Giang Dao

Person

Austin, TX, US

People

Patents Grantslast 30 patents

Information Patent Grant
Reduced particle contamination manufacturing and packaging for reti...
- Patent number 7,368,020
- Issue date May 6, 2008
- Intel Corporation
- Giang T. Dao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for keeping contamination away from a mask during exposur...
- Patent number 6,793,717
- Issue date Sep 21, 2004
- Intel Corporation
- Han-Ming Wu
- B03 - SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES O...
Information Patent Grant
Method of transporting a reticle
- Patent number 6,763,608
- Issue date Jul 20, 2004
- Intel Corporation
- Giang T. Dao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for removing photomask contamination and contr...
- Patent number 6,734,443
- Issue date May 11, 2004
- Intel Corporation
- Jun Fei Zheng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reduced particle contamination manufacturing and packaging for reti...
- Patent number 6,732,746
- Issue date May 11, 2004
- Intel Corporation
- Giang T. Dao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reduced particle contamination manufacturing and packaging for reti...
- Patent number 6,715,495
- Issue date Apr 6, 2004
- Intel Corporation
- Giang T. Dao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ balancing for phase-shifting mask
- Patent number 6,660,649
- Issue date Dec 9, 2003
- Intel Corporation
- Giang Dao
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method and apparatus for physical image based inspection system
- Patent number 6,625,800
- Issue date Sep 23, 2003
- Intel Corporation
- Qi-De Qian
- G01 - MEASURING TESTING
Information Patent Grant
Filtered mask enclosure
- Patent number 6,610,123
- Issue date Aug 26, 2003
- Intel Corporation
- Han-Ming Wu
- B03 - SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES O...
Information Patent Grant
Detection of contaminants on low wavelength masks
- Patent number 6,611,327
- Issue date Aug 26, 2003
- Intel Corporation
- Arun Ramamoorthy
- G01 - MEASURING TESTING
Information Patent Grant
Hinged pellicles and methods of use
- Patent number 6,569,582
- Issue date May 27, 2003
- Intel Corporation
- Jerry C. Cullins
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
In-situ balancing for phase-shifting mask
- Patent number 6,548,417
- Issue date Apr 15, 2003
- Intel Corporation
- Giang Dao
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method for making a photolithographic mask
- Patent number 6,537,706
- Issue date Mar 25, 2003
- Intel Corporation
- Qing Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reduced particle contamination manufacturing and packaging for reti...
- Patent number 6,279,249
- Issue date Aug 28, 2001
- Intel Corporation
- Giang T. Dao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Attenuated phase-shifted reticle using sub-resolution pattern
- Patent number 5,881,125
- Issue date Mar 9, 1999
- Intel Corporation
- Giang T. Dao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for precision determination of phase-shift in...
- Patent number 5,789,118
- Issue date Aug 4, 1998
- Intel Corporation
- Gang Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for precision determination of phase-shift in...
- Patent number 5,700,602
- Issue date Dec 23, 1997
- Intel Corporation
- Giang T. Dao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Processes for fabricating device layers with ultrafine features
- Patent number 5,688,409
- Issue date Nov 18, 1997
- Intel Corporation
- Giang T. Dao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Layout methodology, mask set, and patterning method for phase-shift...
- Patent number 5,635,316
- Issue date Jun 3, 1997
- Intel Corporation
- Giang T. Dao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography using a new phase-shifting reticle
- Patent number 5,633,102
- Issue date May 27, 1997
- Intel Corporation
- Kenny K. H. Toh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Layout methodology, mask set, and patterning method for phase-shift...
- Patent number 5,620,816
- Issue date Apr 15, 1997
- Intel Corporation
- Giang T. Dao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Embedded phase shifting mask with improved relative attenuated film...
- Patent number 5,618,643
- Issue date Apr 8, 1997
- Intel Corporation
- Giang T. Dao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Layout methodology, mask set, and patterning method for phase-shift...
- Patent number 5,595,843
- Issue date Jan 21, 1997
- Intel Corporation
- Giang T. Dao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase-shifted opaquing ring
- Patent number 5,446,521
- Issue date Aug 29, 1995
- Intel Corporation
- Robert F. Hainsey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reticle with structurally identical inverted phase-shifted features
- Patent number 5,384,219
- Issue date Jan 24, 1995
- Intel Corporation
- Giang T. Dao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reticle with structurally identical inverted phase-shifted features
- Patent number 5,348,826
- Issue date Sep 20, 1994
- Intel Corporation
- Giang T. Dao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inverted phase-shifted reticle
- Patent number 5,302,477
- Issue date Apr 12, 1994
- Intel Corporation
- Giang T. Dao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of fabrication of inverted phase-shifted reticle
- Patent number 5,300,379
- Issue date Apr 5, 1994
- Intel Corporation
- Giang T. Dao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Reduced particle contamination manufacturing and packaging for reti...
- Publication number 20040191649
- Publication date Sep 30, 2004
- Giang T. Dao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Filtered mask enclosure
- Publication number 20040045433
- Publication date Mar 11, 2004
- Han-Ming Wu
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
FILTERED MASK ENCLOSURE
- Publication number 20030110944
- Publication date Jun 19, 2003
- Han-Ming Wu
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
In-situ balancing for phase-shifting mask
- Publication number 20030054262
- Publication date Mar 20, 2003
- Giang Dao
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
IN-SITU BALANCING FOR PHASE-SHIFTING MASK
- Publication number 20030054260
- Publication date Mar 20, 2003
- Giang Dao
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Method of transporting a reticle
- Publication number 20030035096
- Publication date Feb 20, 2003
- Intel Corporation
- Giang T. Dao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus and method for removing photomask contamination and contr...
- Publication number 20020179852
- Publication date Dec 5, 2002
- Jun Fei Zheng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Hinged pellicles and methods of use
- Publication number 20020155358
- Publication date Oct 24, 2002
- Intel Corporation
- Jerry C. Cullins
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Detection of contaminants on low wavelength masks
- Publication number 20020135759
- Publication date Sep 26, 2002
- Arun Ramamoorthy
- G01 - MEASURING TESTING
Information Patent Application
Reduced particle contamination manufacturing and packaging for reti...
- Publication number 20010006418
- Publication date Jul 5, 2001
- Giang T. Dao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Reduced particle contamination manufacturing and packaging for reti...
- Publication number 20010005944
- Publication date Jul 5, 2001
- Giang T. Dao
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Reduced particle contamination manufacturing and packaging for reti...

Apparatus for keeping contamination away from a mask during exposur...

Method of transporting a reticle

Apparatus and method for removing photomask contamination and contr...

Reduced particle contamination manufacturing and packaging for reti...

Reduced particle contamination manufacturing and packaging for reti...

In-situ balancing for phase-shifting mask

Method and apparatus for physical image based inspection system

Filtered mask enclosure

Detection of contaminants on low wavelength masks

Hinged pellicles and methods of use

In-situ balancing for phase-shifting mask

Method for making a photolithographic mask

Reduced particle contamination manufacturing and packaging for reti...

Attenuated phase-shifted reticle using sub-resolution pattern

Method and apparatus for precision determination of phase-shift in...

Method and apparatus for precision determination of phase-shift in...

Processes for fabricating device layers with ultrafine features

Layout methodology, mask set, and patterning method for phase-shift...

Lithography using a new phase-shifting reticle

Layout methodology, mask set, and patterning method for phase-shift...

Embedded phase shifting mask with improved relative attenuated film...

Layout methodology, mask set, and patterning method for phase-shift...

Phase-shifted opaquing ring

Reticle with structurally identical inverted phase-shifted features

Reticle with structurally identical inverted phase-shifted features

Inverted phase-shifted reticle

Method of fabrication of inverted phase-shifted reticle

Patents Applicationslast 30 patents

Reduced particle contamination manufacturing and packaging for reti...

Filtered mask enclosure

FILTERED MASK ENCLOSURE

In-situ balancing for phase-shifting mask

IN-SITU BALANCING FOR PHASE-SHIFTING MASK

Method of transporting a reticle

Apparatus and method for removing photomask contamination and contr...

Hinged pellicles and methods of use

Detection of contaminants on low wavelength masks

Reduced particle contamination manufacturing and packaging for reti...

Reduced particle contamination manufacturing and packaging for reti...