Gerhard Kunkel

Person

Radebeul, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Memory devices including semiconductor pillars
- Patent number 8,362,537
- Issue date Jan 29, 2013
- Qimonda AG
- Gerhard Kunkel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for adapting structure dimensions during the photolithograph...
- Patent number 7,482,110
- Issue date Jan 27, 2009
- Infineon Technologies AG
- Gerhard Kunkel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photolithographic mask having half tone main features and perpendic...
- Patent number 7,465,522
- Issue date Dec 16, 2008
- Infineon Technologies AG
- Lothar Bauch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for producing a phase mask
- Patent number 7,462,426
- Issue date Dec 9, 2008
- Infineon Technologies AG
- Wolfgang Henke
- G02 - OPTICS
Information Patent Grant
Phase-shift mask
- Patent number 7,074,529
- Issue date Jul 11, 2006
- Infineon Technologies AG
- Shahid Butt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Buried bit line-field isolation defined active semiconductor areas
- Patent number 6,911,687
- Issue date Jun 28, 2005
- Infineon Technologies AG
- Jack A. Mandelman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of reducing pitch on semiconductor wafer
- Patent number 6,842,222
- Issue date Jan 11, 2005
- Infineon Technologies AG
- Gerhard Kunkel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus for patterning a semiconductor wafer
- Patent number 6,809,800
- Issue date Oct 26, 2004
- Infineon Technologies AG
- Oliver Genz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Grating patterns and method for determination of azimuthal and radi...
- Patent number 6,606,151
- Issue date Aug 12, 2003
- Infineon Technologies AG
- Gerhard Kunkel
- G01 - MEASURING TESTING
Information Patent Grant
Method of forming a self aligned trench in a semiconductor using a...
- Patent number 6,566,219
- Issue date May 20, 2003
- Infineon Technologies AG
- Gerhard Kunkel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for patterning a semiconductor wafer
- Patent number 6,558,883
- Issue date May 6, 2003
- Infineon Technologies AG
- Oliver Genz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multiple exposure process for formation of dense rectangular arrays
- Patent number 6,511,791
- Issue date Jan 28, 2003
- International Business Machines Corporation
- Scott J. Bukofsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Plural interleaved exposure process for increased feature aspect ra...
- Patent number 6,451,508
- Issue date Sep 17, 2002
- International Business Machines Corporation
- Scott J. Bukofsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask and method for increasing image aspect ratio while relaxi...
- Patent number 6,383,691
- Issue date May 7, 2002
- Infineon Technologies AG
- Mihel Seitz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Dynamic random access memory
- Patent number 6,282,116
- Issue date Aug 28, 2001
- Infineon Technologies North America Corp.
- Gerhard Kunkel
- G11 - INFORMATION STORAGE

Patents Applicationslast 30 patents

Information Patent Application
MEMORY DEVICES INCLUDING SEMICONDUCTOR PILLARS
- Publication number 20120126301
- Publication date May 24, 2012
- QIMONDA AG
- Gerhard Kunkel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEMORY DEVICES INCLUDING SEMICONDUCTOR PILLARS
- Publication number 20100090263
- Publication date Apr 15, 2010
- QIMONDA AG
- Gerhard Kunkel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Manufacturing Contact Openings, Method for Manufacturing...
- Publication number 20090321940
- Publication date Dec 31, 2009
- Gerhard Kunkel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Mask and exposure device
- Publication number 20060121365
- Publication date Jun 8, 2006
- Infineon Technologies AG
- Gerhard Kunkel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for adapting structure dimensions during the photolithograph...
- Publication number 20060001858
- Publication date Jan 5, 2006
- Gerhard Kunkel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for producing a phase mask
- Publication number 20050196683
- Publication date Sep 8, 2005
- Wolfgang Henke
- G02 - OPTICS
Information Patent Application
Method for producing a mask adapted to an exposure apparatus
- Publication number 20050106476
- Publication date May 19, 2005
- Jens Hassmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for forming an opening on an alternating phase shift mask
- Publication number 20050026049
- Publication date Feb 3, 2005
- Ralf Ziebold
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photolithographic mask
- Publication number 20040256356
- Publication date Dec 23, 2004
- Lothar Bauch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Phase-shift mask
- Publication number 20040229134
- Publication date Nov 18, 2004
- Shahid Butt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of reducing pitch on semiconductor wafer
- Publication number 20040196445
- Publication date Oct 7, 2004
- Gerhard Kunkel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for the characterization of an illumination source in an exp...
- Publication number 20040027553
- Publication date Feb 12, 2004
- Wolfgang Henke
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Apparatus for patterning a semiconductor wafer
- Publication number 20030218727
- Publication date Nov 27, 2003
- Oliver Genz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Grating patterns and method for determination of azimuthal and radi...
- Publication number 20030020901
- Publication date Jan 30, 2003
- Gerhard Kunkel
- G01 - MEASURING TESTING
Information Patent Application
Apparatus and method for patterning a semiconductor wafer
- Publication number 20020127501
- Publication date Sep 12, 2002
- Oliver Genz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Self aligned trench and method of forming the same
- Publication number 20020068400
- Publication date Jun 6, 2002
- Infineon Technologies North America Corp.
- Gerhard Kunkel
- H01 - BASIC ELECTRIC ELEMENTS

Gerhard Kunkel

Person

Patents Grantslast 30 patents

Memory devices including semiconductor pillars

Method for adapting structure dimensions during the photolithograph...

Photolithographic mask having half tone main features and perpendic...

Method for producing a phase mask

Phase-shift mask

Buried bit line-field isolation defined active semiconductor areas

Method of reducing pitch on semiconductor wafer

Apparatus for patterning a semiconductor wafer

Grating patterns and method for determination of azimuthal and radi...

Method of forming a self aligned trench in a semiconductor using a...

Apparatus and method for patterning a semiconductor wafer

Multiple exposure process for formation of dense rectangular arrays

Plural interleaved exposure process for increased feature aspect ra...

Photomask and method for increasing image aspect ratio while relaxi...

Dynamic random access memory

Patents Applicationslast 30 patents

MEMORY DEVICES INCLUDING SEMICONDUCTOR PILLARS

MEMORY DEVICES INCLUDING SEMICONDUCTOR PILLARS

Method for Manufacturing Contact Openings, Method for Manufacturing...

Mask and exposure device

Method for adapting structure dimensions during the photolithograph...

Method for producing a phase mask

Method for producing a mask adapted to an exposure apparatus

Method for forming an opening on an alternating phase shift mask

Photolithographic mask

Phase-shift mask

Method of reducing pitch on semiconductor wafer

Method for the characterization of an illumination source in an exp...

Apparatus for patterning a semiconductor wafer

Grating patterns and method for determination of azimuthal and radi...

Apparatus and method for patterning a semiconductor wafer

Self aligned trench and method of forming the same