Gerhard Stengl

Person

Wernberg, AT

People

Patents Grantslast 30 patents

Information Patent Grant
Charged particle beam exposure system and beam manipulating arrange...
- Patent number 8,368,030
- Issue date Feb 5, 2013
- Carl Zeiss SMS GmbH
- Elmar Platzgummer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Particle-optical system
- Patent number 8,368,015
- Issue date Feb 5, 2013
- Carl Zeiss SMS GmbH
- Elmar Platzgummer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle system
- Patent number 8,049,189
- Issue date Nov 1, 2011
- Carl Zeiss SMS GmbH
- Herbert Buschbeck
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Pattern lock system for particle-beam exposure apparatus
- Patent number 7,772,574
- Issue date Aug 10, 2010
- IMS Nanofabrication AG
- Gerhard Stengl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged-particle exposure apparatus
- Patent number 7,737,422
- Issue date Jun 15, 2010
- IMS Nanofabrication AG
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Compensation of magnetic fields
- Patent number 7,436,120
- Issue date Oct 14, 2008
- IMS Nanofabrication GmbH
- Herbert Buschbeck
- G05 - CONTROLLING REGULATING
Information Patent Grant
Particle-optical projection system
- Patent number 7,388,217
- Issue date Jun 17, 2008
- IMS Nanofabrication GmbH
- Herbert Buschbeck
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged-particle multi-beam exposure apparatus
- Patent number 7,214,951
- Issue date May 8, 2007
- IMS Nanofabrication GmbH
- Gerhard Stengl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle-optic electrostatic lens
- Patent number 7,199,373
- Issue date Apr 3, 2007
- IMS Nanofabrication GmbH
- Gerhard Stengl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged-particle multi-beam exposure apparatus
- Patent number 7,041,992
- Issue date May 9, 2006
- IMS Nanofabrication GmbH
- Gerhard Stengl
Information Patent Grant
Method of synthesising carbon nano tubes
- Patent number 7,033,647
- Issue date Apr 25, 2006
- Electrovac, Fabrikation elektrotechnischer Spezialartikel Gesellschaft m.b.H.
- Xinhe Tang
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Particle multibeam lithography
- Patent number 6,989,546
- Issue date Jan 24, 2006
- IMS-Innenmikrofabrikations Systeme GmbH
- Hans Loschner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion irradiation of a target at very high and very low kinetic ion e...
- Patent number 6,909,103
- Issue date Jun 21, 2005
- IMS-Ionen Mikrofabrikations Systeme GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for enhancing the lifetime of stencil masks
- Patent number 6,858,118
- Issue date Feb 22, 2005
- IMS-Ionen Mikrofabrikations Systeme GmbH
- Elmar Platzgummer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Maskless particle-beam system for exposing a pattern on a substrate
- Patent number 6,768,125
- Issue date Jul 27, 2004
- IMS Nanofabrication, GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern lock system
- Patent number 6,661,015
- Issue date Dec 9, 2003
- IMS-Ionen Mikrofabrikations Systeme GmbH
- Alfred Chalupka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle-optical imaging system for lithography purposes
- Patent number 6,326,632
- Issue date Dec 4, 2001
- IMS-Ionen Mikrofabrikations Systeme GmbH
- Herbert Buschbeck
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electrostatic lens
- Patent number 6,194,730
- Issue date Feb 27, 2001
- IMS-Ionen Mikrofabrikations Systeme GmbH
- Alfred Chalupka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Arrangement for shadow-casting lithography
- Patent number 5,874,739
- Issue date Feb 23, 1999
- Ims-Ionen Mikrofabrikations Systems BMGH
- Herbert Buschbeck
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Field composable electrostatic lens system
- Patent number 5,869,838
- Issue date Feb 9, 1999
- Advanced Lithography Group
- Gerhard Stengl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle beam, in particular ionic optic imaging system
- Patent number 5,801,388
- Issue date Sep 1, 1998
- IMS-Ionen Mikropfabrikations Systeme GmbH
- Gerhard Stengl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Arrangement for masked beam lithography by means of electrically ch...
- Patent number 5,742,062
- Issue date Apr 21, 1998
- IMS Mikrofabrikations Systeme GmbH
- Gerhard Stengl
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Projection system for charged particles
- Patent number 5,693,950
- Issue date Dec 2, 1997
- IMS Ionen Mikrofabrikations Systeme GmbH
- Gerhard Stengl
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Ion-optical imaging system
- Patent number 5,436,460
- Issue date Jul 25, 1995
- IMS Ionen Mikrofabrikations Systeme Gesellschaft mbH
- Gerhard Stengl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle-beam imaging system
- Patent number 5,378,917
- Issue date Jan 3, 1995
- IMS Ionen Mikrofabrations Systeme Gesellschaft m.b.H.
- Alfred Chalupka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion-optical imaging system
- Patent number 5,350,924
- Issue date Sep 27, 1994
- IMS Ionen Mikrofabrikations Systems Gesellschaft mbH
- Gerhard Stengl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion source
- Patent number 5,317,161
- Issue date May 31, 1994
- IMS Ionen Mikrofabrikations Systeme Gesellschaft mbH
- Alfred Chalupka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam lithography
- Patent number 4,985,634
- Issue date Jan 15, 1991
- Oesterreichische Investitionskredit Aktiengesellschaft and Ionen Mikrofabrica...
- Gerhard Stengl
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method and apparatus for image alignment in ion lithography
- Patent number 4,967,088
- Issue date Oct 30, 1990
- Oesterreichische Investitionskredit Aktiengesellschaft
- Gerhard Stengl
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Ion beam apparatus and method of modifying substrate
- Patent number 4,924,104
- Issue date May 8, 1990
- IMS Ionen Mikrofabrikations Systeme Gesellschaft mbH
- Gerhard Stengl
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Particle-Optical System
- Publication number 20100270474
- Publication date Oct 28, 2010
- CARL ZEISS SMS GMBH
- Elmar Platzgummer
- B82 - NANO-TECHNOLOGY
Information Patent Application
Pattern Lock System for Particle-Beam Exposure Apparatus
- Publication number 20090146082
- Publication date Jun 11, 2009
- IMS Nanofabrication AG
- Gerhard Stengl
- B82 - NANO-TECHNOLOGY
Information Patent Application
Charged particle beam exposure system and beam manipulating arrange...
- Publication number 20090140160
- Publication date Jun 4, 2009
- CARL ZEISS SMS GMBH
- Elmar Platzgummer
- B82 - NANO-TECHNOLOGY
Information Patent Application
Charged-Particle Exposure Apparatus
- Publication number 20080258084
- Publication date Oct 23, 2008
- IMS Nanofabrication AG
- Elmar Platzgummer
- B82 - NANO-TECHNOLOGY
Information Patent Application
Charged Particle System
- Publication number 20080210887
- Publication date Sep 4, 2008
- CARL ZEISS SMS GMBH
- Herbert Buschbeck
- B82 - NANO-TECHNOLOGY
Information Patent Application
Particle-optical projection system
- Publication number 20070125956
- Publication date Jun 7, 2007
- Herbert Buschbeck
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD OF SYNTHESISING CARBON NANO TUBES
- Publication number 20060068096
- Publication date Mar 30, 2006
- ELECTROVAC, FABRIKATION ELEKTROTECHNISCHER SPEZIALARTIKEL GESELLSCHAFT M.B.H.
- Xinhe Tang
- C30 - CRYSTAL GROWTH
Information Patent Application
Particle-optical projection system
- Publication number 20050201246
- Publication date Sep 15, 2005
- IMS Nanofabrication GmbH
- Herbert Buschbeck
- B82 - NANO-TECHNOLOGY
Information Patent Application
Compensation of magnetic fields
- Publication number 20050195551
- Publication date Sep 8, 2005
- IMS Nanofabrication GmbH
- Herbert Buschbeck
- G05 - CONTROLLING REGULATING
Information Patent Application
Charged-particle multi-beam exposure apparatus
- Publication number 20050104013
- Publication date May 19, 2005
- IMS Nanofabrication GmbH
- Gerhard Stengl
- B82 - NANO-TECHNOLOGY
Information Patent Application
Particle-optic electrostatic lens
- Publication number 20050072933
- Publication date Apr 7, 2005
- Gerhard Stengl
- B82 - NANO-TECHNOLOGY
Information Patent Application
Ion irradiation of a target at very high and very low kinetic ion e...
- Publication number 20050012052
- Publication date Jan 20, 2005
- IMS-Ionen Mikrofabrikations Systeme GmbH
- Elmar Platzgummer
- B82 - NANO-TECHNOLOGY
Information Patent Application
Apparatus for enhancing the lifetime of stencil masks
- Publication number 20040188243
- Publication date Sep 30, 2004
- Elmar Platzgummer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PARTICLE MULTIBEAM LITHOGRAPHY
- Publication number 20030209676
- Publication date Nov 13, 2003
- HANS LOSCHNER
- B82 - NANO-TECHNOLOGY
Information Patent Application
Maskless particle-beam system for exposing a pattern on a substrate
- Publication number 20030155534
- Publication date Aug 21, 2003
- Elmar Platzgummer
- B82 - NANO-TECHNOLOGY
Information Patent Application
Field ionization ion source
- Publication number 20030122085
- Publication date Jul 3, 2003
- Gerhard Stengl
- B82 - NANO-TECHNOLOGY
Information Patent Application
Pattern lock system
- Publication number 20020033457
- Publication date Mar 21, 2002
- Alfred Chalupka
- H01 - BASIC ELECTRIC ELEMENTS

Gerhard Stengl

Person

Patents Grantslast 30 patents

Charged particle beam exposure system and beam manipulating arrange...

Particle-optical system

Charged particle system

Pattern lock system for particle-beam exposure apparatus

Charged-particle exposure apparatus

Compensation of magnetic fields

Particle-optical projection system

Charged-particle multi-beam exposure apparatus

Particle-optic electrostatic lens

Charged-particle multi-beam exposure apparatus

Method of synthesising carbon nano tubes

Particle multibeam lithography

Ion irradiation of a target at very high and very low kinetic ion e...

Apparatus for enhancing the lifetime of stencil masks

Maskless particle-beam system for exposing a pattern on a substrate

Pattern lock system

Particle-optical imaging system for lithography purposes

Electrostatic lens

Arrangement for shadow-casting lithography

Field composable electrostatic lens system

Particle beam, in particular ionic optic imaging system

Arrangement for masked beam lithography by means of electrically ch...

Projection system for charged particles

Ion-optical imaging system

Particle-beam imaging system

Ion-optical imaging system

Ion source

Ion beam lithography

Method and apparatus for image alignment in ion lithography

Ion beam apparatus and method of modifying substrate

Patents Applicationslast 30 patents

Particle-Optical System

Pattern Lock System for Particle-Beam Exposure Apparatus

Charged particle beam exposure system and beam manipulating arrange...

Charged-Particle Exposure Apparatus

Charged Particle System

Particle-optical projection system

METHOD OF SYNTHESISING CARBON NANO TUBES

Particle-optical projection system

Compensation of magnetic fields

Charged-particle multi-beam exposure apparatus

Particle-optic electrostatic lens

Ion irradiation of a target at very high and very low kinetic ion e...

Apparatus for enhancing the lifetime of stencil masks

PARTICLE MULTIBEAM LITHOGRAPHY

Maskless particle-beam system for exposing a pattern on a substrate

Field ionization ion source

Pattern lock system