Hamid Tavassoli

Person

Cupertino, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Symmetric plasma process chamber
- Patent number 11,315,760
- Issue date Apr 26, 2022
- Applied Materials, Inc.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process kit design for in-chamber heater and wafer rotating mechanism
- Patent number 10,704,147
- Issue date Jul 7, 2020
- Applied Materials, Inc.
- Muhammad M. Rasheed
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Collimator for use in a physical vapor deposition chamber
- Patent number 10,697,057
- Issue date Jun 30, 2020
- Applied Materials, Inc.
- Goichi Yoshidome
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Symmetric plasma process chamber
- Patent number 10,615,006
- Issue date Apr 7, 2020
- Applied Materials, Inc.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Symmetric plasma process chamber
- Patent number 10,580,620
- Issue date Mar 3, 2020
- Applied Materials, Inc.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Symmetric plasma process chamber
- Patent number 10,546,728
- Issue date Jan 28, 2020
- Applied Materials, Inc.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Distributed electro-static chuck cooling
- Patent number 10,537,013
- Issue date Jan 14, 2020
- Applied Materials, Inc.
- Fernando Silveira
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Symmetric plasma process chamber
- Patent number 10,535,502
- Issue date Jan 14, 2020
- Applied Materials, Inc.
- James D. Carducci
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Symmetric plasma process chamber
- Patent number 10,453,656
- Issue date Oct 22, 2019
- Applied Materials, Inc.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for controlling temperature uniformity of a substrate
- Patent number 10,386,126
- Issue date Aug 20, 2019
- Applied Materials, Inc.
- Kallol Bera
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Grant
Low electron temperature etch chamber with independent control over...
- Patent number 9,799,491
- Issue date Oct 24, 2017
- Applied Materials, Inc.
- Leonid Dorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Symmetric plasma process chamber
- Patent number 9,741,546
- Issue date Aug 22, 2017
- Applied Materials, Inc.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam plasma source with remote radical source
- Patent number 9,564,297
- Issue date Feb 7, 2017
- Applied Materials, Inc.
- Ming-Feng Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for controlling the temperature uniformity of a substrate
- Patent number 9,267,742
- Issue date Feb 23, 2016
- Applied Materials, Inc.
- Kallol Bera
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Grant
Multi-zoned plasma processing electrostatic chuck with improved tem...
- Patent number 9,248,509
- Issue date Feb 2, 2016
- Applied Materials, Inc.
- Hamid Tavassoli
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Temperature control in plasma processing apparatus using pulsed hea...
- Patent number 9,214,315
- Issue date Dec 15, 2015
- Applied Materials, Inc.
- Fernando M. Silveira
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Plasma reactor with a multiple zone thermal control feed forward co...
- Patent number 8,980,044
- Issue date Mar 17, 2015
- BE Aerospace, Inc.
- Paul Lukas Brillhart
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Temperature control in plasma processing apparatus using pulsed hea...
- Patent number 8,916,793
- Issue date Dec 23, 2014
- Applied Materials, Inc.
- Fernando M. Silveira
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-zoned plasma processing electrostatic chuck with improved tem...
- Patent number 8,822,876
- Issue date Sep 2, 2014
- Applied Materials, Inc.
- Hamid Tavassoli
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Assembly for delivering RF power and DC voltage to a plasma process...
- Patent number 8,629,370
- Issue date Jan 14, 2014
- Applied Materials, Inc.
- Hamid Tavassoli
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Plasma reactor with minimal D.C. coils for cusp, solenoid and mirro...
- Patent number 8,617,351
- Issue date Dec 31, 2013
- Applied Materials, Inc.
- Daniel J. Hoffman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor with feed forward thermal control system using a the...
- Patent number 8,608,900
- Issue date Dec 17, 2013
- B/E Aerospace, Inc.
- Douglas A. Buchberger
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Capacitively coupled plasma reactor having very agile wafer tempera...
- Patent number 8,337,660
- Issue date Dec 25, 2012
- B/E Aerospace, Inc.
- Douglas A. Buchberger, Jr.
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for controlling gas flow in a semiconductor substrate pro...
- Patent number 8,236,105
- Issue date Aug 7, 2012
- Applied Materials, Inc.
- Kallol Bera
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma reactor with wafer backside thermal loop, two-phase internal...
- Patent number 8,221,580
- Issue date Jul 17, 2012
- Applied Materials, Inc.
- Douglas A. Buchberger, Jr.
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Capacitively coupled plasma reactor having very agile wafer tempera...
- Patent number 8,157,951
- Issue date Apr 17, 2012
- Applied Materials, Inc.
- Douglas A. Buchberger, Jr.
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor with feed forward thermal control system using a the...
- Patent number 8,092,639
- Issue date Jan 10, 2012
- Advanced Thermal Sciences Corporation
- Douglas A. Buchberger, Jr.
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Capacitively coupled plasma reactor having a cooled/heated wafer su...
- Patent number 8,092,638
- Issue date Jan 10, 2012
- Applied Materials Inc.
- Paul Lukas Brillhart
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for agile workpiece temperature control in a plasma reactor...
- Patent number 8,021,521
- Issue date Sep 20, 2011
- Applied Materials, Inc.
- Douglas A. Buchberger, Jr.
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Plasma reactor with a multiple zone thermal control feed forward co...
- Patent number 8,012,304
- Issue date Sep 6, 2011
- Applied Materials, Inc.
- Paul Lukas Brillhart
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Patents Applicationslast 30 patents

Information Patent Application
SYMMETRIC PLASMA PROCESS CHAMBER
- Publication number 20220254606
- Publication date Aug 11, 2022
- Applied Materials, Inc.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYMMETRIC PLASMA PROCESS CHAMBER
- Publication number 20200185192
- Publication date Jun 11, 2020
- Applied Materials, Inc.
- James D. Carducci
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
PROCESS KIT DESIGN FOR IN-CHAMBER HEATER AND WAFER ROTATING MECHANISM
- Publication number 20180155838
- Publication date Jun 7, 2018
- Muhammad M. RASHEED
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
COLLIMATOR FOR USE IN A PHYSICAL VAPOR DEPOSITION CHAMBER
- Publication number 20180142342
- Publication date May 24, 2018
- Applied Materials, Inc.
- GOICHI YOSHIDOME
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Low Electron Temperature Etch Chamber with Independent Control Over...
- Publication number 20180053631
- Publication date Feb 22, 2018
- Applied Materials, Inc.
- Leonid Dorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYMMETRIC PLASMA PROCESS CHAMBER
- Publication number 20170271129
- Publication date Sep 21, 2017
- Applied Materials, Inc.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW ELECTRON TEMPERATURE ETCH CHAMBER WITH INDEPENDENT CONTROL OVER...
- Publication number 20170125217
- Publication date May 4, 2017
- Applied Materials, Inc.
- Leonid Dorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYMMETRIC PLASMA PROCESS CHAMBER
- Publication number 20160314940
- Publication date Oct 27, 2016
- Applied Materials, Inc.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYMMETRIC PLASMA PROCESS CHAMBER
- Publication number 20160314937
- Publication date Oct 27, 2016
- Applied Materials, Inc.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYMMETRIC PLASMA PROCESS CHAMBER
- Publication number 20160314942
- Publication date Oct 27, 2016
- Applied Materials, Inc.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYMMETRIC PLASMA PROCESS CHAMBER
- Publication number 20160314936
- Publication date Oct 27, 2016
- Applied Materials, Inc.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR CONTROLLING TEMPERATURE UNIFORMITY OF A SUBSTRATE
- Publication number 20160169593
- Publication date Jun 16, 2016
- KALLOL BERA
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Application
ELECTRON BEAM PLASMA SOURCE WITH ROTATING CATHODE, BACKSIDE HELIUM...
- Publication number 20160042961
- Publication date Feb 11, 2016
- Applied Materials, Inc.
- Leonid Dorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TEMPERATURE CONTROL IN PLASMA PROCESSING APPARATUS USING PULSED HEA...
- Publication number 20150316941
- Publication date Nov 5, 2015
- Applied Materials, Inc.
- Fernando M. SILVEIRA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-ZONED PLASMA PROCESSING ELECTROSTATIC CHUCK WITH IMPROVED TEM...
- Publication number 20140346743
- Publication date Nov 27, 2014
- Hamid Tavassoli
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
ELECTRON BEAM PLASMA SOURCE WITH REMOTE RADICAL SOURCE
- Publication number 20140339980
- Publication date Nov 20, 2014
- Ming-Feng Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ESC COOLING BASE FOR LARGE DIAMETER SUBSRATES
- Publication number 20130284372
- Publication date Oct 31, 2013
- Hamid TAVASSOLI
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
DISTRIBUTED ELECTRO-STATIC CHUCK COOLING
- Publication number 20130276981
- Publication date Oct 24, 2013
- Fernando Silveira
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYMMETRIC PLASMA PROCESS CHAMBER
- Publication number 20130087286
- Publication date Apr 11, 2013
- Applied Materials, Inc.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TEMPERATURE CONTROL IN PLASMA PROCESSING APPARATUS USING PULSED HEA...
- Publication number 20120132397
- Publication date May 31, 2012
- Applied Materials, Inc.
- Fernando M. Silveira
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
MULTI-ZONED PLASMA PROCESSING ELECTROSTATIC CHUCK WITH IMPROVED TEM...
- Publication number 20120091104
- Publication date Apr 19, 2012
- Applied Materials, Inc.
- Hamid Tavassoli
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
ASSEMBLY FOR DELIVERING RF POWER AND DC VOLTAGE TO A PLASMA PROCESS...
- Publication number 20110297650
- Publication date Dec 8, 2011
- Applied Materials, Inc.
- Hamid Tavassoli
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR CONTROLLING TEMPERATURE UNIFORMITY OF A SUBSTRATE
- Publication number 20110180243
- Publication date Jul 28, 2011
- Applied Materials, Inc.
- KALLOL BERA
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Application
PLASMA REACTOR WITH FEED FORWARD THERMAL CONTROL SYSTEM USING A THE...
- Publication number 20100319851
- Publication date Dec 23, 2010
- Douglas A. Buchberger, JR.
- F25 - REFRIGERATION OR COOLING COMBINED HEATING AND REFRIGERATION SYSTEMS HEA...
Information Patent Application
CAPACITIVLEY COUPLED PLASMA REACTOR HAVING A COOLED/HEATED WAFER SU...
- Publication number 20100319852
- Publication date Dec 23, 2010
- Paul Lukas Brillhart
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA REACTOR WITH A MULTIPLE ZONE THERMAL CONTROL FEED FORWARD CO...
- Publication number 20100314046
- Publication date Dec 16, 2010
- Paul Lukas Brillhart
- F25 - REFRIGERATION OR COOLING COMBINED HEATING AND REFRIGERATION SYSTEMS HEA...
Information Patent Application
CAPACITIVELY COUPLED PLASMA REACTOR HAVING VERY AGILE WAFER TEMPERA...
- Publication number 20100303680
- Publication date Dec 2, 2010
- Douglas A. Buchberger, JR.
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR CONTROLLING TEMPERATURE OF A SUBSTRATE
- Publication number 20090159566
- Publication date Jun 25, 2009
- Applied Materials, Inc.
- Paul L. Brillhart
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma reactor with feed forward thermal control system using a the...
- Publication number 20070091539
- Publication date Apr 26, 2007
- APPLIED MATERIALS, INC.
- Douglas A. Buchberger
- F25 - REFRIGERATION OR COOLING COMBINED HEATING AND REFRIGERATION SYSTEMS HEA...
Information Patent Application
Plasma reactor with wafer backside thermal loop, two-phase internal...
- Publication number 20070091538
- Publication date Apr 26, 2007
- Douglas A. Buchberger
- F25 - REFRIGERATION OR COOLING COMBINED HEATING AND REFRIGERATION SYSTEMS HEA...

Hamid Tavassoli

Person

Patents Grantslast 30 patents

Symmetric plasma process chamber

Process kit design for in-chamber heater and wafer rotating mechanism

Collimator for use in a physical vapor deposition chamber

Symmetric plasma process chamber

Symmetric plasma process chamber

Symmetric plasma process chamber

Distributed electro-static chuck cooling

Symmetric plasma process chamber

Symmetric plasma process chamber

Apparatus for controlling temperature uniformity of a substrate

Low electron temperature etch chamber with independent control over...

Symmetric plasma process chamber

Electron beam plasma source with remote radical source

Apparatus for controlling the temperature uniformity of a substrate

Multi-zoned plasma processing electrostatic chuck with improved tem...

Temperature control in plasma processing apparatus using pulsed hea...

Plasma reactor with a multiple zone thermal control feed forward co...

Temperature control in plasma processing apparatus using pulsed hea...

Multi-zoned plasma processing electrostatic chuck with improved tem...

Assembly for delivering RF power and DC voltage to a plasma process...

Plasma reactor with minimal D.C. coils for cusp, solenoid and mirro...

Plasma reactor with feed forward thermal control system using a the...

Capacitively coupled plasma reactor having very agile wafer tempera...

Apparatus for controlling gas flow in a semiconductor substrate pro...

Plasma reactor with wafer backside thermal loop, two-phase internal...

Capacitively coupled plasma reactor having very agile wafer tempera...

Plasma reactor with feed forward thermal control system using a the...

Capacitively coupled plasma reactor having a cooled/heated wafer su...

Method for agile workpiece temperature control in a plasma reactor...

Plasma reactor with a multiple zone thermal control feed forward co...

Patents Applicationslast 30 patents

SYMMETRIC PLASMA PROCESS CHAMBER

SYMMETRIC PLASMA PROCESS CHAMBER

PROCESS KIT DESIGN FOR IN-CHAMBER HEATER AND WAFER ROTATING MECHANISM

COLLIMATOR FOR USE IN A PHYSICAL VAPOR DEPOSITION CHAMBER

Low Electron Temperature Etch Chamber with Independent Control Over...

SYMMETRIC PLASMA PROCESS CHAMBER

LOW ELECTRON TEMPERATURE ETCH CHAMBER WITH INDEPENDENT CONTROL OVER...

SYMMETRIC PLASMA PROCESS CHAMBER

SYMMETRIC PLASMA PROCESS CHAMBER

SYMMETRIC PLASMA PROCESS CHAMBER

SYMMETRIC PLASMA PROCESS CHAMBER

APPARATUS FOR CONTROLLING TEMPERATURE UNIFORMITY OF A SUBSTRATE

ELECTRON BEAM PLASMA SOURCE WITH ROTATING CATHODE, BACKSIDE HELIUM...

TEMPERATURE CONTROL IN PLASMA PROCESSING APPARATUS USING PULSED HEA...

MULTI-ZONED PLASMA PROCESSING ELECTROSTATIC CHUCK WITH IMPROVED TEM...

ELECTRON BEAM PLASMA SOURCE WITH REMOTE RADICAL SOURCE

ESC COOLING BASE FOR LARGE DIAMETER SUBSRATES

DISTRIBUTED ELECTRO-STATIC CHUCK COOLING

SYMMETRIC PLASMA PROCESS CHAMBER

TEMPERATURE CONTROL IN PLASMA PROCESSING APPARATUS USING PULSED HEA...

MULTI-ZONED PLASMA PROCESSING ELECTROSTATIC CHUCK WITH IMPROVED TEM...

ASSEMBLY FOR DELIVERING RF POWER AND DC VOLTAGE TO A PLASMA PROCESS...

APPARATUS FOR CONTROLLING TEMPERATURE UNIFORMITY OF A SUBSTRATE

PLASMA REACTOR WITH FEED FORWARD THERMAL CONTROL SYSTEM USING A THE...

CAPACITIVLEY COUPLED PLASMA REACTOR HAVING A COOLED/HEATED WAFER SU...

PLASMA REACTOR WITH A MULTIPLE ZONE THERMAL CONTROL FEED FORWARD CO...

CAPACITIVELY COUPLED PLASMA REACTOR HAVING VERY AGILE WAFER TEMPERA...

METHOD AND APPARATUS FOR CONTROLLING TEMPERATURE OF A SUBSTRATE

Plasma reactor with feed forward thermal control system using a the...

Plasma reactor with wafer backside thermal loop, two-phase internal...