Gerald J. Alonzo

Person

Los Gatos, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Asymmetry correction via variable relative velocity of a wafer
- Patent number 11,764,069
- Issue date Sep 19, 2023
- Applied Materials, Inc.
- Jimin Zhang
- B24 - GRINDING POLISHING
Information Patent Grant
Methods for a web-based CMP system
- Patent number 11,717,936
- Issue date Aug 8, 2023
- Applied Materials, Inc.
- Dmitry Sklyar
- B24 - GRINDING POLISHING
Information Patent Grant
Disk-brush cleaner module with fluid jet
- Patent number 9,646,859
- Issue date May 9, 2017
- Applied Materials, Inc.
- Hui Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and methods for conditioning a polishing pad
- Patent number 7,963,826
- Issue date Jun 21, 2011
- Applied Materials, Inc.
- Roy C. Nangoy
- B24 - GRINDING POLISHING
Information Patent Grant
Pad characterization tool
- Patent number 7,407,433
- Issue date Aug 5, 2008
- Applied Materials, Inc.
- Rashid A. Mavliev
- B24 - GRINDING POLISHING
Information Patent Grant
Method for sequencing substrates
- Patent number 7,314,808
- Issue date Jan 1, 2008
- Applied Materials, Inc.
- Alpay Yilmaz
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ASYMMETRY CORRECTION VIA VARIABLE RELATIVE VELOCITY OF A WAFER
- Publication number 20220379428
- Publication date Dec 1, 2022
- Applied Materials, Inc.
- Jimin ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR A WEB-BASED CMP SYSTEM
- Publication number 20200086456
- Publication date Mar 19, 2020
- Applied Materials, Inc.
- Dmitry SKLYAR
- B24 - GRINDING POLISHING
Information Patent Application
APPARATUS AND METHODS FOR CONDITIONING A POLISHING PAD
- Publication number 20110318997
- Publication date Dec 29, 2011
- Applied Materials, Inc.
- Roy C. Nangoy
- B24 - GRINDING POLISHING
Information Patent Application
DISK-BRUSH CLEANER MODULE WITH FLUID JET
- Publication number 20110265816
- Publication date Nov 3, 2011
- Applied Materials, Inc.
- Hui Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHODS FOR CONDITIONING A POLISHING PAD
- Publication number 20100093263
- Publication date Apr 15, 2010
- Applied Materials, Inc.
- Roy C. Nangoy
- B24 - GRINDING POLISHING
Information Patent Application
METHOD OF CALIBRATING OR COMPENSATING SENSOR FOR MEASURING PROPERTY...
- Publication number 20090042481
- Publication date Feb 12, 2009
- Rashid A. Mavliev
- B24 - GRINDING POLISHING
Information Patent Application
APPARATUS AND METHODS FOR CONDITIONING A POLISHING PAD
- Publication number 20090036036
- Publication date Feb 5, 2009
- APPLIED MATERIALS, INC.
- Roy C. Nangoy
- B24 - GRINDING POLISHING
Information Patent Application
APPARATUS AND METHODS FOR CONDITIONING A POLISHING PAD
- Publication number 20090036035
- Publication date Feb 5, 2009
- APPLIED MATERIALS, INC.
- Roy C. Nangoy
- B24 - GRINDING POLISHING
Information Patent Application
METHOD FOR SEQUENCING SUBSTRATES
- Publication number 20080093022
- Publication date Apr 24, 2008
- ALPAY YILMAZ
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONDITIONING DISK HAVING UNIFORM STRUCTURES
- Publication number 20080014845
- Publication date Jan 17, 2008
- Alpay Yilmaz
- B24 - GRINDING POLISHING
Information Patent Application
Process for high copper removal rate with good planarization and su...
- Publication number 20070235344
- Publication date Oct 11, 2007
- APPLIED MATERIALS, INC.
- Renhe Jia
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
APPARATUS AND METHODS FOR CONDITIONING A POLISHING PAD
- Publication number 20070212983
- Publication date Sep 13, 2007
- APPLIED MATERIALS, INC.
- Roy C. Nangoy
- B24 - GRINDING POLISHING
Information Patent Application
Methods for electrochemical processing with pre-biased cells
- Publication number 20070158207
- Publication date Jul 12, 2007
- APPLIED MATERIALS, INC.
- Jie Diao
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
Apparatus and a method for electrochemical mechanical processing wi...
- Publication number 20070151867
- Publication date Jul 5, 2007
- APPLIED MATERIALS, INC.
- Yongqi Hu
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
Fully conductive pad for electrochemical mechanical processing
- Publication number 20070153453
- Publication date Jul 5, 2007
- APPLIED MATERIALS, INC.
- You Wang
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
Pad Characterization Tool
- Publication number 20070099545
- Publication date May 3, 2007
- APPLIED MATERIALS, INC.
- Rashid A. Mavliev
- B24 - GRINDING POLISHING
Information Patent Application
Conditioning element for electrochemical mechanical processing
- Publication number 20060276111
- Publication date Dec 7, 2006
- APPLIED MATERIALS, INC.
- Yuan A. Tian
- B24 - GRINDING POLISHING
Information Patent Application
Method for sequencing substrates
- Publication number 20060183408
- Publication date Aug 17, 2006
- APPLIED MATERIALS, INC.
- Alpay Yilmaz
- H01 - BASIC ELECTRIC ELEMENTS

Gerald J. Alonzo

Person

Patents Grantslast 30 patents

Asymmetry correction via variable relative velocity of a wafer

Methods for a web-based CMP system

Disk-brush cleaner module with fluid jet

Apparatus and methods for conditioning a polishing pad

Pad characterization tool

Method for sequencing substrates

Patents Applicationslast 30 patents

ASYMMETRY CORRECTION VIA VARIABLE RELATIVE VELOCITY OF A WAFER

METHODS FOR A WEB-BASED CMP SYSTEM

APPARATUS AND METHODS FOR CONDITIONING A POLISHING PAD

DISK-BRUSH CLEANER MODULE WITH FLUID JET

APPARATUS AND METHODS FOR CONDITIONING A POLISHING PAD

METHOD OF CALIBRATING OR COMPENSATING SENSOR FOR MEASURING PROPERTY...

APPARATUS AND METHODS FOR CONDITIONING A POLISHING PAD

APPARATUS AND METHODS FOR CONDITIONING A POLISHING PAD

METHOD FOR SEQUENCING SUBSTRATES

CONDITIONING DISK HAVING UNIFORM STRUCTURES

Process for high copper removal rate with good planarization and su...

APPARATUS AND METHODS FOR CONDITIONING A POLISHING PAD

Methods for electrochemical processing with pre-biased cells

Apparatus and a method for electrochemical mechanical processing wi...

Fully conductive pad for electrochemical mechanical processing

Pad Characterization Tool

Conditioning element for electrochemical mechanical processing

Method for sequencing substrates