Georg Pawlowski

Person

Wiesbaden, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Negative-working radiation-sensitive mixture, and radiation-sensiti...
- Patent number 6,063,545
- Issue date May 16, 2000
- Clariant GmbH
- Horst Roeschert
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive-working radiation-sensitive mixture
- Patent number 5,843,319
- Issue date Dec 1, 1998
- Hoechst Japan Limited
- Klaus Juergen Przybilla
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-curable mixture, and radiation-sensitive recording materi...
- Patent number 5,614,351
- Issue date Mar 25, 1997
- Hoechst Aktiengesellschaft
- Ralph Dammel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative photoresist compositions comprising a photosensitive compo...
- Patent number 5,541,036
- Issue date Jul 30, 1996
- Hoechst Japan Limited
- Akihiko Igawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-working radiation-sensitive mixture
- Patent number 5,525,453
- Issue date Jun 11, 1996
- Hoechst Japan Limited
- Klaus J. Przybilla
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical component based on Langmuir-Blodgett layers
- Patent number 5,517,350
- Issue date May 14, 1996
- Hoechst Aktiengesellschaft
- Ivan Cabrera
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Radiation-sensitive sulfonic acid esters and their use
- Patent number 5,442,061
- Issue date Aug 15, 1995
- Hoechst Aktiengesellschaft
- Georg Pawlowski
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Negative-working radiation-sensitive mixture containing diazomethan...
- Patent number 5,424,166
- Issue date Jun 13, 1995
- Hoechst Aktiengesellschaft
- Georg Pawlowski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative-working radiation-sensitive mixture and radiation-sensitiv...
- Patent number 5,401,608
- Issue date Mar 28, 1995
- Hoechst Aktiengesellschaft
- Georg Pawlowski
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Grant
Postive-working radiation-sensitive mixture and radiation-sensitive...
- Patent number 5,364,734
- Issue date Nov 15, 1994
- Hoechst Aktiengesellschaft
- Georg Pawlowski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compounds with acid-labile protective groups useful in positive-wor...
- Patent number 5,356,752
- Issue date Oct 18, 1994
- Hoechst Aktiengesellschaft
- Ivan Cabrera
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Oligomeric compounds with acid-labile protective groups useful in p...
- Patent number 5,354,643
- Issue date Oct 11, 1994
- Hoechst Aktiengesellschaft
- Ivan Cabrera
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Acid-cleavable radiation-sensitive compounds, radiation-sensitive m...
- Patent number 5,346,806
- Issue date Sep 13, 1994
- Hoechst Aktiengesellschaft
- Georg Pawlowski
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive-working radiation-sensitive mixture and copying material p...
- Patent number 5,340,682
- Issue date Aug 23, 1994
- Hoechst Aktiengesellschaft
- Georg Pawlowski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-working radiation-sensitive mixture and copying material p...
- Patent number 5,338,641
- Issue date Aug 16, 1994
- Hoechst Aktiengesellschaft
- Georg Pawlowski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive mixture with a polymeric binder containing unit...
- Patent number 5,328,973
- Issue date Jul 12, 1994
- Hoechst Aktiengesellschaft
- Horst Roeschert
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Radiation-sensitive polymers containing diazocarbonyl groups and a...
- Patent number 5,326,826
- Issue date Jul 5, 1994
- Hoechst Aktiengesellschaft
- Horst Roeschert
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation-sensitive mixture containing novel polymers embodying uni...
- Patent number 5,326,840
- Issue date Jul 5, 1994
- Hoechst Aktiengesellschaft
- Klaus-Juergen Przybilla
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive-working radiation sensitive mixture comprising sulfonic ac...
- Patent number 5,314,786
- Issue date May 24, 1994
- Hoechst Aktiengesellschaft
- Horst Roeschert
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Radiation-sensitive polymers containing naphthoquinone-2-diazide-4-...
- Patent number 5,302,488
- Issue date Apr 12, 1994
- Hoechst Aktiengesellschaft
- Horst Roeschert
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive sulfonic acid esters and their use
- Patent number 5,298,364
- Issue date Mar 29, 1994
- Hoechst Aktiengesellschaft
- Georg Pawlowski
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Substituted 1-sulfonyloxy-2-pyridones and process for preparing them
- Patent number 5,286,867
- Issue date Feb 15, 1994
- Hoechst Aktiengesellschaft
- Gerhard Lohaus
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Acid-cleavable compounds, positive-working radiation-sensitive mixt...
- Patent number 5,286,602
- Issue date Feb 15, 1994
- Hoechst Aktiengesellschaft
- Georg Pawlowski
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive-working radiation-sensitive mixture and recording material...
- Patent number 5,256,517
- Issue date Oct 26, 1993
- Hoechst Aktiengesellschaft
- Horst Roeschert
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for preparing N-tert-butoxycarbonylmaleimide
- Patent number 5,247,096
- Issue date Sep 21, 1993
- Hoechst Aktiengesellschaft
- Horst Roeschert
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Negative-working radiation-sensitive mixtures, and radiation-sensit...
- Patent number 5,230,985
- Issue date Jul 27, 1993
- Hoechst Aktiengesellschaft
- Gerhard Lohaus
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-working radiation-sensitive mixtures, and radiation-sensit...
- Patent number 5,229,254
- Issue date Jul 20, 1993
- Hoechst Aktiengesellschaft
- Gerhard Lohaus
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative-working radiation-sensitive mixture, and radiation-sensiti...
- Patent number 5,227,276
- Issue date Jul 13, 1993
- Hoechst Aktiengesellschaft
- Horst Roeschert
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive radiation-sensitive mixture, and radiation-sensitive recor...
- Patent number 5,217,843
- Issue date Jun 8, 1993
- Hoechst Aktiengesellschaft
- Ralph Dammel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Oxadiazole compounds containing 4,6-bis-trichloromethyl-S-triazin-2...
- Patent number 5,216,158
- Issue date Jun 1, 1993
- Hoechst Aktiengesellschaft
- Georg Pawlowski
- C07 - ORGANIC CHEMISTRY

Georg Pawlowski

Person

Patents Grantslast 30 patents

Negative-working radiation-sensitive mixture, and radiation-sensiti...

Positive-working radiation-sensitive mixture

Radiation-curable mixture, and radiation-sensitive recording materi...

Negative photoresist compositions comprising a photosensitive compo...

Positive-working radiation-sensitive mixture

Optical component based on Langmuir-Blodgett layers

Radiation-sensitive sulfonic acid esters and their use

Negative-working radiation-sensitive mixture containing diazomethan...

Negative-working radiation-sensitive mixture and radiation-sensitiv...

Postive-working radiation-sensitive mixture and radiation-sensitive...

Compounds with acid-labile protective groups useful in positive-wor...

Oligomeric compounds with acid-labile protective groups useful in p...

Acid-cleavable radiation-sensitive compounds, radiation-sensitive m...

Positive-working radiation-sensitive mixture and copying material p...

Positive-working radiation-sensitive mixture and copying material p...

Radiation-sensitive mixture with a polymeric binder containing unit...

Radiation-sensitive polymers containing diazocarbonyl groups and a...

Radiation-sensitive mixture containing novel polymers embodying uni...

Positive-working radiation sensitive mixture comprising sulfonic ac...

Radiation-sensitive polymers containing naphthoquinone-2-diazide-4-...

Radiation-sensitive sulfonic acid esters and their use

Substituted 1-sulfonyloxy-2-pyridones and process for preparing them

Acid-cleavable compounds, positive-working radiation-sensitive mixt...

Positive-working radiation-sensitive mixture and recording material...

Process for preparing N-tert-butoxycarbonylmaleimide

Negative-working radiation-sensitive mixtures, and radiation-sensit...

Positive-working radiation-sensitive mixtures, and radiation-sensit...

Negative-working radiation-sensitive mixture, and radiation-sensiti...

Positive radiation-sensitive mixture, and radiation-sensitive recor...

Oxadiazole compounds containing 4,6-bis-trichloromethyl-S-triazin-2...