Guenther Dengel

Person

Heidenheim, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Blocking element for protecting optical elements in projection expo...
- Patent number 9,684,243
- Issue date Jun 20, 2017
- Carl Zeiss SMT GmbH
- Joachim Hartjes
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and cooling system for cooling an optical element for EUV ap...
- Patent number 9,671,584
- Issue date Jun 6, 2017
- Carl Zeiss SMT GmbH
- Guenther Dengel
- F25 - REFRIGERATION OR COOLING COMBINED HEATING AND REFRIGERATION SYSTEMS HEA...
Information Patent Grant
Optical arrangement, in particular in a projection exposure apparat...
- Patent number 9,041,905
- Issue date May 26, 2015
- Carl Zeiss SMT GmbH
- Dirk Heinrich Ehm
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mirror with a mirror carrier and projection exposure apparatus
- Patent number 8,831,170
- Issue date Sep 9, 2014
- Carl Zeiss SMT GmbH
- Rutger Wevers
- G02 - OPTICS
Information Patent Grant
Microlithography illumination systems, components and methods
- Patent number 8,643,825
- Issue date Feb 4, 2014
- Carl Zeiss SMT GmbH
- Berndt Warm
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Microlithography illumination systems, components and methods
- Patent number 7,990,520
- Issue date Aug 2, 2011
- Carl Zeiss SMT GmbH
- Berndt Warm
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination optics for projection microlithography
- Patent number 7,858,957
- Issue date Dec 28, 2010
- Carl Zeiss SMT AG
- Berndt Warm
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
BLOCKING ELEMENT FOR PROTECTING OPTICAL ELEMENTS IN PROJECTION EXPO...
- Publication number 20150177626
- Publication date Jun 25, 2015
- Carl Zeiss SMT GMBH
- Joachim HARTJES
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND COOLING SYSTEM FOR COOLING AN OPTICAL ELEMENT FOR EUV AP...
- Publication number 20150103426
- Publication date Apr 16, 2015
- Carl Zeiss SMT GMBH
- Guenther Dengel
- G02 - OPTICS
Information Patent Application
METHOD FOR PRODUCING FACET MIRRORS AND PROJECTION EXPOSURE APPARATUS
- Publication number 20130100426
- Publication date Apr 25, 2013
- Carl Zeiss SMT GMBH
- Berndt Warm
- G02 - OPTICS
Information Patent Application
OPTICAL ARRANGEMENT, IN PARTICULAR IN A PROJECTION EXPOSURE APPARAT...
- Publication number 20120224153
- Publication date Sep 6, 2012
- Carl Zeiss SMT GMBH
- Dirk Heinrich EHM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MICROLITHOGRAPHY ILLUMINATION SYSTEMS, COMPONENTS AND METHODS
- Publication number 20110255067
- Publication date Oct 20, 2011
- Carl Zeiss SMT GMBH
- Berndt Warm
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION OPTICS FOR EUV MICROLITHOGRAPHY
- Publication number 20110235015
- Publication date Sep 29, 2011
- Carl Zeiss GmbH
- Guenther Dengel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PRODUCING FACET MIRRORS AND PROJECTION EXPOSURE APPARATUS
- Publication number 20100007866
- Publication date Jan 14, 2010
- Carl Zeiss SMT AG
- Berndt Warm
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
Apparatus for the manipulation and/or adjustment of an optical element
- Publication number 20090002670
- Publication date Jan 1, 2009
- Carl Zeiss SMT AG
- Frank Melzer
- G02 - OPTICS
Information Patent Application
Facet mirror comprising a multiplicity of mirror segments
- Publication number 20080266686
- Publication date Oct 30, 2008
- Carl Zeiss SMT AG
- Guenther Dengel
- G02 - OPTICS
Information Patent Application
MICROLITHOGRAPHY ILLUMINATION SYSTEMS, COMPONENTS AND METHODS
- Publication number 20080212059
- Publication date Sep 4, 2008
- Carl Zeiss SMT AG
- Berndt Warm
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MIRROR WITH A MIRROR CARRIER AND PROJECTION EXPOSURE APPARATUS
- Publication number 20080144202
- Publication date Jun 19, 2008
- Carl Zeiss SMT AG
- Rutger Wevers
- G02 - OPTICS
Information Patent Application
ILLUMINATION OPTICS FOR PROJECTION MICROLITHOGRAPHY
- Publication number 20080123807
- Publication date May 29, 2008
- Carl Zeiss SMT AG
- Berndt Warm
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Guenther Dengel

Person

Patents Grantslast 30 patents

Blocking element for protecting optical elements in projection expo...

Method and cooling system for cooling an optical element for EUV ap...

Optical arrangement, in particular in a projection exposure apparat...

Mirror with a mirror carrier and projection exposure apparatus

Microlithography illumination systems, components and methods

Microlithography illumination systems, components and methods

Illumination optics for projection microlithography

Patents Applicationslast 30 patents

BLOCKING ELEMENT FOR PROTECTING OPTICAL ELEMENTS IN PROJECTION EXPO...

METHOD AND COOLING SYSTEM FOR COOLING AN OPTICAL ELEMENT FOR EUV AP...

METHOD FOR PRODUCING FACET MIRRORS AND PROJECTION EXPOSURE APPARATUS

OPTICAL ARRANGEMENT, IN PARTICULAR IN A PROJECTION EXPOSURE APPARAT...

MICROLITHOGRAPHY ILLUMINATION SYSTEMS, COMPONENTS AND METHODS

ILLUMINATION OPTICS FOR EUV MICROLITHOGRAPHY

METHOD FOR PRODUCING FACET MIRRORS AND PROJECTION EXPOSURE APPARATUS

Apparatus for the manipulation and/or adjustment of an optical element

Facet mirror comprising a multiplicity of mirror segments

MICROLITHOGRAPHY ILLUMINATION SYSTEMS, COMPONENTS AND METHODS

MIRROR WITH A MIRROR CARRIER AND PROJECTION EXPOSURE APPARATUS

ILLUMINATION OPTICS FOR PROJECTION MICROLITHOGRAPHY