Gerhard Karl Strauch

Person

Aachen NRW, DE

People

Patents Grantslast 30 patents

Information Patent Grant
CVD method and CVD reactor
- Patent number 9,018,105
- Issue date Apr 28, 2015
- Aixtron SE
- Gerhard Karl Strauch
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for equipping an epitaxy reactor
- Patent number 8,846,501
- Issue date Sep 30, 2014
- Aixtron SE
- Gerhard Karl Strauch
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas distributor with pre-chambers arranged in planes
- Patent number 8,349,081
- Issue date Jan 8, 2013
- Aixtron SE
- Markus Reinhold
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas inlet element for a CVD reactor
- Patent number 8,298,337
- Issue date Oct 30, 2012
- Aixtron, Inc.
- Markus Reinhold
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process and apparatus for depositing semiconductor layers using two...
- Patent number 7,709,398
- Issue date May 4, 2010
- Aixtron AG
- Gerhard Karl Strauch
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Inlet system for an MOCVD reactor
- Patent number 7,625,448
- Issue date Dec 1, 2009
- Aixtron AG
- Martin Dauelsberg
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process for depositing thin layers on a substrate in a process cham...
- Patent number 7,524,532
- Issue date Apr 28, 2009
- Aixtron AG
- Holger Jurgensen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Device for depositing in particular crystalline layers on one or mo...
- Patent number 7,332,038
- Issue date Feb 19, 2008
- Aixtron AG
- Holger Jürgensen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Arrangement comprising a support body and a substrate holder which...
- Patent number 7,282,096
- Issue date Oct 16, 2007
- Aixtron AG
- Gerhard Karl Strauch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device and method for the deposition of, in particular, crystalline...
- Patent number 7,147,718
- Issue date Dec 12, 2006
- Aixtron AG
- Holger Jürgensen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for depositing especially crystalline layers from the gas ph...
- Patent number 7,128,785
- Issue date Oct 31, 2006
- Aixtron AG
- Johannes Kaeppeler
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
CVD coating device
- Patent number 7,067,012
- Issue date Jun 27, 2006
- Aixtron AG
- Holger Jürgensen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for depositing in particular crystalline layers, and device...
- Patent number 6,972,050
- Issue date Dec 6, 2005
- Aixtron AG
- Michael Bremser
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and device for depositing in particular organic layers using...
- Patent number 6,962,624
- Issue date Nov 8, 2005
- Aixtron AG
- Holger Jürgensen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Device for the deposition of crystalline layers on crystalline subs...
- Patent number 6,905,548
- Issue date Jun 14, 2005
- Aixtron AG
- Holger Jürgensen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
COATING DEVICE AND METHOD FOR OPERATING A COATING DEVICE HAVING A S...
- Publication number 20130040054
- Publication date Feb 14, 2013
- AIXTRON SE
- Gerhard Karl Strauch
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CVD Reactor Having Gas Inlet Zones that Run in a Strip-Like Manner...
- Publication number 20120263877
- Publication date Oct 18, 2012
- Gerhard Karl Strauch
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CVD REACTOR
- Publication number 20120156396
- Publication date Jun 21, 2012
- Gerhard Karl Strauch
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CVD METHOD AND CVD REACTOR
- Publication number 20120149212
- Publication date Jun 14, 2012
- Gerhard Karl Strauch
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR EQUIPPING AN EPITAXY REACTOR
- Publication number 20120094474
- Publication date Apr 19, 2012
- AIXTRON SE
- Gerhard Karl Strauch
- C30 - CRYSTAL GROWTH
Information Patent Application
ISOLATION FOR MULTI-SINGLE-WAFER PROCESSING APPARATUS
- Publication number 20100012036
- Publication date Jan 21, 2010
- Hugo Silva
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Process And Apparatus For Depositing Semiconductor Layers Using Two...
- Publication number 20100012034
- Publication date Jan 21, 2010
- Gerhard Karl Strauch
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEVICE FOR TEMPERATURE-CONTROLLED ACCOMMODATION OF A CONTAINER
- Publication number 20090283040
- Publication date Nov 19, 2009
- AIXTRON INC.
- Markus Reinhold
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Process for Depositing Thin Layers on a Substrate in a Process Cham...
- Publication number 20090178620
- Publication date Jul 16, 2009
- Holger Juergensen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEVICE FOR VAPORIZING CONDENSED SUBSTANCES
- Publication number 20090107401
- Publication date Apr 30, 2009
- Markus Reinhold
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS INLET ELEMENT FOR A CVD REACTOR
- Publication number 20090025639
- Publication date Jan 29, 2009
- Markus Reinhold
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS DISTRIBUTOR WITH PRE-CHAMBERS DISPOSED IN PLANES
- Publication number 20090013930
- Publication date Jan 15, 2009
- Markus Reinhold
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SMALL VOLUME SYMMETRIC FLOW SINGLE WAFER ALD APPARATUS
- Publication number 20080072821
- Publication date Mar 27, 2008
- Jeremic J. Dalton
- C30 - CRYSTAL GROWTH
Information Patent Application
Inlet system for an MOCVD reactor
- Publication number 20080069953
- Publication date Mar 20, 2008
- Aixtron AG
- Martin Dauelsberg
- C30 - CRYSTAL GROWTH
Information Patent Application
CVD coating device
- Publication number 20060201427
- Publication date Sep 14, 2006
- Holger Jurgensen
- C30 - CRYSTAL GROWTH
Information Patent Application
Mask-retaining device
- Publication number 20060124055
- Publication date Jun 15, 2006
- Walter Franken
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Process and apparatus for depositing semiconductor layers using two...
- Publication number 20060121193
- Publication date Jun 8, 2006
- Gerhard Karl Strauch
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Process and device for depositing thin layers on a substrate in a p...
- Publication number 20050106319
- Publication date May 19, 2005
- Holger Jurgensen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Process and device for depositing semiconductor layers
- Publication number 20050106864
- Publication date May 19, 2005
- Holger Jurgensen
- C30 - CRYSTAL GROWTH
Information Patent Application
Device for depositing thin layers on a substrate
- Publication number 20050081788
- Publication date Apr 21, 2005
- Holger Jurgensen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Process chamber with a base with sectionally different rotational d...
- Publication number 20040231599
- Publication date Nov 25, 2004
- Markus Schwambera
- C30 - CRYSTAL GROWTH
Information Patent Application
Method and device for short-term thermal-treatment of flat objects
- Publication number 20040168639
- Publication date Sep 2, 2004
- Gerhard Karl Strauch
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Application
Arrangement comprising a support body and a substrate holder which...
- Publication number 20040154544
- Publication date Aug 12, 2004
- Gerhard Karl Strauch
- C30 - CRYSTAL GROWTH
Information Patent Application
Method for depositing especially crystalline layers from the gas ph...
- Publication number 20040129215
- Publication date Jul 8, 2004
- Johannes Kaeppeler
- C30 - CRYSTAL GROWTH
Information Patent Application
Method and device for the metered delivery of low volumetric flows...
- Publication number 20040035202
- Publication date Feb 26, 2004
- Gerhard Karl Strauch
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Device and method for feeding a liquid starting material, which has...
- Publication number 20040013800
- Publication date Jan 22, 2004
- Gerhard Karl Strauch
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for depositing in particular crystalline layers, and device...
- Publication number 20040013801
- Publication date Jan 22, 2004
- Michael Bremser
- C30 - CRYSTAL GROWTH
Information Patent Application
Device and method for the depostion of, in particular, crystalline...
- Publication number 20040005731
- Publication date Jan 8, 2004
- Holger Jurgensen
- C30 - CRYSTAL GROWTH
Information Patent Application
Device for depositing in particular crystalline layers on one or mo...
- Publication number 20040003779
- Publication date Jan 8, 2004
- Holger Jurgensen
- C30 - CRYSTAL GROWTH
Information Patent Application
CVD coating device
- Publication number 20030221624
- Publication date Dec 4, 2003
- Holger Jurgensen
- C30 - CRYSTAL GROWTH

Gerhard Karl Strauch

Person

Patents Grantslast 30 patents

CVD method and CVD reactor

Method for equipping an epitaxy reactor

Gas distributor with pre-chambers arranged in planes

Gas inlet element for a CVD reactor

Process and apparatus for depositing semiconductor layers using two...

Inlet system for an MOCVD reactor

Process for depositing thin layers on a substrate in a process cham...

Device for depositing in particular crystalline layers on one or mo...

Arrangement comprising a support body and a substrate holder which...

Device and method for the deposition of, in particular, crystalline...

Method for depositing especially crystalline layers from the gas ph...

CVD coating device

Method for depositing in particular crystalline layers, and device...

Method and device for depositing in particular organic layers using...

Device for the deposition of crystalline layers on crystalline subs...

Patents Applicationslast 30 patents

COATING DEVICE AND METHOD FOR OPERATING A COATING DEVICE HAVING A S...

CVD Reactor Having Gas Inlet Zones that Run in a Strip-Like Manner...

CVD REACTOR

CVD METHOD AND CVD REACTOR

METHOD FOR EQUIPPING AN EPITAXY REACTOR

ISOLATION FOR MULTI-SINGLE-WAFER PROCESSING APPARATUS

Process And Apparatus For Depositing Semiconductor Layers Using Two...

DEVICE FOR TEMPERATURE-CONTROLLED ACCOMMODATION OF A CONTAINER

Process for Depositing Thin Layers on a Substrate in a Process Cham...

DEVICE FOR VAPORIZING CONDENSED SUBSTANCES

GAS INLET ELEMENT FOR A CVD REACTOR

GAS DISTRIBUTOR WITH PRE-CHAMBERS DISPOSED IN PLANES

SMALL VOLUME SYMMETRIC FLOW SINGLE WAFER ALD APPARATUS

Inlet system for an MOCVD reactor

CVD coating device

Mask-retaining device

Process and apparatus for depositing semiconductor layers using two...

Process and device for depositing thin layers on a substrate in a p...

Process and device for depositing semiconductor layers

Device for depositing thin layers on a substrate

Process chamber with a base with sectionally different rotational d...

Method and device for short-term thermal-treatment of flat objects

Arrangement comprising a support body and a substrate holder which...

Method for depositing especially crystalline layers from the gas ph...

Method and device for the metered delivery of low volumetric flows...

Device and method for feeding a liquid starting material, which has...

Method for depositing in particular crystalline layers, and device...

Device and method for the depostion of, in particular, crystalline...

Device for depositing in particular crystalline layers on one or mo...

CVD coating device