Guoguang Li

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus for phase-compensated sensitivity-enhanced spe...
- Patent number 8,125,641
- Issue date Feb 28, 2012
- n&k Technology, Inc.
- Guoguang Li
- G01 - MEASURING TESTING
Information Patent Grant
Combined transmittance and angle selective scattering measurement o...
- Patent number 7,999,936
- Issue date Aug 16, 2011
- n&k Technology, Inc.
- Guoguang Li
- G01 - MEASURING TESTING
Information Patent Grant
Implementation of rigorous coupled wave analysis having improved ef...
- Patent number 7,756,677
- Issue date Jul 13, 2010
- n&k Technology, Inc.
- Guoguang Li
- G01 - MEASURING TESTING
Information Patent Grant
Broadband optical metrology with reduced wave front distortion, chr...
- Patent number 7,755,775
- Issue date Jul 13, 2010
- n&k Technology, Inc.
- Guoguang Li
- G01 - MEASURING TESTING
Information Patent Grant
Efficient characterization of symmetrically illuminated symmetric 2...
- Patent number 7,525,672
- Issue date Apr 28, 2009
- n&k Technology, Inc.
- Shuqiang Chen
- G01 - MEASURING TESTING
Information Patent Grant
Efficient calculation of grating matrix elements for 2-D diffraction
- Patent number 7,505,147
- Issue date Mar 17, 2009
- n&k Technology, Inc.
- Shuqiang Chen
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and method for examining a disk-shaped sample on an X-Y-t...
- Patent number 7,397,554
- Issue date Jul 8, 2008
- n&k Technology, Inc.
- Guoguang Li
- G01 - MEASURING TESTING
Information Patent Grant
System and method for efficient characterization of diffracting str...
- Patent number 7,391,524
- Issue date Jun 24, 2008
- n&k Technology, Inc.
- Shuqiang Chen
- G01 - MEASURING TESTING
Information Patent Grant
System and method for high intensity small spot optical metrology
- Patent number 7,349,103
- Issue date Mar 25, 2008
- n & k Technology, Inc.
- Mehdi Balooch
- G01 - MEASURING TESTING
Information Patent Grant
System and method for measuring overlay alignment using diffraction...
- Patent number 7,289,214
- Issue date Oct 30, 2007
- n & k Technology, Inc.
- Guoguang Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift measurement using transmittance spectra
- Patent number 7,253,909
- Issue date Aug 7, 2007
- n & k Technology, Inc.
- Guoguang Li
- G01 - MEASURING TESTING
Information Patent Grant
Optical determination of pattern feature parameters using a scalar...
- Patent number 7,212,293
- Issue date May 1, 2007
- n & k Technology, Inc.
- Guoguang Li
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for using an alignment target with designed in...
- Patent number 6,982,793
- Issue date Jan 3, 2006
- Nanometrics Incorporated
- Weidong Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for examining features on semi-transparent and...
- Patent number 6,891,628
- Issue date May 10, 2005
- n & k Technology, Inc.
- Guoguang Li
- G01 - MEASURING TESTING
Information Patent Grant
Surface profiling using a differential interferometer
- Patent number 6,580,515
- Issue date Jun 17, 2003
- Nanometrics Incorporated
- Guoguang Li
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for optically determining physical parameters...
- Patent number 6,392,756
- Issue date May 21, 2002
- n & k Technology, Inc.
- Guoguang Li
- G01 - MEASURING TESTING
Information Patent Grant
Graded anti-reflective coatings for photolithography
- Patent number 6,379,014
- Issue date Apr 30, 2002
- n & k Technology, Inc.
- Guoguang Li
- G02 - OPTICS
Information Patent Grant
Method and apparatus for optically examining miniature patterns
- Patent number 6,327,035
- Issue date Dec 4, 2001
- NSH Technology, Inc.
- Guoguang Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for optically determining physical parameters...
- Patent number 6,091,485
- Issue date Jul 18, 2000
- n & k Technology, Inc.
- Guoguang Li
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
STRESS ANALYSIS OF SEMICONDUCTOR WAFERS
- Publication number 20150323313
- Publication date Nov 12, 2015
- Applejack 199 L.P.
- ARUN ANANTH AIYER
- G01 - MEASURING TESTING
Information Patent Application
Method and apparatus for phase-compensated sensitivity-enhanced sp...
- Publication number 20100245819
- Publication date Sep 30, 2010
- Guoguang Li
- G01 - MEASURING TESTING
Information Patent Application
METHOD AND APPARATUS FOR EXAMINING FEATURES ON SEMI-TRANSPARENT AND...
- Publication number 20040263850
- Publication date Dec 30, 2004
- Guoguang Li
- G01 - MEASURING TESTING
Information Patent Application
Graded anti-reflective coatings for photolithography
- Publication number 20020097493
- Publication date Jul 25, 2002
- Guoguang Li
- G02 - OPTICS

Guoguang Li

Person

Patents Grantslast 30 patents

Method and apparatus for phase-compensated sensitivity-enhanced spe...

Combined transmittance and angle selective scattering measurement o...

Implementation of rigorous coupled wave analysis having improved ef...

Broadband optical metrology with reduced wave front distortion, chr...

Efficient characterization of symmetrically illuminated symmetric 2...

Efficient calculation of grating matrix elements for 2-D diffraction

Apparatus and method for examining a disk-shaped sample on an X-Y-t...

System and method for efficient characterization of diffracting str...

System and method for high intensity small spot optical metrology

System and method for measuring overlay alignment using diffraction...

Phase shift measurement using transmittance spectra

Optical determination of pattern feature parameters using a scalar...

Method and apparatus for using an alignment target with designed in...

Method and apparatus for examining features on semi-transparent and...

Surface profiling using a differential interferometer

Method and apparatus for optically determining physical parameters...

Graded anti-reflective coatings for photolithography

Method and apparatus for optically examining miniature patterns

Method and apparatus for optically determining physical parameters...

Patents Applicationslast 30 patents

STRESS ANALYSIS OF SEMICONDUCTOR WAFERS

Method and apparatus for phase-compensated sensitivity-enhanced sp...

METHOD AND APPARATUS FOR EXAMINING FEATURES ON SEMI-TRANSPARENT AND...

Graded anti-reflective coatings for photolithography