Gregory P. Muldowney

Person

Glen Mills, PA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Chemical mechanical polishing method
- Patent number 8,257,142
- Issue date Sep 4, 2012
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Gregory P. Muldowney
- B24 - GRINDING POLISHING
Information Patent Grant
High-rate groove pattern
- Patent number 8,062,103
- Issue date Nov 22, 2011
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Gregory P. Muldowney
- B24 - GRINDING POLISHING
Information Patent Grant
High-rate polishing method
- Patent number 8,057,282
- Issue date Nov 15, 2011
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Gregory P. Muldowney
- B24 - GRINDING POLISHING
Information Patent Grant
Interconnected-multi-element-lattice polishing pad
- Patent number 7,828,634
- Issue date Nov 9, 2010
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Bo Jiang
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing pad having secondary polishing medium...
- Patent number 7,807,252
- Issue date Oct 5, 2010
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Jeffrey J. Hendron
- B24 - GRINDING POLISHING
Information Patent Grant
Three-dimensional network for chemical mechanical polishing
- Patent number 7,771,251
- Issue date Aug 10, 2010
- Rohm and Haas Electronic
- Gregory P. Muldowney
- B24 - GRINDING POLISHING
Information Patent Grant
Interpenetrating network for chemical mechanical polishing
- Patent number 7,635,291
- Issue date Dec 22, 2009
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Gregory P. Muldowney
- B24 - GRINDING POLISHING
Information Patent Grant
Interpenetrating network for chemical mechanical polishing
- Patent number 7,635,290
- Issue date Dec 22, 2009
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Gregory P. Muldowney
- B24 - GRINDING POLISHING
Information Patent Grant
Three-dimensional network for chemical mechanical polishing
- Patent number 7,604,529
- Issue date Oct 20, 2009
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Gregory P. Muldowney
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing pad with controlled wetting
- Patent number 7,530,887
- Issue date May 12, 2009
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Bo Jiang
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad with grooves to reduce slurry consumption
- Patent number 7,520,796
- Issue date Apr 21, 2009
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Gregory P. Muldowney
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad with grooves to reduce slurry consumption
- Patent number 7,520,798
- Issue date Apr 21, 2009
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Gregory P. Muldowney
- B24 - GRINDING POLISHING
Information Patent Grant
Layered-filament lattice for chemical mechanical polishing
- Patent number 7,517,277
- Issue date Apr 14, 2009
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Gregory P. Muldowney
- B24 - GRINDING POLISHING
Information Patent Grant
Three-dimensional network for chemical mechanical polishing
- Patent number 7,503,833
- Issue date Mar 17, 2009
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Gregory P. Muldowney
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad with grooves to retain slurry on the pad texture
- Patent number 7,311,590
- Issue date Dec 25, 2007
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Gregory P. Muldowney
- B24 - GRINDING POLISHING
Information Patent Grant
CMP pad having overlaid constant area spiral grooves
- Patent number 7,300,340
- Issue date Nov 27, 2007
- Rohm and Haas Electronics Materials CMP Holdings, Inc.
- Carolina L. Elmufdi
- B24 - GRINDING POLISHING
Information Patent Grant
CMP pad having unevenly spaced grooves
- Patent number 7,267,610
- Issue date Sep 11, 2007
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Carolina L. Elmufdi
- B24 - GRINDING POLISHING
Information Patent Grant
Radial-biased polishing pad
- Patent number 7,255,633
- Issue date Aug 14, 2007
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Gregory P. Muldowney
- B24 - GRINDING POLISHING
Information Patent Grant
CMP pad having a streamlined windowpane
- Patent number 7,182,670
- Issue date Feb 27, 2007
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Gregory P. Muldowney
- B24 - GRINDING POLISHING
Information Patent Grant
CMP pad having a radially alternating groove segment configuration
- Patent number 7,131,895
- Issue date Nov 7, 2006
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Carolina L. Elmufdi
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad having a groove arrangement for reducing slurry consu...
- Patent number 7,125,318
- Issue date Oct 24, 2006
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Gregory P. Muldowney
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad having grooves configured to promote mixing wakes dur...
- Patent number 7,108,597
- Issue date Sep 19, 2006
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Gregory P. Muldowney
- B24 - GRINDING POLISHING
Information Patent Grant
Multiphase mixing device with improved quench injection
- Patent number 7,074,371
- Issue date Jul 11, 2006
- ExxonMobil Research and Engineering Company
- Neil K. McDougald
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Multiphase mixing device with improved quench injection for inducin...
- Patent number 7,074,372
- Issue date Jul 11, 2006
- ExxonMobil Research and Engineering Company
- Gregory P. Muldowney
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
CMP polishing pad having grooves arranged to improve polishing medi...
- Patent number 7,059,950
- Issue date Jun 13, 2006
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Gregory P. Muldowney
- B24 - GRINDING POLISHING
Information Patent Grant
CMP pad having an overlapping stepped groove arrangement
- Patent number 7,059,949
- Issue date Jun 13, 2006
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Carolina L. Elmufdi
- B24 - GRINDING POLISHING
Information Patent Grant
Multiphase mixing device with staged gas introduction
- Patent number 7,052,654
- Issue date May 30, 2006
- ExxonMobile Research and Engineering Company
- Neil K. McDougald
- C10 - PETROLEUM, GAS OR COKE INDUSTRIES TECHNICAL GASES CONTAINING CARBON MON...
Information Patent Grant
Multiphase mixing device with baffles
- Patent number 7,045,103
- Issue date May 16, 2006
- ExxonMobil Research and Engineering Company
- Neil K. McDougald
- C10 - PETROLEUM, GAS OR COKE INDUSTRIES TECHNICAL GASES CONTAINING CARBON MON...
Information Patent Grant
Polishing pad having slurry utilization enhancing grooves
- Patent number 7,018,274
- Issue date Mar 28, 2006
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Gregory P. Muldowney
- B24 - GRINDING POLISHING
Information Patent Grant
System and method for characterizing a textured surface
- Patent number 6,986,284
- Issue date Jan 17, 2006
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Gregory P. Muldowney
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
High-rate polishing method
- Publication number 20100159810
- Publication date Jun 24, 2010
- Gregory P. Muldowney
- B24 - GRINDING POLISHING
Information Patent Application
High-rate groove pattern
- Publication number 20100159811
- Publication date Jun 24, 2010
- Gregory P. Muldowney
- B24 - GRINDING POLISHING
Information Patent Application
Interpenetrating network for chemical mechanical polishing
- Publication number 20090280725
- Publication date Nov 12, 2009
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Gregory P Muldowney
- B24 - GRINDING POLISHING
Information Patent Application
Chemical Mechanical Polishing Method
- Publication number 20090258573
- Publication date Oct 15, 2009
- Gregory P. Muldowney
- B24 - GRINDING POLISHING
Information Patent Application
Chemical mechanical polishing pad with controlled wetting
- Publication number 20090047876
- Publication date Feb 19, 2009
- Bo Jiang
- B24 - GRINDING POLISHING
Information Patent Application
Interconnected-multi-element-lattice polishing pad
- Publication number 20090047883
- Publication date Feb 19, 2009
- Bo Jiang
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
Interpenetrating network for chemical mechanical polishing
- Publication number 20090047871
- Publication date Feb 19, 2009
- Gregory P. Muldowney
- B24 - GRINDING POLISHING
Information Patent Application
LAYERED-FILAMENT LATTICE FOR CHEMICAL MECHANICAL POLISHING
- Publication number 20090047877
- Publication date Feb 19, 2009
- Gregory P. Muldowney
- B24 - GRINDING POLISHING
Information Patent Application
Three-dimensional network for chemical mechanical polishing
- Publication number 20090042490
- Publication date Feb 12, 2009
- Gregory P. Muldowney
- B24 - GRINDING POLISHING
Information Patent Application
Polishing pad with grooves to reduce slurry consumption
- Publication number 20080182489
- Publication date Jul 31, 2008
- Gregory P. Muldowney
- B24 - GRINDING POLISHING
Information Patent Application
Polishing pad with grooves to reduce slurry consumption
- Publication number 20080182493
- Publication date Jul 31, 2008
- Gregory P. Muldowney
- B24 - GRINDING POLISHING
Information Patent Application
THREE-DIMENSIONAL NETWORK FOR CHEMICAL MECHANICAL POLISHING
- Publication number 20070190909
- Publication date Aug 16, 2007
- Gregory P. Muldowney
- B24 - GRINDING POLISHING
Information Patent Application
THREE-DIMENSIONAL NETWORK FOR CHEMICAL MECHANICAL POLISHING
- Publication number 20070190916
- Publication date Aug 16, 2007
- Gregory P. Muldowney
- B24 - GRINDING POLISHING
Information Patent Application
Chemical mechanical polishing pad having secondary polishing medium...
- Publication number 20060286350
- Publication date Dec 21, 2006
- Jeffrey J. Hendron
- B24 - GRINDING POLISHING
Information Patent Application
Radial-biased polishing pad
- Publication number 20060229002
- Publication date Oct 12, 2006
- Gregory P. Muldowney
- B24 - GRINDING POLISHING
Information Patent Application
CMP pad having a radially alternating groove segment configuration
- Publication number 20060154574
- Publication date Jul 13, 2006
- Carolina L. Elmufdi
- B24 - GRINDING POLISHING
Information Patent Application
CMP POLISHING PAD HAVING GROOVES ARRANGED TO IMPROVE POLISHING MEDI...
- Publication number 20060128291
- Publication date Jun 15, 2006
- Gregory P. Muldowney
- B24 - GRINDING POLISHING
Information Patent Application
CMP PAD HAVING AN OVERLAPPING STEPPED GROOVE ARRANGEMENT
- Publication number 20060128290
- Publication date Jun 15, 2006
- Carolina L. Elmufdi
- B24 - GRINDING POLISHING
Information Patent Application
CMP pad having a streamlined windowpane
- Publication number 20060063471
- Publication date Mar 23, 2006
- Gregory P. Muldowney
- B24 - GRINDING POLISHING
Information Patent Application
Polishing pad having grooves configured to promote mixing wakes dur...
- Publication number 20060025061
- Publication date Feb 2, 2006
- Gregory P. Muldowney
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PAD HAVING GROOVES CONFIGURED TO PROMOTE MIXING WAKES DUR...
- Publication number 20050282479
- Publication date Dec 22, 2005
- Gregory P. Muldowney
- B24 - GRINDING POLISHING
Information Patent Application
GROOVED POLISHING PAD AND METHOD
- Publication number 20050170757
- Publication date Aug 4, 2005
- Gregory P. Muldowney
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PAD HAVING SLURRY UTILIZATION ENHANCING GROOVES
- Publication number 20050107009
- Publication date May 19, 2005
- Gregory P. Muldowney
- B24 - GRINDING POLISHING
Information Patent Application
Polishing pad having a groove arrangement for reducing slurry consu...
- Publication number 20050106878
- Publication date May 19, 2005
- Gregory P. Muldowney
- B24 - GRINDING POLISHING
Information Patent Application
System and method for characterizing a textured surface
- Publication number 20050044957
- Publication date Mar 3, 2005
- Gregory P. Muldowney
- B24 - GRINDING POLISHING
Information Patent Application
Multiphase mixing device with improved quench injection for inducin...
- Publication number 20040234434
- Publication date Nov 25, 2004
- Gregory P. Muldowney
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
Multiphase mixing device with improved quench injection
- Publication number 20040228779
- Publication date Nov 18, 2004
- Neil K. McDougald
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
Multiphase mixing device with staged gas introduction
- Publication number 20040151643
- Publication date Aug 5, 2004
- ExxonMobil Research and Engineering Company (formerly Exxon Research and Engi...
- Neil K. McDougald
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
Multiphase mixing device with baffles
- Publication number 20040136886
- Publication date Jul 15, 2004
- Neil K. McDougald
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
Inlet distribution device for upflow polymerization reactors
- Publication number 20040082739
- Publication date Apr 29, 2004
- Gregory P. Muldowney
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Gregory P. Muldowney

Person

Patents Grantslast 30 patents

Chemical mechanical polishing method

High-rate groove pattern

High-rate polishing method

Interconnected-multi-element-lattice polishing pad

Chemical mechanical polishing pad having secondary polishing medium...

Three-dimensional network for chemical mechanical polishing

Interpenetrating network for chemical mechanical polishing

Interpenetrating network for chemical mechanical polishing

Three-dimensional network for chemical mechanical polishing

Chemical mechanical polishing pad with controlled wetting

Polishing pad with grooves to reduce slurry consumption

Polishing pad with grooves to reduce slurry consumption

Layered-filament lattice for chemical mechanical polishing

Three-dimensional network for chemical mechanical polishing

Polishing pad with grooves to retain slurry on the pad texture

CMP pad having overlaid constant area spiral grooves

CMP pad having unevenly spaced grooves

Radial-biased polishing pad

CMP pad having a streamlined windowpane

CMP pad having a radially alternating groove segment configuration

Polishing pad having a groove arrangement for reducing slurry consu...

Polishing pad having grooves configured to promote mixing wakes dur...

Multiphase mixing device with improved quench injection

Multiphase mixing device with improved quench injection for inducin...

CMP polishing pad having grooves arranged to improve polishing medi...

CMP pad having an overlapping stepped groove arrangement

Multiphase mixing device with staged gas introduction

Multiphase mixing device with baffles

Polishing pad having slurry utilization enhancing grooves

System and method for characterizing a textured surface

Patents Applicationslast 30 patents

High-rate polishing method

High-rate groove pattern

Interpenetrating network for chemical mechanical polishing

Chemical Mechanical Polishing Method

Chemical mechanical polishing pad with controlled wetting

Interconnected-multi-element-lattice polishing pad

Interpenetrating network for chemical mechanical polishing

LAYERED-FILAMENT LATTICE FOR CHEMICAL MECHANICAL POLISHING

Three-dimensional network for chemical mechanical polishing

Polishing pad with grooves to reduce slurry consumption

Polishing pad with grooves to reduce slurry consumption

THREE-DIMENSIONAL NETWORK FOR CHEMICAL MECHANICAL POLISHING

THREE-DIMENSIONAL NETWORK FOR CHEMICAL MECHANICAL POLISHING

Chemical mechanical polishing pad having secondary polishing medium...

Radial-biased polishing pad

CMP pad having a radially alternating groove segment configuration

CMP POLISHING PAD HAVING GROOVES ARRANGED TO IMPROVE POLISHING MEDI...

CMP PAD HAVING AN OVERLAPPING STEPPED GROOVE ARRANGEMENT

CMP pad having a streamlined windowpane

Polishing pad having grooves configured to promote mixing wakes dur...

POLISHING PAD HAVING GROOVES CONFIGURED TO PROMOTE MIXING WAKES DUR...

GROOVED POLISHING PAD AND METHOD

POLISHING PAD HAVING SLURRY UTILIZATION ENHANCING GROOVES

Polishing pad having a groove arrangement for reducing slurry consu...

System and method for characterizing a textured surface

Multiphase mixing device with improved quench injection for inducin...

Multiphase mixing device with improved quench injection

Multiphase mixing device with staged gas introduction

Multiphase mixing device with baffles

Inlet distribution device for upflow polymerization reactors