Hajime FURUTANI

Person

Haibara-gun, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 11,953,829
- Issue date Apr 9, 2024
- FUJIFILM Corporation
- Kazunari Yagi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive composition for EUV light, pattern forming method, a...
- Patent number 11,703,758
- Issue date Jul 18, 2023
- FUJIFILM Corporation
- Michihiro Shirakawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 11,656,548
- Issue date May 23, 2023
- FUJIFILM Corporation
- Tomotaka Tsuchimura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, pat...
- Patent number 11,640,113
- Issue date May 2, 2023
- FUJIFILM Corporation
- Hideaki Tsubaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive composition for EUV light, pattern forming method, a...
- Patent number 11,604,414
- Issue date Mar 14, 2023
- FUJIFILM Corporation
- Michihiro Shirakawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method, treating agent, electronic device, and meth...
- Patent number 10,303,058
- Issue date May 28, 2019
- FUJIFILM Corporation
- Hajime Furutani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method, actinic ray-sensitive or radiation-sensitiv...
- Patent number 9,523,912
- Issue date Dec 20, 2016
- FUJIFILM Corporation
- Shohei Kataoka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PHOTOSENSITIVE COMPOSITION FOR EUV LIGHT, PATTERN FORMING METHOD, A...
- Publication number 20210011377
- Publication date Jan 14, 2021
- FUJIFILM CORPORATION
- Michihiro SHIRAKAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20200319551
- Publication date Oct 8, 2020
- FUJIFILM CORPORATION
- Tomotaka Tsuchimura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20200192220
- Publication date Jun 18, 2020
- FUJIFILM CORPORATION
- Kazunari YAGI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOSENSITIVE COMPOSITION FOR EUV LIGHT, PATTERN FORMING METHOD, A...
- Publication number 20200050106
- Publication date Feb 13, 2020
- FUJIFILM CORPORATION
- Michihiro SHIRAKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PAT...
- Publication number 20190219921
- Publication date Jul 18, 2019
- FUJIFILM CORPORATION
- Hideaki TSUBAKI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION, PATTERN FORMING METHOD, AND METHOD OF MANUFACTU...
- Publication number 20190219922
- Publication date Jul 18, 2019
- FUJIFILM CORPORATION
- Akihiro KANEKO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PAT...
- Publication number 20190187558
- Publication date Jun 20, 2019
- FUJIFILM CORPORATION
- Wataru NIHASHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PATTERN FORMING METHOD, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITI...
- Publication number 20170059995
- Publication date Mar 2, 2017
- FUJIFILM CORPORATION
- Hajime FURUTANI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD, TREATING AGENT, ELECTRONIC DEVICE, AND METH...
- Publication number 20160327866
- Publication date Nov 10, 2016
- FUJIFILM CORPORATION
- Hajime FURUTANI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMATION METHOD, ELECTRONIC-DEVICE PRODUCTION METHOD, AND...
- Publication number 20160195814
- Publication date Jul 7, 2016
- FUJIFILM CORPORATION
- Yuichiro ENOMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIV...
- Publication number 20160070167
- Publication date Mar 10, 2016
- FUJIFILM CORPORATION
- Shohei KATAOKA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PATTERN-FORMING METHOD, ELECTRONIC DEVICE AND METHOD FOR PRODUCING...
- Publication number 20160048082
- Publication date Feb 18, 2016
- FUJIFILM CORPORATION
- Masafumi KOJIMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD, COMPOUND USED THEREIN, ACTINIC RAY-SENSITIV...
- Publication number 20150331314
- Publication date Nov 19, 2015
- FUJIFILM CORPORATION
- Shuhei YAMAGUCHI
- C07 - ORGANIC CHEMISTRY

Hajime FURUTANI

Person

Patents Grantslast 30 patents

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Photosensitive composition for EUV light, pattern forming method, a...

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Actinic ray-sensitive or radiation-sensitive resin composition, pat...

Photosensitive composition for EUV light, pattern forming method, a...

Pattern forming method, treating agent, electronic device, and meth...

Pattern forming method, actinic ray-sensitive or radiation-sensitiv...

Patents Applicationslast 30 patents

PHOTOSENSITIVE COMPOSITION FOR EUV LIGHT, PATTERN FORMING METHOD, A...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

PHOTOSENSITIVE COMPOSITION FOR EUV LIGHT, PATTERN FORMING METHOD, A...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PAT...

RESIST COMPOSITION, PATTERN FORMING METHOD, AND METHOD OF MANUFACTU...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PAT...

PATTERN FORMING METHOD, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITI...

PATTERN FORMING METHOD, TREATING AGENT, ELECTRONIC DEVICE, AND METH...

PATTERN FORMATION METHOD, ELECTRONIC-DEVICE PRODUCTION METHOD, AND...

PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIV...

PATTERN-FORMING METHOD, ELECTRONIC DEVICE AND METHOD FOR PRODUCING...

PATTERN FORMING METHOD, COMPOUND USED THEREIN, ACTINIC RAY-SENSITIV...