Gill Yong Lee

Person

Fishkill, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Silicon oxynitride cap for fluorinated silicate glass film in inter...
- Patent number 6,300,672
- Issue date Oct 9, 2001
- Siemens Aktiengesellschaft
- Gill Yong Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Formation of controlled trench top isolation layers for vertical tr...
- Patent number 6,184,091
- Issue date Feb 6, 2001
- Infineon Technologies North America Corp.
- Ulrike Gruening
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Formation of controlled trench top isolation layers for vertical tr...
- Patent number 6,177,698
- Issue date Jan 23, 2001
- Infineon Technologies North America Corp.
- Ulrike Gruening
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Prevention of photoresist poisoning from dielectric antireflective...
- Patent number 6,103,456
- Issue date Aug 15, 2000
- Siemens Aktiengesellschaft
- Dirk Tobben
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
High density plasma CVD process for making dielectric anti-reflecti...
- Patent number 6,060,132
- Issue date May 9, 2000
- Siemens Aktiengesellschaft
- Gill Yong Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Hard etch mask
- Patent number 6,020,091
- Issue date Feb 1, 2000
- Siemens Aktiengesellschaft
- Gill Yong Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon oxynitride cap for fluorinated silicate glass film in inter...
- Patent number 6,008,120
- Issue date Dec 28, 1999
- Siemens Aktiengesellschaft
- Gill Yong Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Endpoint detection method and apparatus
- Patent number 5,955,380
- Issue date Sep 21, 1999
- Siemens Aktiengesellschaft
- Gill Yong Lee
- H01 - BASIC ELECTRIC ELEMENTS

Gill Yong Lee

Person

Patents Grantslast 30 patents

Silicon oxynitride cap for fluorinated silicate glass film in inter...

Formation of controlled trench top isolation layers for vertical tr...

Formation of controlled trench top isolation layers for vertical tr...

Prevention of photoresist poisoning from dielectric antireflective...

High density plasma CVD process for making dielectric anti-reflecti...

Hard etch mask

Silicon oxynitride cap for fluorinated silicate glass film in inter...

Endpoint detection method and apparatus