Gisela VON BLANCKENHAGEN

Person

Aalen, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Multilayer mirror
- Patent number 10,209,411
- Issue date Feb 19, 2019
- Carl Zeiss SMT GmbH
- Aksel Goehnermeier
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective optical element
- Patent number 10,061,205
- Issue date Aug 28, 2018
- Carl Zeiss SMT GmbH
- Dirk Heinrich Ehm
- G02 - OPTICS
Information Patent Grant
Reflective optical element and optical system for EUV lithography
- Patent number 9,996,005
- Issue date Jun 12, 2018
- Carl Zeiss SMT GmbH
- Dirk Heinrich Ehm
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for producing a capping layer composed of silicon oxide on a...
- Patent number 9,880,476
- Issue date Jan 30, 2018
- Carl Zeiss SMT GmbH
- Dirk Heinrich Ehm
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Mirror for the EUV wavelength range, method for producing such a mi...
- Patent number 9,696,632
- Issue date Jul 4, 2017
- Carl Zeiss SMT GmbH
- Peter Huber
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Mirror for the EUV wavelength range, substrate for such a mirror, p...
- Patent number 9,494,718
- Issue date Nov 15, 2016
- Carl Zeiss SMT GmbH
- Stephan Muellender
- B82 - NANO-TECHNOLOGY
Information Patent Grant
EUV mirror comprising an oxynitride capping layer having a stable c...
- Patent number 9,229,331
- Issue date Jan 5, 2016
- Carl Zeiss SMT GmbH
- Gisela von Blanckenhagen
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Reflective optical element and method for production of such an opt...
- Patent number 8,430,514
- Issue date Apr 30, 2013
- Carl Zeiss SMT GmbH
- Gisela Von Blanckenhagen
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Reflective optical element and method for production of such an opt...
- Patent number 8,246,182
- Issue date Aug 21, 2012
- Carl Zeiss SMT GmbH
- Gisela Von Blanckenhagen
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
EUV MULTILAYER MIRROR, OPTICAL SYSTEM INCLUDING A MULTILAYER MIRROR...
- Publication number 20170365371
- Publication date Dec 21, 2017
- Carl Zeiss SMT GMBH
- Qiushi HUANG
- G02 - OPTICS
Information Patent Application
REFLECTIVE OPTICAL ELEMENT
- Publication number 20170160639
- Publication date Jun 8, 2017
- Carl Zeiss SMT GMBH
- Dirk Heinrich EHM
- G02 - OPTICS
Information Patent Application
MULTILAYER MIRROR
- Publication number 20160202396
- Publication date Jul 14, 2016
- Carl Zeiss SMT GMBH
- Aksel GOEHNERMEIER
- G02 - OPTICS
Information Patent Application
Mirror for the EUV Wavelength Range, Method for Producing such a Mi...
- Publication number 20150055108
- Publication date Feb 26, 2015
- Carl Zeiss SMT GMBH
- Peter Huber
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
EUV MIRROR COMPRISING AN OXYNITRIDE CAPPING LAYER HAVING A STABLE C...
- Publication number 20140211179
- Publication date Jul 31, 2014
- Carl Zeiss SMT GMBH
- Gisela von BLANCKENHAGEN
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD FOR PRODUCING A CAPPING LAYER COMPOSED OF SILICON OXIDE ON A...
- Publication number 20140211178
- Publication date Jul 31, 2014
- Carl Zeiss SMT GMBH
- Dirk Heinrich EHM
- B82 - NANO-TECHNOLOGY
Information Patent Application
REFLECTIVE OPTICAL ELEMENT AND OPTICAL SYSTEM FOR EUV LITHOGRAPHY
- Publication number 20140199543
- Publication date Jul 17, 2014
- Carl Zeiss SMT GMBH
- Dirk Heinrich EHM
- B82 - NANO-TECHNOLOGY
Information Patent Application
MIRROR FOR THE EUV WAVELENGTH RANGE, SUBSTRATE FOR SUCH A MIRROR, P...
- Publication number 20130038929
- Publication date Feb 14, 2013
- Carl Zeiss SMT GMBH
- Stephan MUELLENDER
- B82 - NANO-TECHNOLOGY
Information Patent Application
REFLECTIVE OPTICAL ELEMENT AND METHOD FOR PRODUCTION OF SUCH AN OPT...
- Publication number 20120314281
- Publication date Dec 13, 2012
- Carl Zeiss SMT GMBH
- Gisela VON BLANCKENHAGEN
- B82 - NANO-TECHNOLOGY
Information Patent Application
REFLECTIVE OPTICAL ELEMENT AND METHOD FOR OPERATING AN EUV LITHOGRA...
- Publication number 20120250144
- Publication date Oct 4, 2012
- Carl Zeiss SMT GMBH
- Dirk Heinrich EHM
- G02 - OPTICS
Information Patent Application
REFLECTIVE OPTICAL ELEMENT AND METHOD FOR PRODUCTION OF SUCH AN OPT...
- Publication number 20110228234
- Publication date Sep 22, 2011
- Carl Zeiss SMT GMBH
- Gisela VON BLANCKENHAGEN
- G02 - OPTICS

Gisela VON BLANCKENHAGEN

Person

Patents Grantslast 30 patents

Multilayer mirror

Reflective optical element

Reflective optical element and optical system for EUV lithography

Method for producing a capping layer composed of silicon oxide on a...

Mirror for the EUV wavelength range, method for producing such a mi...

Mirror for the EUV wavelength range, substrate for such a mirror, p...

EUV mirror comprising an oxynitride capping layer having a stable c...

Reflective optical element and method for production of such an opt...

Reflective optical element and method for production of such an opt...

Patents Applicationslast 30 patents

EUV MULTILAYER MIRROR, OPTICAL SYSTEM INCLUDING A MULTILAYER MIRROR...

REFLECTIVE OPTICAL ELEMENT

MULTILAYER MIRROR

Mirror for the EUV Wavelength Range, Method for Producing such a Mi...

EUV MIRROR COMPRISING AN OXYNITRIDE CAPPING LAYER HAVING A STABLE C...

METHOD FOR PRODUCING A CAPPING LAYER COMPOSED OF SILICON OXIDE ON A...

REFLECTIVE OPTICAL ELEMENT AND OPTICAL SYSTEM FOR EUV LITHOGRAPHY

MIRROR FOR THE EUV WAVELENGTH RANGE, SUBSTRATE FOR SUCH A MIRROR, P...

REFLECTIVE OPTICAL ELEMENT AND METHOD FOR PRODUCTION OF SUCH AN OPT...

REFLECTIVE OPTICAL ELEMENT AND METHOD FOR OPERATING AN EUV LITHOGRA...

REFLECTIVE OPTICAL ELEMENT AND METHOD FOR PRODUCTION OF SUCH AN OPT...