Guangwei Wu

Person

Sunnyvale, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Multi-layered chemical-mechanical planarization pad
- Patent number 9,796,063
- Issue date Oct 24, 2017
- FNS Tech Co., Ltd.
- Paul Lefevre
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical-mechanical planarization pad including patterned structura...
- Patent number 9,162,341
- Issue date Oct 20, 2015
- FNS Tech Co., Ltd.
- Paul Lefevre
- B24 - GRINDING POLISHING
Information Patent Grant
Multi-layered chemical-mechanical planarization pad
- Patent number 8,790,165
- Issue date Jul 29, 2014
- FNS Tech Co., Ltd.
- Paul Lefevre
- B24 - GRINDING POLISHING
Information Patent Grant
Method of grooving a chemical-mechanical planarization pad
- Patent number 8,758,659
- Issue date Jun 24, 2014
- FNS Tech Co., Ltd.
- Paul Lefevre
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical planarization pad with void network
- Patent number 8,684,794
- Issue date Apr 1, 2014
- FNS Tech Co., Ltd.
- Paul Lefevre
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical-mechanical planarization pad including patterned structura...
- Patent number 8,435,099
- Issue date May 7, 2013
- Innopad, Inc.
- Paul Lefevre
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad with controlled void formation
- Patent number 8,377,351
- Issue date Feb 19, 2013
- Innopad, Inc.
- Paul Lefevre
- B24 - GRINDING POLISHING
Information Patent Grant
Smooth pads for CMP and polishing substrates
- Patent number 7,118,461
- Issue date Oct 10, 2006
- Thomas West Inc.
- Thomas E. West
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
MULTI-LAYERED CHEMICAL-MECHANICAL PLANARIZATION PAD
- Publication number 20140311043
- Publication date Oct 23, 2014
- Paul LEFEVRE
- B24 - GRINDING POLISHING
Information Patent Application
CHEMICAL-MECHANICAL PLANARIZATION PAD INCLUDING PATTERNED STRUCTURA...
- Publication number 20130244548
- Publication date Sep 19, 2013
- Paul LEFEVRE
- B24 - GRINDING POLISHING
Information Patent Application
METHOD OF GROOVING A CHEMICAL-MECHANICAL PLANARIZATION PAD
- Publication number 20120073210
- Publication date Mar 29, 2012
- INNOPAD, INC.
- Paul LEFEVRE
- B24 - GRINDING POLISHING
Information Patent Application
MULTI-LAYERED CHEMICAL-MECHANICAL PLANARIZATION PAD
- Publication number 20100221983
- Publication date Sep 2, 2010
- INNOPAD, INC.
- Paul LEFEVRE
- B24 - GRINDING POLISHING
Information Patent Application
CHEMICAL-MECHANICAL PLANARIZATION PAD INCLUDING PATTERNED STRUCTURA...
- Publication number 20100221985
- Publication date Sep 2, 2010
- INNOPAD, INC.
- Paul LEFEVRE
- B24 - GRINDING POLISHING
Information Patent Application
Polishing Pad With Controlled Void Formation
- Publication number 20090246504
- Publication date Oct 1, 2009
- INNOPAD, INC.
- Paul LEFEVRE
- B24 - GRINDING POLISHING
Information Patent Application
Stacked pad and method of use
- Publication number 20070087177
- Publication date Apr 19, 2007
- Guangwei Wu
- B24 - GRINDING POLISHING
Information Patent Application
Recirculating anode
- Publication number 20040251126
- Publication date Dec 16, 2004
- Martin de Tezanos Pinto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Improved fuel for a zinc-based fuel cell and regeneration thereof
- Publication number 20040053132
- Publication date Mar 18, 2004
- Stuart I. Smedley
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
Conditioner and conditioning methods for smooth pads
- Publication number 20030194955
- Publication date Oct 16, 2003
- Thomas E. West
- B24 - GRINDING POLISHING
Information Patent Application
Smooth pads for CMP and polishing substrates
- Publication number 20030181155
- Publication date Sep 25, 2003
- Thomas E. West
- B24 - GRINDING POLISHING
Information Patent Application
Methods and apparatus for polishing and planarization
- Publication number 20020137431
- Publication date Sep 26, 2002
- Michael A. Labunsky
- B24 - GRINDING POLISHING

Guangwei Wu

Person

Patents Grantslast 30 patents

Multi-layered chemical-mechanical planarization pad

Chemical-mechanical planarization pad including patterned structura...

Multi-layered chemical-mechanical planarization pad

Method of grooving a chemical-mechanical planarization pad

Chemical mechanical planarization pad with void network

Chemical-mechanical planarization pad including patterned structura...

Polishing pad with controlled void formation

Smooth pads for CMP and polishing substrates

Patents Applicationslast 30 patents

MULTI-LAYERED CHEMICAL-MECHANICAL PLANARIZATION PAD

CHEMICAL-MECHANICAL PLANARIZATION PAD INCLUDING PATTERNED STRUCTURA...

METHOD OF GROOVING A CHEMICAL-MECHANICAL PLANARIZATION PAD

MULTI-LAYERED CHEMICAL-MECHANICAL PLANARIZATION PAD

CHEMICAL-MECHANICAL PLANARIZATION PAD INCLUDING PATTERNED STRUCTURA...

Polishing Pad With Controlled Void Formation

Stacked pad and method of use

Recirculating anode

Improved fuel for a zinc-based fuel cell and regeneration thereof

Conditioner and conditioning methods for smooth pads

Smooth pads for CMP and polishing substrates

Methods and apparatus for polishing and planarization