Gerhard Beitel

Person

Kanagawa, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Sidewall structure and method of fabrication for reducing oxygen di...
- Patent number 7,042,705
- Issue date May 9, 2006
- Infineon Technologies AG
- Haoren Zhuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ferroelectric capacitor and process for its manufacture
- Patent number 7,031,138
- Issue date Apr 18, 2006
- Infineon Technologies AG
- Bum-Ki Moon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Barrier stack with improved barrier properties
- Patent number 7,009,230
- Issue date Mar 7, 2006
- Infineon Technologies Aktiengesellschaft
- Bum Ki Moon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Avoiding shorting in capacitors
- Patent number 6,897,501
- Issue date May 24, 2005
- Infineon Technologies Aktiengesellschaft
- Haoren Zhuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Element storage layer in integrated circuits
- Patent number 6,891,713
- Issue date May 10, 2005
- Infineon Technologies Aktiengesellschaft
- Bum Ki Moon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Memory cells with improved reliability
- Patent number 6,621,683
- Issue date Sep 16, 2003
- Infineon Technologies Aktiengesellschaft
- Bum-ki Moon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Capacitor over plug structure
- Patent number 6,614,642
- Issue date Sep 2, 2003
- Infineon Technologies Aktiengesellschaft
- Bum-ki Moon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Barrier for capacitor over plug structures
- Patent number 6,583,507
- Issue date Jun 24, 2003
- Bum Ki Moon
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Barrier Stack with Improved Barrier Properties
- Publication number 20040178431
- Publication date Sep 16, 2004
- Bum Ki Moon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AVOIDING SHORTING IN CAPACITORS
- Publication number 20040169211
- Publication date Sep 2, 2004
- Haoren Zhuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REDUCED CONTAMINATION OF TOOLS IN SEMICONDUCTOR PROCESSING
- Publication number 20040171252
- Publication date Sep 2, 2004
- Haoren Zhuang
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Method for formation of hardmask elements during a semiconductor de...
- Publication number 20040171274
- Publication date Sep 2, 2004
- Haoren Zhuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Sidewall structure and method of fabrication for reducing oxygen di...
- Publication number 20040149477
- Publication date Aug 5, 2004
- Haoren Zhuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ferroelectric capacitor and process for its manufacture
- Publication number 20040109280
- Publication date Jun 10, 2004
- Bum-Ki Moon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Element Storage Layer in Integrated Circuits
- Publication number 20040057193
- Publication date Mar 25, 2004
- Bum Ki Moon
- H01 - BASIC ELECTRIC ELEMENTS

Gerhard Beitel

Person

Patents Grantslast 30 patents

Sidewall structure and method of fabrication for reducing oxygen di...

Ferroelectric capacitor and process for its manufacture

Barrier stack with improved barrier properties

Avoiding shorting in capacitors

Element storage layer in integrated circuits

Memory cells with improved reliability

Capacitor over plug structure

Barrier for capacitor over plug structures

Patents Applicationslast 30 patents

Barrier Stack with Improved Barrier Properties

AVOIDING SHORTING IN CAPACITORS

REDUCED CONTAMINATION OF TOOLS IN SEMICONDUCTOR PROCESSING

Method for formation of hardmask elements during a semiconductor de...

Sidewall structure and method of fabrication for reducing oxygen di...

Ferroelectric capacitor and process for its manufacture

Element Storage Layer in Integrated Circuits