAL CONTAMINATION FROM SURFACES OF A PROCESSING CHAMBER

POROUS III-NITRIDES AND METHODS OF USING AND MAKING THEREOF

ATOMIC LAYER ETCH AND SELECTIVE DEPOSITION PROCESS FOR EXTREME ULTR...

REMOVING METAL CONTAMINATION FROM SURFACES OF A PROCESSING CHAMBER

A METHOD AND DEVICE CONCERNING III-NITRIDE EDGE EMITTING LASER DIOD...