Guojing Zhang

Person

Sunnyvale, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus for fabrication of very large scale integratio...
- Patent number 11,604,406
- Issue date Mar 14, 2023
- Intel Corporation
- John Magana
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Monolithically framed pellicle membrane suitable for lithography in...
- Patent number 11,561,466
- Issue date Jan 24, 2023
- Intel Corporation
- John Magana
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV phase-shift SRAF masks by means of embedded phase shift layers
- Patent number 11,300,885
- Issue date Apr 12, 2022
- Intel Corporation
- Robert Bristol
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Monolithically framed pellicle membrane suitable for lithography in...
- Patent number 11,194,246
- Issue date Dec 7, 2021
- Intel Corporation
- John Magana
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Absorber layer for EUV
- Patent number 6,908,714
- Issue date Jun 21, 2005
- Intel Corporation
- Pei-Yang Yan
- B82 - NANO-TECHNOLOGY
Information Patent Grant
High performance EUV mask
- Patent number 6,905,801
- Issue date Jun 14, 2005
- Intel Corporation
- Shoudeng Liang
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Enhanced inspection of extreme ultraviolet mask
- Patent number 6,720,118
- Issue date Apr 13, 2004
- Intel Corporation
- Pei-Yang Yan
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Extreme ultraviolet mask with improved absorber
- Patent number 6,610,447
- Issue date Aug 26, 2003
- Intel Corporation
- Pei-Yang Yan
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Enhanced inspection of extreme ultraviolet mask
- Patent number 6,583,068
- Issue date Jun 24, 2003
- Intel Corporation
- Pei-Yang Yan
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Using thin films as etch stop in EUV mask fabrication process
- Patent number 5,958,629
- Issue date Sep 28, 1999
- Intel Corporation
- Pei-Yang Yan
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of protecting an EUV mask from damage and contamination
- Patent number 5,928,817
- Issue date Jul 27, 1999
- Intel Corporation
- Pei-Yang Yan
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
Real-Time Detection of Deflections and Ruptures of EUV Pellicle Mem...
- Publication number 20240053281
- Publication date Feb 15, 2024
- Intel Corporation
- John Ferdinand MAGANA
- G01 - MEASURING TESTING
Information Patent Application
MONOLITHICALLY FRAMED PELLICLE MEMBRANE SUITABLE FOR LITHOGRAPHY IN...
- Publication number 20220075259
- Publication date Mar 10, 2022
- Intel Corporation
- John MAGANA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NOVEL METHOD AND APPARATUS FOR FABRICATION OF VERY LARGE SCALE INTE...
- Publication number 20210026234
- Publication date Jan 28, 2021
- Intel Corporation
- John MAGANA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NOVEL METHOD FOR FABRICATION OF EUV PHOTOMASK FIDUCIALS
- Publication number 20200050097
- Publication date Feb 13, 2020
- Intel Corporation
- John MAGANA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV PHASE-SHIFT SRAF MASKS BY MEANS OF EMBEDDED PHASE SHIFT LAYERS
- Publication number 20200033736
- Publication date Jan 30, 2020
- Intel Corporation
- Robert BRISTOL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
High performance EUV mask
- Publication number 20040126670
- Publication date Jul 1, 2004
- Shoudeng Liang
- B82 - NANO-TECHNOLOGY
Information Patent Application
Extreme ultraviolet mask with improved absorber
- Publication number 20030228530
- Publication date Dec 11, 2003
- Pei-Yang Yan
- B82 - NANO-TECHNOLOGY
Information Patent Application
Enhanced inspection of extreme ultraviolet mask
- Publication number 20030203289
- Publication date Oct 30, 2003
- Pei-Yang Yan
- B82 - NANO-TECHNOLOGY
Information Patent Application
Extreme ultraviolet mask with improved absorber
- Publication number 20020142230
- Publication date Oct 3, 2002
- Pei-Yang Yan
- B82 - NANO-TECHNOLOGY
Information Patent Application
Enhanced inspection of extreme ultraviolet mask
- Publication number 20020142620
- Publication date Oct 3, 2002
- Pei-Yang Yan
- B82 - NANO-TECHNOLOGY

Guojing Zhang

Person

Patents Grantslast 30 patents

Method and apparatus for fabrication of very large scale integratio...

Monolithically framed pellicle membrane suitable for lithography in...

EUV phase-shift SRAF masks by means of embedded phase shift layers

Monolithically framed pellicle membrane suitable for lithography in...

Absorber layer for EUV

High performance EUV mask

Enhanced inspection of extreme ultraviolet mask

Extreme ultraviolet mask with improved absorber

Enhanced inspection of extreme ultraviolet mask

Using thin films as etch stop in EUV mask fabrication process

Method of protecting an EUV mask from damage and contamination

Patents Applicationslast 30 patents

Real-Time Detection of Deflections and Ruptures of EUV Pellicle Mem...

MONOLITHICALLY FRAMED PELLICLE MEMBRANE SUITABLE FOR LITHOGRAPHY IN...

NOVEL METHOD AND APPARATUS FOR FABRICATION OF VERY LARGE SCALE INTE...

NOVEL METHOD FOR FABRICATION OF EUV PHOTOMASK FIDUCIALS

EUV PHASE-SHIFT SRAF MASKS BY MEANS OF EMBEDDED PHASE SHIFT LAYERS

High performance EUV mask

Extreme ultraviolet mask with improved absorber

Enhanced inspection of extreme ultraviolet mask

Extreme ultraviolet mask with improved absorber

Enhanced inspection of extreme ultraviolet mask