Georg Pawlowski

Person

Kakegawa, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Top-layer membrane formation composition and method for forming res...
- Patent number 10,268,117
- Issue date Apr 23, 2019
- AZ Electronic Materials (Luxembourg) S.a.r.l.
- Masato Suzuki
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Composition for forming overlay film, and resist pattern formation...
- Patent number 9,810,988
- Issue date Nov 7, 2017
- AZ Electronic Material (Luxembourg) S.ár.l.
- Xiaowei Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for forming topcoat layer and resist pattern formation...
- Patent number 9,804,493
- Issue date Oct 31, 2017
- Samsung Electronics Co., Ltd.
- Hyun-woo Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for forming topcoat layer and resist pattern formation...
- Patent number 9,766,544
- Issue date Sep 19, 2017
- Samsung Electronics Co., Ltd.
- Hyun-woo Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Aromatic imide compound and method for producing same
- Patent number 9,505,721
- Issue date Nov 29, 2016
- AZ ELECRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
- Eri Hirahara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for forming topcoat layer and resist pattern formation...
- Patent number 9,482,952
- Issue date Nov 1, 2016
- AZ Electronic Materials (Luxembourg) S.A.R.L.
- Xiaowei Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Rinse solution for lithography and pattern formation method employi...
- Patent number 9,298,095
- Issue date Mar 29, 2016
- Merck Patent GmbH
- Xiaowei Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for forming fine pattern and method for forming fined p...
- Patent number 9,298,094
- Issue date Mar 29, 2016
- Merck Patent GmbH
- Toshira Okamura
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Composition for anti-reflective coating or radiation absorbing coat...
- Patent number 6,803,168
- Issue date Oct 12, 2004
- Clariant Finance (BVI) Limited
- Munirathna Padmanaban
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation absorbing polymer, composition for radiation absorbing co...
- Patent number 6,737,492
- Issue date May 18, 2004
- Clariant Finance (BVI) Limited
- Wen-Bing Kang
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Process for preparing resists
- Patent number 6,686,121
- Issue date Feb 3, 2004
- Clariant Finance (BVI) Limited
- Hiroshi Okazaki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation absorbing polymer, composition for radiation absorbing co...
- Patent number 6,468,718
- Issue date Oct 22, 2002
- Clariant Finance (BVI) Limited
- Wen-Bing Kang
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation-sensitive composition of chemical amplification type
- Patent number 6,358,665
- Issue date Mar 19, 2002
- Clariant International Ltd.
- Georg Pawlowski
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Antireflection or light-absorbing coating composition and polymer t...
- Patent number 6,329,117
- Issue date Dec 11, 2001
- Clariant International, Ltd.
- Munirathna Padmanaban
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for preparing resists
- Patent number 6,284,427
- Issue date Sep 4, 2001
- Clariant Finance (BVI) Limited
- Hiroshi Okazaki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Composition for bottom reflection preventive film and novel polymer...
- Patent number 6,277,750
- Issue date Aug 21, 2001
- Clariant Finance (BVI) Limited
- Georg Pawlowski
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Acid-labile group protected hydroxystyrene polymers or copolymers t...
- Patent number 5,852,128
- Issue date Dec 22, 1998
- Clariant AG
- Munirathna Padmanaban
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation-sensitive composition containing plasticizer
- Patent number 5,846,690
- Issue date Dec 8, 1998
- Hoechst Japan Limited
- Munirathna Padmanaban
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Silicone-compatible photoinitiators, and photosensitive mixtures co...
- Patent number 5,776,658
- Issue date Jul 7, 1998
- AGFA-Gevaert A.G.
- Claus-Peter Niesert
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Radiation-sensitive composition
- Patent number 5,773,191
- Issue date Jun 30, 1998
- Hoechst Japan Limited
- Munirathna Padmanaban
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation sensitive composition
- Patent number 5,738,972
- Issue date Apr 14, 1998
- Hoechst Japan Limited
- Munirathna Padmanaban
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Sulfonic acid esters, radiation-sensitive mixtures prepared therewi...
- Patent number 5,716,756
- Issue date Feb 10, 1998
- Hoechst Aktiengesellschaft
- Georg Pawlowski
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Radiation sensitive composition
- Patent number 5,595,855
- Issue date Jan 21, 1997
- Hoechst Japan Limited
- Munirathna Padmanaban
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-acting radiation-sensitive mixture and recording material...
- Patent number 5,498,506
- Issue date Mar 12, 1996
- Hoechst Aktiengesellschaft
- Horst Wengenroth
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
TOP-LAYER MEMBRANE FORMATION COMPOSITION AND METHOD FOR FORMING RES...
- Publication number 20170090288
- Publication date Mar 30, 2017
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.a.r.l.
- Masato SUZUKI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITION FOR FORMING TOPCOAT LAYER AND RESIST PATTERN FORMATION...
- Publication number 20160011510
- Publication date Jan 14, 2016
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
- Xiaowei WANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FORMING OVERLAY FILM, AND RESIST PATTERN FORMATION...
- Publication number 20150331323
- Publication date Nov 19, 2015
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
- Xiaowei WANG
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
AROMATIC IMIDE COMPOUND AND METHOD FOR PRODUCING SAME
- Publication number 20150299132
- Publication date Oct 22, 2015
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
- Eri HIRAHARA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COMPOSITION FOR FORMING TOPCOAT LAYER AND RESIST PATTERN FORMATION...
- Publication number 20150147701
- Publication date May 28, 2015
- Hyun-woo KIM
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
OVERLAY FILM FORMING COMPOSITION AND RESIST PATTERN FORMATION METHO...
- Publication number 20150140490
- Publication date May 21, 2015
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
- Xiaowei Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RINSE SOLUTION FOR LITHOGRAPHY AND PATTERN FORMATION METHOD EMPLOYI...
- Publication number 20140234783
- Publication date Aug 21, 2014
- AZ Electronic Materials USA Corp.
- Xiaowei Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR FORMING FINE PATTERN AND METHOD FOR FORMING FINED P...
- Publication number 20140127478
- Publication date May 8, 2014
- AZ ELECTRONIC MATERIALS USA CORP.
- Toshira Okamura
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RINSE SOLUTION FOR LITHOGRAPHY AND PATTERN FORMATION METHOD EMPLOYI...
- Publication number 20130164694
- Publication date Jun 27, 2013
- AZ Electronic Materials USA Corp.
- Xiaowei Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Novel process for preparing resists
- Publication number 20010024765
- Publication date Sep 27, 2001
- Hiroshi Okazaki
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Georg Pawlowski

Person

Patents Grantslast 30 patents

Top-layer membrane formation composition and method for forming res...

Composition for forming overlay film, and resist pattern formation...

Composition for forming topcoat layer and resist pattern formation...

Composition for forming topcoat layer and resist pattern formation...

Aromatic imide compound and method for producing same

Composition for forming topcoat layer and resist pattern formation...

Rinse solution for lithography and pattern formation method employi...

Composition for forming fine pattern and method for forming fined p...

Composition for anti-reflective coating or radiation absorbing coat...

Radiation absorbing polymer, composition for radiation absorbing co...

Process for preparing resists

Radiation absorbing polymer, composition for radiation absorbing co...

Radiation-sensitive composition of chemical amplification type

Antireflection or light-absorbing coating composition and polymer t...

Process for preparing resists

Composition for bottom reflection preventive film and novel polymer...

Acid-labile group protected hydroxystyrene polymers or copolymers t...

Radiation-sensitive composition containing plasticizer

Silicone-compatible photoinitiators, and photosensitive mixtures co...

Radiation-sensitive composition

Radiation sensitive composition

Sulfonic acid esters, radiation-sensitive mixtures prepared therewi...

Radiation sensitive composition

Positive-acting radiation-sensitive mixture and recording material...

Patents Applicationslast 30 patents

TOP-LAYER MEMBRANE FORMATION COMPOSITION AND METHOD FOR FORMING RES...

COMPOSITION FOR FORMING TOPCOAT LAYER AND RESIST PATTERN FORMATION...

COMPOSITION FOR FORMING OVERLAY FILM, AND RESIST PATTERN FORMATION...

AROMATIC IMIDE COMPOUND AND METHOD FOR PRODUCING SAME

COMPOSITION FOR FORMING TOPCOAT LAYER AND RESIST PATTERN FORMATION...

OVERLAY FILM FORMING COMPOSITION AND RESIST PATTERN FORMATION METHO...

RINSE SOLUTION FOR LITHOGRAPHY AND PATTERN FORMATION METHOD EMPLOYI...

COMPOSITION FOR FORMING FINE PATTERN AND METHOD FOR FORMING FINED P...

RINSE SOLUTION FOR LITHOGRAPHY AND PATTERN FORMATION METHOD EMPLOYI...

Novel process for preparing resists