Halbert CHONG

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method for particle removal from wafers through plasma modification...
- Patent number 11,932,934
- Issue date Mar 19, 2024
- Applied Materials, Inc.
- Halbert Chong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for processing a substrate
- Patent number 11,898,236
- Issue date Feb 13, 2024
- Applied Materials, Inc.
- Zhiyong Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Wet cleaning inside of gasline of semiconductor process equipment
- Patent number 11,661,652
- Issue date May 30, 2023
- Applied Materials, Inc.
- Gang Peng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for particle removal from wafers through plasma modification...
- Patent number 11,473,189
- Issue date Oct 18, 2022
- Applied Materials, Inc.
- Halbert Chong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Physical vapor deposition (PVD) chamber with in situ chamber cleani...
- Patent number 11,289,312
- Issue date Mar 29, 2022
- Applied Materials, Inc.
- Adolph M. Allen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Coating for chamber particle reduction
- Patent number 11,251,024
- Issue date Feb 15, 2022
- Applied Materials, Inc.
- Hsin-wei Tseng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE
- Publication number 20230377892
- Publication date Nov 23, 2023
- Yiyang WAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE
- Publication number 20230122956
- Publication date Apr 20, 2023
- Zhiyong WANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SHUTTER DISK FOR PHYSICAL VAPOR DEPOSITION (PVD) CHAMBER
- Publication number 20230073011
- Publication date Mar 9, 2023
- Zhiyong WANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR PARTICLE REMOVAL FROM WAFERS THROUGH PLASMA MODIFICATION...
- Publication number 20230002885
- Publication date Jan 5, 2023
- Applied Materials, Inc.
- Halbert Chong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE
- Publication number 20220310364
- Publication date Sep 29, 2022
- Applied Materials, Inc.
- Halbert CHONG
- B08 - CLEANING
Information Patent Application
METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE
- Publication number 20220310363
- Publication date Sep 29, 2022
- Applied Materials, Inc.
- Halbert CHONG
- B08 - CLEANING
Information Patent Application
METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE
- Publication number 20210319989
- Publication date Oct 14, 2021
- Applied Materials, Inc.
- Halbert CHONG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
COATING FOR CHAMBER PARTICLE REDUCTION
- Publication number 20210043429
- Publication date Feb 11, 2021
- Applied Materials, Inc.
- Hsin-wei TSENG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PHYSICAL VAPOR DEPOSITION (PVD) CHAMBER WITH IN SITU CHAMBER CLEANI...
- Publication number 20200395198
- Publication date Dec 17, 2020
- Applied Materials, Inc.
- ADOLPH M. ALLEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method For Particle Removal From Wafers Through Plasma Modification...
- Publication number 20200255938
- Publication date Aug 13, 2020
- Applied Materials, Inc.
- Halbert Chong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
WET CLEANING INSIDE OF GASLINE OF SEMICONDUCTOR PROCESS EQUIPMENT
- Publication number 20190352775
- Publication date Nov 21, 2019
- Applied Materials, Inc.
- Gang PENG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Halbert CHONG

Person

Patents Grantslast 30 patents

Method for particle removal from wafers through plasma modification...

Methods and apparatus for processing a substrate

Wet cleaning inside of gasline of semiconductor process equipment

Method for particle removal from wafers through plasma modification...

Physical vapor deposition (PVD) chamber with in situ chamber cleani...

Coating for chamber particle reduction

Patents Applicationslast 30 patents

METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE

METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE

SHUTTER DISK FOR PHYSICAL VAPOR DEPOSITION (PVD) CHAMBER

METHOD FOR PARTICLE REMOVAL FROM WAFERS THROUGH PLASMA MODIFICATION...

METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE

METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE

METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE

COATING FOR CHAMBER PARTICLE REDUCTION

PHYSICAL VAPOR DEPOSITION (PVD) CHAMBER WITH IN SITU CHAMBER CLEANI...

Method For Particle Removal From Wafers Through Plasma Modification...

WET CLEANING INSIDE OF GASLINE OF SEMICONDUCTOR PROCESS EQUIPMENT