This is a division of application Ser. No. 499,004 filed on July 11, 1983, now U.S. Pat. No. 4,608,589 which is a division of application Ser. No. 167,184 filed on July 8, 1980, now U.S. Pat. No. 4,400,865.
Number | Name | Date | Kind |
---|---|---|---|
3538399 | Bresee et al. | Nov 1970 | |
3597667 | Horn | Aug 1971 | |
3648125 | Peltzer | Mar 1972 | |
3750268 | Wang | Aug 1973 | |
3801880 | Harada et al. | Apr 1974 | |
3806778 | Shimakura et al. | Apr 1974 | |
3847687 | Davidsohn et al. | Nov 1974 | |
3902926 | Perloff et al. | Sep 1975 | |
3984822 | Simko et al. | Oct 1976 | |
4038107 | Marr et al. | Jul 1977 | |
4038110 | Feng | Jul 1977 | |
4056642 | Saxena et al. | Nov 1977 | |
4075045 | Rideout | Feb 1978 | |
4083098 | Nicholas | Apr 1978 | |
4089992 | Doo et al. | May 1978 | |
4104086 | Bondur et al. | Aug 1978 | |
4148055 | Edlinger et al. | Apr 1979 | |
4157269 | Ning et al. | Jun 1979 | |
4160991 | Anantha et al. | Jul 1979 | |
4173768 | Denlinger et al. | Nov 1979 | |
4178674 | Liu et al. | Dec 1979 | |
4209349 | Ho | Jun 1980 | |
4209350 | Ho et al. | Jun 1980 | |
4231819 | Raffel et al. | Nov 1980 | |
4234362 | Riseman | Nov 1980 | |
4236294 | Anantha et al. | Dec 1980 | |
4254428 | Feth et al. | Mar 1981 | |
4256514 | Pogge | Mar 1981 | |
4318751 | Horng | Mar 1982 | |
4319395 | Lund et al. | Mar 1982 | |
4319932 | Jambotkar | Mar 1982 | |
4322883 | Abbas et al. | Apr 1982 | |
4354896 | Hunter | Oct 1982 | |
4358340 | Fu | Nov 1982 | |
4359816 | Abbas et al. | Nov 1982 | |
4378627 | Jambotkar | Apr 1983 | |
4400865 | Goth et al. | Aug 1983 | |
4488162 | Jambotkar | Dec 1984 |
Number | Date | Country |
---|---|---|
1535086 | Dec 1978 | GBX |
2003660 | Mar 1979 | GBX |
Entry |
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Pogge, "Narrow Line-Width Masking Method", IBM Tech. Dis. Bull., vol. 19, No. 6, p. 2057, Nov. 1976. |
Abbas et al., "Extending the Minimal Dimensions of Photolithographic Integrated-Circuit Fabrication Processing", IBM Tech. Dis. Bull., vol 20, No. 4, p. 1376, Sep. 1977. |
Ning et al., "Bipolar Transistor Structure with Extended Metal Base Contacts and Diffused or Implanted Emitter", IBM Tech. Dis. Bull., vol. 22, No. 5, p. 2123, Oct. 1979. |
Dumke et al., "Self-Aligned Silicon MESFET Process", IBM Tech. Dis. Bull., vol. 22, No. 8A, p. 3418, Jan. 1980. |
Briska et al., "Method of Producing Schottky Contacts", IBM Tech. Dis. Bull., vol. 22, No. 11, p. 4964, Apr. 1980. |
Critchlow, "High Speed MOSFET Circuits Using Advanced Lithography", Computer, pp. 31-37, Feb. 1976. |
Jackson et al., "A Novel Submicron Fabrication Technique", Semiconductor International, pp. 77-83, Mar. 1980. |
Takemoto et al., "A Vertically Isolated Self-Aligned Transistor", Proc. of 1981 IEDM, pp. 708-709. |
"A Novel Submicron Fabrication Technique", by T. N. Jackson and N. A. Masnari, 1979 IEEE, pp. 58-61. |
"Fabrication of Devices with Submicrometer Dimensions Using a Selective Edge Plating Technique and Conventional Photolithography", p. 1829 of IEEE Transactions on Electron Devices, vol. ED-26, No. 11, (Nov. 1979). |
Number | Date | Country | |
---|---|---|---|
Parent | 499004 | Jul 1983 | |
Parent | 167184 | Jul 1980 |