Goichi Yoshidome

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Methods for shaping magnetic fields during semiconductor processing
- Patent number 12,203,163
- Issue date Jan 21, 2025
- Applied Materials, Inc.
- Goichi Yoshidome
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Etch uniformity improvement for single turn internal coil PVD chamber
- Patent number 12,136,544
- Issue date Nov 5, 2024
- Applied Materials, Inc.
- Anthony Chih-Tung Chan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for generating magnetic fields on substrates during semic...
- Patent number 12,027,352
- Issue date Jul 2, 2024
- Applied Materials, Inc.
- Suhas Bangalore Umesh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Shield for a substrate processing chamber
- Patent number 11,658,016
- Issue date May 23, 2023
- Applied Materials, Inc.
- Kathleen Scheible
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
3D printed chamber components configured for lower film stress and...
- Patent number 11,569,069
- Issue date Jan 31, 2023
- Applied Materials, Inc.
- Kadthala R. Narendrnath
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Heated shield for physical vapor deposition chamber
- Patent number 11,339,466
- Issue date May 24, 2022
- Applied Materials, Inc.
- Ilya Lavitsky
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process shield for a substrate processing chamber
- Patent number D941372
- Issue date Jan 18, 2022
- Applied Materials, Inc.
- Ilya Lavitsky
- D15 - Machines not elsewhere specified
Information Patent Grant
Process shield for a substrate processing chamber
- Patent number D941371
- Issue date Jan 18, 2022
- Applied Materials, Inc.
- Ilya Lavitsky
- D15 - Machines not elsewhere specified
Information Patent Grant
Deposition ring for a substrate processing chamber
- Patent number D934315
- Issue date Oct 26, 2021
- Applied Materials, Inc.
- Ilya Lavitsky
- D15 - Machines not elsewhere specified
Information Patent Grant
3D printed chamber components configured for lower film stress and...
- Patent number 10,777,391
- Issue date Sep 15, 2020
- Applied Materials, Inc.
- Kadthala R. Narendrnath
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Collimator for use in a physical vapor deposition chamber
- Patent number 10,697,057
- Issue date Jun 30, 2020
- Applied Materials, Inc.
- Goichi Yoshidome
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for dynamically treating atomic layer deposit...
- Patent number 10,563,304
- Issue date Feb 18, 2020
- Applied Materials, Inc.
- Xiangjin Xie
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Holding assembly for substrate processing chamber
- Patent number 10,347,475
- Issue date Jul 9, 2019
- Applied Materials, Inc.
- Kathleen Scheible
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Source magnet for improved resputtering uniformity in direct curren...
- Patent number 9,831,075
- Issue date Nov 28, 2017
- Applied Materials, Inc.
- Goichi Yoshidome
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Self-centering process shield
- Patent number 9,644,262
- Issue date May 9, 2017
- Applied Materials, Inc.
- Ryan Hanson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
PVD target for self-centering process shield
- Patent number 9,534,286
- Issue date Jan 3, 2017
- Applied Materials, Inc.
- Goichi Yoshidome
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Selectively groundable cover ring for substrate process chambers
- Patent number 9,472,443
- Issue date Oct 18, 2016
- Applied Materials, Inc.
- Muhammad M. Rasheed
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process kit and target for substrate processing chamber
- Patent number 9,127,362
- Issue date Sep 8, 2015
- Applied Materials, Inc.
- Kathleen Scheible
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cooling ring for physical vapor deposition chamber target
- Patent number 9,096,927
- Issue date Aug 4, 2015
- Applied Materials, Inc.
- Brian West
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering of thermally resistive materials including metal chalcog...
- Patent number 8,500,963
- Issue date Aug 6, 2013
- Applied Materials, Inc.
- Mengqi Ye
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Mechanism for varying the spacing between sputter magnetron and target
- Patent number 7,674,360
- Issue date Mar 9, 2010
- Applied Materials, Inc.
- Ilyoung Richard Hong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
Methods and Apparatus for Processing a Substrate
- Publication number 20240218498
- Publication date Jul 4, 2024
- Applied Materials, Inc.
- Goichi YOSHIDOME
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR SHAPING MAGNETIC FIELDS DURING SEMICONDUCTOR PROCESSING
- Publication number 20220380888
- Publication date Dec 1, 2022
- Goichi YOSHIDOME
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS FOR GENERATING MAGNETIC FIELDS ON SUBSTRATES DURING SEMIC...
- Publication number 20220384194
- Publication date Dec 1, 2022
- Applied Materials, Inc.
- Goichi YOSHIDOME
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR GENERATING MAGNETIC FIELDS ON SUBSTRATES DURING SEMIC...
- Publication number 20220384164
- Publication date Dec 1, 2022
- Suhas BANGALORE UMESH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COIL FOR IMPROVED PROCESS CHAMBER DEPOSITION AND ETCH UNIFORMITY
- Publication number 20220293392
- Publication date Sep 15, 2022
- Applied Materials, Inc.
- Rui Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HEATED SHIELD FOR PHYSICAL VAPOR DEPOSITION CHAMBER
- Publication number 20210292888
- Publication date Sep 23, 2021
- Applied Materials, Inc.
- Ilya Lavitsky
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
3D PRINTED CHAMBER COMPONENTS CONFIGURED FOR LOWER FILM STRESS AND...
- Publication number 20200365374
- Publication date Nov 19, 2020
- Applied Materials, Inc.
- Kadthala R. NARENDRNATH
- B22 - CASTING POWDER METALLURGY
Information Patent Application
Treatment And Doping Of Barrier Layers
- Publication number 20190385908
- Publication date Dec 19, 2019
- Applied Materials, Inc.
- Xiangjin Xie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHIELD FOR A SUBSTRATE PROCESSING CHAMBER
- Publication number 20190267220
- Publication date Aug 29, 2019
- APPLIED MATERIALS, INC.
- Kathleen Scheible
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
BARRIER FILM DEPOSITION AND TREATMENT
- Publication number 20180294162
- Publication date Oct 11, 2018
- XIANGJIN XIE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
COLLIMATOR FOR USE IN A PHYSICAL VAPOR DEPOSITION CHAMBER
- Publication number 20180142342
- Publication date May 24, 2018
- Applied Materials, Inc.
- GOICHI YOSHIDOME
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
3D PRINTED CHAMBER COMPONENTS CONFIGURED FOR LOWER FILM STRESS AND...
- Publication number 20160233060
- Publication date Aug 11, 2016
- Applied Materials, Inc.
- Kadthala R. NARENDRNATH
- B33 - ADDITIVE MANUFACTURING TECHNOLOGY
Information Patent Application
HOLDING ASSEMBLY FOR SUBSTRATE PROCESSING CHAMBER
- Publication number 20150380223
- Publication date Dec 31, 2015
- APPLIED MATERIALS, INC.
- Kathleen Scheible
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SOURCE MAGNET FOR IMPROVED RESPUTTERING UNIFORMITY IN DIRECT CURREN...
- Publication number 20150075982
- Publication date Mar 19, 2015
- Applied Materials, Inc.
- GOICHI YOSHIDOME
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PVD TARGET FOR SELF-CENTERING PROCESS SHIELD
- Publication number 20140261180
- Publication date Sep 18, 2014
- Applied Materials, Inc.
- GOICHI YOSHIDOME
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELF-CENTERING PROCESS SHIELD
- Publication number 20140261175
- Publication date Sep 18, 2014
- Applied Materials, Inc.
- RYAN HANSON
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVELY GROUNDABLE COVER RING FOR SUBSTRATE PROCESS CHAMBERS
- Publication number 20140262763
- Publication date Sep 18, 2014
- Applied Materials, Inc.
- MUHAMMAD M. RASHEED
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
COOLING RING FOR PHYSICAL VAPOR DEPOSITION CHAMBER TARGET
- Publication number 20130056347
- Publication date Mar 7, 2013
- Applied Materials, Inc.
- BRIAN WEST
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
EXTENDED LIFE TEXTURED CHAMBER COMPONENTS AND METHOD FOR FABRICATIN...
- Publication number 20120258280
- Publication date Oct 11, 2012
- Applied Materials, Inc.
- Michael Jackson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAP FILL IMPROVEMENT METHODS FOR PHASE-CHANGE MATERIALS
- Publication number 20120175245
- Publication date Jul 12, 2012
- Mengqi Ye
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAP FILL IMPROVEMENT METHODS FOR PHASE-CHANGE MATERIALS
- Publication number 20100096255
- Publication date Apr 22, 2010
- APPLIED MATERIALS, INC.
- MENGQI YE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHALCOGENIDE TARGET AND METHOD
- Publication number 20090107834
- Publication date Apr 30, 2009
- APPLIED MATERIALS, INC.
- Mengqi Ye
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SPUTTERING OF THERMALLY RESISTIVE MATERIALS INCLUDING METAL CHALCOG...
- Publication number 20080099326
- Publication date May 1, 2008
- Applied Meterials, Inc.
- MENGQI YE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESS KIT AND TARGET FOR SUBSTRATE PROCESSING CHAMBER
- Publication number 20070102286
- Publication date May 10, 2007
- APPLIED MATERIALS, INC.
- Kathleen Scheible
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Mechanism for varying the spacing between sputter magnetron and target
- Publication number 20050133365
- Publication date Jun 23, 2005
- Ilyoung Richard Hong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Compensation of spacing between magnetron and sputter target
- Publication number 20050133361
- Publication date Jun 23, 2005
- APPLIED MATERIALS, INC.
- Peijun Ding
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Goichi Yoshidome

Person

Patents Grantslast 30 patents

Methods for shaping magnetic fields during semiconductor processing

Etch uniformity improvement for single turn internal coil PVD chamber

Apparatus for generating magnetic fields on substrates during semic...

Shield for a substrate processing chamber

3D printed chamber components configured for lower film stress and...

Heated shield for physical vapor deposition chamber

Process shield for a substrate processing chamber

Process shield for a substrate processing chamber

Deposition ring for a substrate processing chamber

3D printed chamber components configured for lower film stress and...

Collimator for use in a physical vapor deposition chamber

Methods and apparatus for dynamically treating atomic layer deposit...

Holding assembly for substrate processing chamber

Source magnet for improved resputtering uniformity in direct curren...

Self-centering process shield

PVD target for self-centering process shield

Selectively groundable cover ring for substrate process chambers

Process kit and target for substrate processing chamber

Cooling ring for physical vapor deposition chamber target

Sputtering of thermally resistive materials including metal chalcog...

Mechanism for varying the spacing between sputter magnetron and target

Patents Applicationslast 30 patents

Methods and Apparatus for Processing a Substrate

METHODS FOR SHAPING MAGNETIC FIELDS DURING SEMICONDUCTOR PROCESSING

APPARATUS FOR GENERATING MAGNETIC FIELDS ON SUBSTRATES DURING SEMIC...

APPARATUS FOR GENERATING MAGNETIC FIELDS ON SUBSTRATES DURING SEMIC...

COIL FOR IMPROVED PROCESS CHAMBER DEPOSITION AND ETCH UNIFORMITY

HEATED SHIELD FOR PHYSICAL VAPOR DEPOSITION CHAMBER

3D PRINTED CHAMBER COMPONENTS CONFIGURED FOR LOWER FILM STRESS AND...

Treatment And Doping Of Barrier Layers

SHIELD FOR A SUBSTRATE PROCESSING CHAMBER

BARRIER FILM DEPOSITION AND TREATMENT

COLLIMATOR FOR USE IN A PHYSICAL VAPOR DEPOSITION CHAMBER

3D PRINTED CHAMBER COMPONENTS CONFIGURED FOR LOWER FILM STRESS AND...

HOLDING ASSEMBLY FOR SUBSTRATE PROCESSING CHAMBER

SOURCE MAGNET FOR IMPROVED RESPUTTERING UNIFORMITY IN DIRECT CURREN...

PVD TARGET FOR SELF-CENTERING PROCESS SHIELD

SELF-CENTERING PROCESS SHIELD

SELECTIVELY GROUNDABLE COVER RING FOR SUBSTRATE PROCESS CHAMBERS

COOLING RING FOR PHYSICAL VAPOR DEPOSITION CHAMBER TARGET

EXTENDED LIFE TEXTURED CHAMBER COMPONENTS AND METHOD FOR FABRICATIN...

GAP FILL IMPROVEMENT METHODS FOR PHASE-CHANGE MATERIALS

GAP FILL IMPROVEMENT METHODS FOR PHASE-CHANGE MATERIALS

CHALCOGENIDE TARGET AND METHOD

SPUTTERING OF THERMALLY RESISTIVE MATERIALS INCLUDING METAL CHALCOG...

PROCESS KIT AND TARGET FOR SUBSTRATE PROCESSING CHAMBER

Mechanism for varying the spacing between sputter magnetron and target

Compensation of spacing between magnetron and sputter target