Ger-Pin Lin

Person

New Taipei City, TW

People

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor device and method of manufacturing the same
- Patent number 10,861,855
- Issue date Dec 8, 2020
- United Microelectronics Corp.
- Li-Wei Feng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming semiconductor device having a multi-thickness ga...
- Patent number 10,847,517
- Issue date Nov 24, 2020
- United Microelectronics Corp.
- Tsuo-Wen Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of manufacturing the same
- Patent number 10,658,365
- Issue date May 19, 2020
- United Microelectronics Corp.
- Li-Wei Feng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure with diffusion barrier region and manufactu...
- Patent number 10,608,086
- Issue date Mar 31, 2020
- United Microelectronics Corp.
- Ger-Pin Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Buried word line structure and method of making the same
- Patent number 10,497,704
- Issue date Dec 3, 2019
- United Microelectronics Corp.
- Ger-Pin Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having a multi-thickness gate trench dielectri...
- Patent number 10,373,958
- Issue date Aug 6, 2019
- United Microelectronics Corp.
- Tsuo-Wen Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 10,332,889
- Issue date Jun 25, 2019
- United Microelectronics Corp.
- Ger-Pin Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Buried word line structure and method of making the same
- Patent number 10,217,750
- Issue date Feb 26, 2019
- United Microelectronics Corp.
- Ger-Pin Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating semiconductor device
- Patent number 10,056,388
- Issue date Aug 21, 2018
- United Microelectronics Corp.
- Ger-Pin Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and fabrication method thereof
- Patent number 10,056,288
- Issue date Aug 21, 2018
- United Microelectronics Corp.
- Tsuo-Wen Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lower dose rate ion implantation using a wider ion beam
- Patent number 9,748,072
- Issue date Aug 29, 2017
- Advanced Ion Beam Technology, Inc.
- Zhimin Wan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Forming punch-through stopper regions in finFET devices
- Patent number 9,450,078
- Issue date Sep 20, 2016
- Advanced Ion Beam Technology, Inc.
- Daniel Tang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for ion implantation
- Patent number 9,431,247
- Issue date Aug 30, 2016
- Advanced Ion Beam Technology, Inc.
- Zhimin Wan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor process
- Patent number 8,921,206
- Issue date Dec 30, 2014
- United Microelectronics Corp.
- Chan-Lon Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor process
- Patent number 8,536,072
- Issue date Sep 17, 2013
- United Microelectronics Corp.
- Chan-Lon Yang
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
- Publication number 20200235101
- Publication date Jul 23, 2020
- UNITED MICROELECTRONICS CORP.
- Li-Wei Feng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING SEMICONDUCTOR DEVICE HAVING A MULTI-THICKNESS GA...
- Publication number 20190312036
- Publication date Oct 10, 2019
- UNITED MICROELECTRONICS CORP.
- Tsuo-Wen Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BURIED WORD LINE STRUCTURE AND METHOD OF MAKING THE SAME
- Publication number 20190164977
- Publication date May 30, 2019
- UNITED MICROELECTRONICS CORP.
- Ger-Pin Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
- Publication number 20190081047
- Publication date Mar 14, 2019
- UNITED MICROELECTRONICS CORP.
- Li-Wei Feng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
- Publication number 20190074280
- Publication date Mar 7, 2019
- UNITED MICROELECTRONICS CORP.
- Ger-Pin Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BURIED WORD LINE STRUCTURE AND METHOD OF MAKING THE SAME
- Publication number 20190067293
- Publication date Feb 28, 2019
- UNITED MICROELECTRONICS CORP.
- Ger-Pin Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND FABRICATION METHOD THEREOF
- Publication number 20190035792
- Publication date Jan 31, 2019
- UNITED MICROELECTRONICS CORP.
- Tsuo-Wen Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FABRICATING BURIED WORD LINE AND GATE ON FINFET
- Publication number 20190013204
- Publication date Jan 10, 2019
- UNITED MICROELECTRONICS CORP.
- Tien-Chen Chan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FABRICATING BOTTOM ELECTRODE
- Publication number 20180226470
- Publication date Aug 9, 2018
- UNITED MICROELECTRONICS CORP.
- Ger-Pin Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR MEMORY DEVICE AND MANUFACTURING METHOD THEREOF
- Publication number 20180211961
- Publication date Jul 26, 2018
- UNITED MICROELECTRONICS CORP.
- Ger-Pin Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
- Publication number 20180197868
- Publication date Jul 12, 2018
- UNITED MICROELECTRONICS CORP.
- Ger-Pin Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD THEREOF
- Publication number 20180190771
- Publication date Jul 5, 2018
- UNITED MICROELECTRONICS CORP.
- Ger-Pin Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FABRICATING SEMICONDUCTOR DEVICE
- Publication number 20180190660
- Publication date Jul 5, 2018
- UNITED MICROELECTRONICS CORP.
- Ger-Pin Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME
- Publication number 20180190661
- Publication date Jul 5, 2018
- UNITED MICROELECTRONICS CORP.
- Yung-Ming Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIELECTRIC STRUCTURE AND MANUFACTURING METHOD THEREOF AND MEMORY ST...
- Publication number 20180182760
- Publication date Jun 28, 2018
- UNITED MICROELECTRONICS CORP.
- Ger-Pin Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMING PUNCH-THROUGH STOPPER REGIONS IN FINFET DEVICES
- Publication number 20160293734
- Publication date Oct 6, 2016
- ADVANCED ION BEAM TECHNOLOGY, INC.
- Daniel TANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR ION IMPLANTATION
- Publication number 20160133469
- Publication date May 12, 2016
- ADVANCED ION BEAM TECHNOLOGY, INC.
- Zhimin WAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOWER DOSE RATE ION IMPLANTATION USING A WIDER ION BEAM
- Publication number 20150371857
- Publication date Dec 24, 2015
- ADVANCED ION BEAM TECHNOLOGY, INC.
- Zhimin WAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESS
- Publication number 20150104914
- Publication date Apr 16, 2015
- United Microelectronics Corp.
- Chan-Lon Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESS
- Publication number 20130337622
- Publication date Dec 19, 2013
- United Microelectronics Corp.
- Chan-Lon Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESS
- Publication number 20130203226
- Publication date Aug 8, 2013
- United Microelectronics Corp.
- Chan-Lon Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESS
- Publication number 20130137243
- Publication date May 30, 2013
- Chan-Lon Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FABRICATING SEMICONDUCTOR DEVICE BY USING STRESS MEMORIZ...
- Publication number 20130023103
- Publication date Jan 24, 2013
- United Microelectronics Corp.
- Chan-Lon YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FABRICATING SEMICONDUCTOR DEVICE
- Publication number 20120315734
- Publication date Dec 13, 2012
- Chan-Lon Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METAL GATE STRUCTURE AND MANUFACTURING METHOD THEREOF
- Publication number 20120256275
- Publication date Oct 11, 2012
- Hsin-Fu Huang
- H01 - BASIC ELECTRIC ELEMENTS

Ger-Pin Lin

Person

Patents Grantslast 30 patents

Semiconductor device and method of manufacturing the same

Method for forming semiconductor device having a multi-thickness ga...

Semiconductor device and method of manufacturing the same

Semiconductor structure with diffusion barrier region and manufactu...

Buried word line structure and method of making the same

Semiconductor device having a multi-thickness gate trench dielectri...

Method of manufacturing a semiconductor device

Buried word line structure and method of making the same

Method for fabricating semiconductor device

Semiconductor device and fabrication method thereof

Lower dose rate ion implantation using a wider ion beam

Forming punch-through stopper regions in finFET devices

Method for ion implantation

Semiconductor process

Semiconductor process

Patents Applicationslast 30 patents

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME

METHOD FOR FORMING SEMICONDUCTOR DEVICE HAVING A MULTI-THICKNESS GA...

BURIED WORD LINE STRUCTURE AND METHOD OF MAKING THE SAME

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE

BURIED WORD LINE STRUCTURE AND METHOD OF MAKING THE SAME

SEMICONDUCTOR DEVICE AND FABRICATION METHOD THEREOF

METHOD OF FABRICATING BURIED WORD LINE AND GATE ON FINFET

METHOD OF FABRICATING BOTTOM ELECTRODE

SEMICONDUCTOR MEMORY DEVICE AND MANUFACTURING METHOD THEREOF

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF

SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD THEREOF

METHOD FOR FABRICATING SEMICONDUCTOR DEVICE

SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME

DIELECTRIC STRUCTURE AND MANUFACTURING METHOD THEREOF AND MEMORY ST...

FORMING PUNCH-THROUGH STOPPER REGIONS IN FINFET DEVICES

METHOD FOR ION IMPLANTATION

LOWER DOSE RATE ION IMPLANTATION USING A WIDER ION BEAM

SEMICONDUCTOR PROCESS

SEMICONDUCTOR PROCESS

SEMICONDUCTOR PROCESS

SEMICONDUCTOR PROCESS

METHOD FOR FABRICATING SEMICONDUCTOR DEVICE BY USING STRESS MEMORIZ...

METHOD FOR FABRICATING SEMICONDUCTOR DEVICE

METAL GATE STRUCTURE AND MANUFACTURING METHOD THEREOF