Guy Ben Dov

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Haifa, IL

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Patents Grantslast 30 patents

Information Patent Grant
Field-to-field corrections using overlay targets
- Patent number 10,990,022
- Issue date Apr 27, 2021
- KLA Corporation
- Enna Leshinsky-Altshuller
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Symmetric target design in scatterometry overlay metrology
- Patent number 10,591,406
- Issue date Mar 17, 2020
- KLA-Tencor Corporation
- Barak Bringoltz
- G01 - MEASURING TESTING
Information Patent Grant
Pupil plane calibration for scatterometry overlay measurement
- Patent number 9,909,982
- Issue date Mar 6, 2018
- KLA-Tencor Corporation
- Barak Bringoltz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Symmetric target design in scatterometry overlay metrology
- Patent number 9,739,702
- Issue date Aug 22, 2017
- KLA-Tencor Corporation
- Barak Bringoltz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Field-to-Field Corrections Using Overlay Targets
- Publication number 20200201193
- Publication date Jun 25, 2020
- KLA Corporation
- Enna Leshinsky-Altshuller
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYMMETRIC TARGET DESIGN IN SCATTEROMETRY OVERLAY METROLOGY
- Publication number 20160216197
- Publication date Jul 28, 2016
- KLA-Tencor Corporation
- Barak Bringoltz
- G02 - OPTICS
Information Patent Application
SYMMETRIC TARGET DESIGN IN SCATTEROMETRY OVERLAY METROLOGY
- Publication number 20150204664
- Publication date Jul 23, 2015
- KLA-Tencor Corporation
- Barak Bringoltz
- G01 - MEASURING TESTING
Information Patent Application
PUPIL PLANE CALIBRATION FOR SCATTEROMETRY OVERLAY MEASUREMENT
- Publication number 20140257734
- Publication date Sep 11, 2014
- KLA-Tencor Corporation
- Barak Bringoltz
- G01 - MEASURING TESTING