Genji NAKAMURA

Person

Yamanashi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 11,869,927
- Issue date Jan 9, 2024
- Tokyo Electron Limited
- Yumiko Kawano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device and semiconductor device
- Patent number 11,737,276
- Issue date Aug 22, 2023
- Tokyo Electron Limited
- Sara Otsuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resistive random accress memory containing a conformal titanium alu...
- Patent number 10,361,366
- Issue date Jul 23, 2019
- Tokyo Electron Limited
- Takahiro Hakamata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Parasitic capacitance reduction structure for nanowire transistors...
- Patent number 9,893,161
- Issue date Feb 13, 2018
- Tokyo Electron Limited
- Genji Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing insulating film laminated structure
- Patent number 9,887,081
- Issue date Feb 6, 2018
- Tokyo Electron Limited
- Junya Miyahara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for forming a nanowire structure
- Patent number 9,882,026
- Issue date Jan 30, 2018
- Tokyo Electron Limited
- Kandabara N. Tapily
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
CMOS Vt control integration by modification of metal-containing gat...
- Patent number 9,698,020
- Issue date Jul 4, 2017
- Tokyo Electron Limited
- Genji Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of modifying insulating film
- Patent number 8,021,987
- Issue date Sep 20, 2011
- Tokyo Electron Limited
- Takuya Sugawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor device
- Patent number 7,897,498
- Issue date Mar 1, 2011
- Tokyo Electron Limited
- Glenn Gale
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Semiconductor device and manufacturing method thereof
- Patent number 7,892,914
- Issue date Feb 22, 2011
- Tokyo Electron Limited
- Genji Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of integrating metal-containing films into semiconductor dev...
- Patent number 7,674,710
- Issue date Mar 9, 2010
- Tokyo Electron Limited
- Shigeo Ashigaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming insulation film
- Patent number 7,662,236
- Issue date Feb 16, 2010
- Tokyo Electron Limited
- Takuya Sugawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of modifying insulating film
- Patent number 7,655,574
- Issue date Feb 2, 2010
- Tokyo Electron Limited
- Takuya Sugawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming underlying insulation film
- Patent number 7,622,402
- Issue date Nov 24, 2009
- Tokyo Electron Limited
- Takuya Sugawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor device
- Patent number 7,622,340
- Issue date Nov 24, 2009
- Tokyo Electron Limited
- Yasushi Akasaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming insulation film
- Patent number 7,446,052
- Issue date Nov 4, 2008
- Tokyo Electron Limited
- Takuya Sugawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device, film-forming apparatu...
- Patent number 7,084,023
- Issue date Aug 1, 2006
- Tokyo Electron Limited
- Shigeru Nakajima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating semiconductor device
- Patent number 6,933,249
- Issue date Aug 23, 2005
- Tokyo Electron Limited
- Shin Yokoyama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for forming insulating film containing silicon...
- Patent number 6,821,566
- Issue date Nov 23, 2004
- Tokyo Electron Limited
- Genji Nakamura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
FILM FORMING METHOD AND FILM FORMING APPARATUS
- Publication number 20230102051
- Publication date Mar 30, 2023
- TOKYO ELECTRON LIMITED
- Ryota IFUKU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE
- Publication number 20220384473
- Publication date Dec 1, 2022
- TOKYO ELECTRON LIMITED
- Sara OTSUKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE
- Publication number 20220139942
- Publication date May 5, 2022
- TOKYO ELECTRON LIMITED
- Genji NAKAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20210399085
- Publication date Dec 23, 2021
- Tokyo Electron Limited
- Yumiko KAWANO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESISTIVE RANDOM ACCRESS MEMORY CONTAINING A CONFORMAL TITANIUM ALU...
- Publication number 20190044064
- Publication date Feb 7, 2019
- TOKYO ELECTRON LIMITED
- Takahiro Hakamata
- G11 - INFORMATION STORAGE
Information Patent Application
Nonvolatile Storage Device and Method of Fabricating Nonvolatile St...
- Publication number 20180047787
- Publication date Feb 15, 2018
- TOKYO ELECTRON LIMITED
- Genji NAKAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING INSULATING FILM LAMINATED STRUCTURE
- Publication number 20170170010
- Publication date Jun 15, 2017
- Junya MIYAHARA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR ELEMENT MANUFACTURING METHOD
- Publication number 20160351398
- Publication date Dec 1, 2016
- TOKYO ELECTRON LIMITED
- Hirokazu UEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PARASITIC CAPACITANCE REDUCTION STRUCTURE FOR NANOWIRE TRANSISTORS...
- Publication number 20160315167
- Publication date Oct 27, 2016
- TOKYO ELECTRON LIMITED
- Genji Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING A NANOWIRE STRUCTURE
- Publication number 20160204228
- Publication date Jul 14, 2016
- TOKYO ELECTRON LIMITED
- Kandabara N. Tapily
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CMOS Vt CONTROL INTEGRATION BY MODIFICATION OF METAL-CONTAINING GAT...
- Publication number 20160111290
- Publication date Apr 21, 2016
- TOKYO ELECTRON LIMITED
- Genji Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MODIFYING INSULATING FILM
- Publication number 20100105215
- Publication date Apr 29, 2010
- TOKYO ELECTRON LIMITED
- Takuya Sugawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Forming Insulation Film
- Publication number 20100096707
- Publication date Apr 22, 2010
- TOKYO ELECTRON LIMITED
- Takuya Sugawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Forming Insulation Film
- Publication number 20080274370
- Publication date Nov 6, 2008
- TOKYO ELECTRON LIMITED
- Takuya Sugawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Manufacturing Semiconductor Device
- Publication number 20080268655
- Publication date Oct 30, 2008
- Glenn Gale
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF INTEGRATING METAL-CONTAINING FILMS INTO SEMICONDUCTOR DEV...
- Publication number 20080119033
- Publication date May 22, 2008
- TOKYO ELECTRON LIMITED
- Shigeo Ashigaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
- Publication number 20070190767
- Publication date Aug 16, 2007
- TOKYO ELECTRON LIMITED
- Genji Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for manufacturing semiconductor device
- Publication number 20070066077
- Publication date Mar 22, 2007
- Yasushi Akasaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of forming film and film forming apparatus
- Publication number 20060216953
- Publication date Sep 28, 2006
- Shigeru Nakajima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of modifying insulating film
- Publication number 20060199398
- Publication date Sep 7, 2006
- TOKYO ELECTRON LIMITED
- Takuya Sugawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for forming underlying insulation film
- Publication number 20050255711
- Publication date Nov 17, 2005
- TOKYO ELECTRON LIMITED
- Takuya Sugawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for forming insulation film
- Publication number 20050161434
- Publication date Jul 28, 2005
- TOKYO ELECTRON LIMITED
- Takuya Sugawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of manufacturing semiconductor device, film-forming apparatu...
- Publication number 20050142716
- Publication date Jun 30, 2005
- Shigeru Nakajima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor manufacturing apparatus and heat treatment method
- Publication number 20040253839
- Publication date Dec 16, 2004
- TOKYO ELECTRON LIMITED
- Masahiro Shimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of fabricating semiconductor device
- Publication number 20040152339
- Publication date Aug 5, 2004
- Shin Yokoyama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and apparatus for forming insulating film containing silicon...
- Publication number 20030068437
- Publication date Apr 10, 2003
- Genji Nakamura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Genji NAKAMURA

Person

Patents Grantslast 30 patents

Method of manufacturing semiconductor device

Method of manufacturing semiconductor device and semiconductor device

Resistive random accress memory containing a conformal titanium alu...

Parasitic capacitance reduction structure for nanowire transistors...

Method for manufacturing insulating film laminated structure

Method for forming a nanowire structure

CMOS Vt control integration by modification of metal-containing gat...

Method of modifying insulating film

Method for manufacturing semiconductor device

Semiconductor device and manufacturing method thereof

Method of integrating metal-containing films into semiconductor dev...

Method for forming insulation film

Method of modifying insulating film

Method for forming underlying insulation film

Method for manufacturing semiconductor device

Method for forming insulation film

Method of manufacturing semiconductor device, film-forming apparatu...

Method of fabricating semiconductor device

Method and apparatus for forming insulating film containing silicon...

Patents Applicationslast 30 patents

FILM FORMING METHOD AND FILM FORMING APPARATUS

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE

SEMICONDUCTOR DEVICE

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

RESISTIVE RANDOM ACCRESS MEMORY CONTAINING A CONFORMAL TITANIUM ALU...

Nonvolatile Storage Device and Method of Fabricating Nonvolatile St...

METHOD FOR MANUFACTURING INSULATING FILM LAMINATED STRUCTURE

SEMICONDUCTOR ELEMENT MANUFACTURING METHOD

PARASITIC CAPACITANCE REDUCTION STRUCTURE FOR NANOWIRE TRANSISTORS...

METHOD FOR FORMING A NANOWIRE STRUCTURE

CMOS Vt CONTROL INTEGRATION BY MODIFICATION OF METAL-CONTAINING GAT...

METHOD OF MODIFYING INSULATING FILM

Method for Forming Insulation Film

Method for Forming Insulation Film

Method for Manufacturing Semiconductor Device

METHOD OF INTEGRATING METAL-CONTAINING FILMS INTO SEMICONDUCTOR DEV...

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF

Method for manufacturing semiconductor device

Method of forming film and film forming apparatus

Method of modifying insulating film

Method for forming underlying insulation film

Method for forming insulation film

Method of manufacturing semiconductor device, film-forming apparatu...

Semiconductor manufacturing apparatus and heat treatment method

Method of fabricating semiconductor device

Method and apparatus for forming insulating film containing silicon...