Gert-Jan Snijders

Person

Amersfoort, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Deposition of TiN films in a batch reactor
- Patent number 7,966,969
- Issue date Jun 28, 2011
- ASM International N.V.
- Albert Hasper
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Chemical vapor deposition of TiN films in a batch reactor
- Patent number 7,732,350
- Issue date Jun 8, 2010
- ASM International N.V.
- Albert Hasper
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Reactor design for reduced particulate generation
- Patent number 7,427,571
- Issue date Sep 23, 2008
- ASM International, N.V.
- Bartholomeus Hans Louis Lindeboom
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for the heat treatment of substrates
- Patent number 7,410,355
- Issue date Aug 12, 2008
- ASM International N.V.
- Ernst H. A. Granneman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pressure control system
- Patent number 7,253,107
- Issue date Aug 7, 2007
- ASM International N.V.
- Gert Jan Snijders
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas supply system, valve assembly and method of forming reactant pu...
- Patent number 6,981,517
- Issue date Jan 3, 2006
- ASM International N.V
- Gert-Jan Snijders
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Grant
Apparatus, method and system for the treatment of a wafer
- Patent number 6,877,250
- Issue date Apr 12, 2005
- ASM International N.V
- Ernst Hendrik August Granneman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for treating wafers, provided with a sensor box
- Patent number 6,876,191
- Issue date Apr 5, 2005
- ASM International N.V
- Christianus Gerardus M. de Ridder
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus, method and system for the treatment of a wafer
- Patent number 6,560,896
- Issue date May 13, 2003
- ASM International N.V
- Ernst Hendrik August Granneman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for treating a wafer
- Patent number 6,551,404
- Issue date Apr 22, 2003
- ASM International N.V
- Gert-Jan Snijders
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and device for transferring wafers
- Patent number 6,481,945
- Issue date Nov 19, 2002
- ASM International N.V
- Albert Hasper
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Storage assembly for wafers
- Patent number 6,357,984
- Issue date Mar 19, 2002
- ASM International N.V
- Jan Zinger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System for transferring wafers from cassettes to furnaces and method
- Patent number 6,139,239
- Issue date Oct 31, 2000
- ASM International N.V.
- Gert-Jan Snijders
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Deposition of TiN films in a batch reactor
- Publication number 20070077775
- Publication date Apr 5, 2007
- Albert Hasper
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for the heat treatment of substrates
- Publication number 20060141808
- Publication date Jun 29, 2006
- ASM International N.V., a Netherlands corporation
- Ernst H.A. Granneman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Reactor design for reduced particulate generation
- Publication number 20060105107
- Publication date May 18, 2006
- Bartholomeus Hans Louis Lindeboom
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Deposition of TiN films in a batch reactor
- Publication number 20060060137
- Publication date Mar 23, 2006
- Albert Hasper
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Pressure control system
- Publication number 20050279454
- Publication date Dec 22, 2005
- Gert Jan Snijders
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Gas supply system, valve assembly and method of forming reactant pu...
- Publication number 20040250853
- Publication date Dec 16, 2004
- Gert-Jan Snijders
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
Apparatus for treating wafers, provided with a sensor box
- Publication number 20030178142
- Publication date Sep 25, 2003
- Christianus Gerardus M. de Ridder
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus, method and system for the treatment of a wafer
- Publication number 20030101612
- Publication date Jun 5, 2003
- Ernst Hendrik August Granneman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus, method and system for the treatment of a wafer
- Publication number 20010011425
- Publication date Aug 9, 2001
- Ernst Hendrik August Granneman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus for treating a wafer
- Publication number 20010006095
- Publication date Jul 5, 2001
- Gert-Jan Snijders
- H01 - BASIC ELECTRIC ELEMENTS

Gert-Jan Snijders

Person

Patents Grantslast 30 patents

Deposition of TiN films in a batch reactor

Chemical vapor deposition of TiN films in a batch reactor

Reactor design for reduced particulate generation

Method for the heat treatment of substrates

Pressure control system

Gas supply system, valve assembly and method of forming reactant pu...

Apparatus, method and system for the treatment of a wafer

Apparatus for treating wafers, provided with a sensor box

Apparatus, method and system for the treatment of a wafer

Apparatus for treating a wafer

Method and device for transferring wafers

Storage assembly for wafers

System for transferring wafers from cassettes to furnaces and method

Patents Applicationslast 30 patents

Deposition of TiN films in a batch reactor

Method for the heat treatment of substrates

Reactor design for reduced particulate generation

Deposition of TiN films in a batch reactor

Pressure control system

Gas supply system, valve assembly and method of forming reactant pu...

Apparatus for treating wafers, provided with a sensor box

Apparatus, method and system for the treatment of a wafer

Apparatus, method and system for the treatment of a wafer

Apparatus for treating a wafer