Claims
- 1. A mask comprising:a substrate; a multilayer mirror disposed over said substrate, said multilayer mirror having a first region and a second region; an absorber layer disposed over said second region of said multilayer mirror, said absorber layer being absorbent at a first wavelength; and a top layer disposed over said absorber layer, said top layer being absorbent at a second wavelength.
- 2. The mask of claim 1 wherein said substrate has a low coefficient of thermal expansion.
- 3. The mask of claim 1 wherein said first wavelength comprises Extreme Ultraviolet (EUV) wavelength.
- 4. The mask of claim 1 wherein said second wavelength comprises Ultraviolet (UV) or Deep Ultraviolet (DUV) wavelength.
- 5. The mask of claim 1 wherein said multilayer mirror comprises alternating layers of a high index of refraction material and a low index of refraction material.
- 6. The mask of claim 1 wherein said multilayer mirror comprises Molybdenum and Silicon.
- 7. The mask of claim 1 wherein a buffer layer is further disposed over said multilayer mirror and below said absorber layer in said second region.
- 8. The mask of claim 1 wherein said absorber layer comprises a metal.
- 9. The mask of claim 1 wherein said absorber layer comprises an alloy.
- 10. The mask of claim 1 wherein said absorber layer comprises a ceramic.
- 11. The mask of claim 1 wherein said top layer comprises a metal.
- 12. The mask of claim 1 wherein said top layer comprises an alloy.
- 13. The mask of claim 1 wherein said top layer comprises a ceramic.
- 14. The mask of claim 1 wherein said top layer comprises Fluorine.
- 15. The mask of claim 1 wherein said top layer comprises Oxygen.
- 16. The mask of claim 1 wherein said top layer comprises Argon.
- 17. The mask of claim 1 wherein said top layer comprises Carbon.
- 18. The mask of claim 1 wherein said top layer comprises Hydrogen.
Parent Case Info
This is a Divisional application of Ser. No. 09/823,637 filed Mar. 30, 2001, which is now U.S. Pat. No. 6,583,068.
US Referenced Citations (8)