George R. Goth

Person

Poughkeepsie, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Reduction of chemical mechanical planarization (CMP) scratches with...
- Patent number 6,967,375
- Issue date Nov 22, 2005
- International Business Machines Corporation
- Rainer E. Gehres
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods to control the threshold voltage of a deep trench corner de...
- Patent number 6,518,145
- Issue date Feb 11, 2003
- International Business Machines Corporation
- Johann Alsmeier
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process controller for balancing usage of tool sets
- Patent number 6,021,360
- Issue date Feb 1, 2000
- International Business Machines Corporation
- Brian C. Barker
- G05 - CONTROLLING REGULATING
Information Patent Grant
Methods for protecting device components from chemical mechanical p...
- Patent number 5,976,982
- Issue date Nov 2, 1999
- Siemens Aktiengesellschaft
- Max G. Levy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-aligned channel stop
- Patent number 4,824,797
- Issue date Apr 25, 1989
- International Business Machines Corporation
- George R. Goth
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-aligned metal process for integrated circuit metallization
- Patent number 4,758,528
- Issue date Jul 19, 1988
- International Business Machines Corporation
- George R. Goth
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lateral device structures using self-aligned fabrication techniques
- Patent number 4,743,565
- Issue date May 10, 1988
- International Business Machines Corporation
- George R. Goth
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method of making shallow junction complementary vertical bipolar tr...
- Patent number 4,719,185
- Issue date Jan 12, 1988
- International Business Machines Corporation
- George R. Goth
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming self-aligned P contact
- Patent number 4,717,678
- Issue date Jan 5, 1988
- International Business Machines Corporation
- George R. Goth
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of making trench-incorporated monolithic semiconductor capac...
- Patent number 4,704,368
- Issue date Nov 3, 1987
- International Business Machines Corporation
- George R. Goth
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-aligned polysilicon base contact structure
- Patent number 4,691,219
- Issue date Sep 1, 1987
- International Business Machines Corporation
- George R. Goth
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lateral device structures using self-aligned fabrication techniques
- Patent number 4,688,073
- Issue date Aug 18, 1987
- George R. Goth
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Planarization process for organic filling of deep trenches
- Patent number 4,665,007
- Issue date May 12, 1987
- International Business Machines Corporation
- Nancy R. Cservak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-aligned metal structure for integrated circuits
- Patent number 4,608,589
- Issue date Aug 26, 1986
- International Business Machines Corporation
- George R. Goth
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal silicide channel stoppers for integrated circuits and method...
- Patent number 4,589,193
- Issue date May 20, 1986
- International Business Machines Corporation
- George R. Goth
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of selectively exposing the sidewalls of a trench and its us...
- Patent number 4,549,927
- Issue date Oct 29, 1985
- International Business Machines Corporation
- George R. Goth
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for making metal contact studs between first level metal and...
- Patent number 4,541,168
- Issue date Sep 17, 1985
- International Business Machines Corporation
- John R. Galie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Trench etch process for dielectric isolation
- Patent number 4,534,826
- Issue date Aug 13, 1985
- IBM Corporation
- George R. Goth
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lateral device structures using self-aligned fabrication techniques
- Patent number 4,508,579
- Issue date Apr 2, 1985
- International Business Machines Corporation
- George R. Goth
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Self-aligned metal process for integrated circuit metallization
- Patent number 4,400,865
- Issue date Aug 30, 1983
- International Business Machines Corporation
- George R. Goth
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Forming adjacent impurity regions in a semiconductor by oxide masking
- Patent number 4,151,010
- Issue date Apr 24, 1979
- International Business Machines Corporation
- George R. Goth
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Reduction of chemical mechanical planarization (CMP) scratches with...
- Publication number 20050151192
- Publication date Jul 14, 2005
- Rainer E. Gehres
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Self-aligned corner Vt enhancement with isolation channel stop by i...
- Publication number 20020179997
- Publication date Dec 5, 2002
- International Business Machines Corporation
- George R. Goth
- H01 - BASIC ELECTRIC ELEMENTS

George R. Goth

Person

Patents Grantslast 30 patents

Reduction of chemical mechanical planarization (CMP) scratches with...

Methods to control the threshold voltage of a deep trench corner de...

Process controller for balancing usage of tool sets

Methods for protecting device components from chemical mechanical p...

Self-aligned channel stop

Self-aligned metal process for integrated circuit metallization

Lateral device structures using self-aligned fabrication techniques

Method of making shallow junction complementary vertical bipolar tr...

Method of forming self-aligned P contact

Method of making trench-incorporated monolithic semiconductor capac...

Self-aligned polysilicon base contact structure

Lateral device structures using self-aligned fabrication techniques

Planarization process for organic filling of deep trenches

Self-aligned metal structure for integrated circuits

Metal silicide channel stoppers for integrated circuits and method...

Method of selectively exposing the sidewalls of a trench and its us...

Method for making metal contact studs between first level metal and...

Trench etch process for dielectric isolation

Lateral device structures using self-aligned fabrication techniques

Self-aligned metal process for integrated circuit metallization

Forming adjacent impurity regions in a semiconductor by oxide masking

Patents Applicationslast 30 patents

Reduction of chemical mechanical planarization (CMP) scratches with...

Self-aligned corner Vt enhancement with isolation channel stop by i...