Hans C. Pfeiffer

Person

Ridgfield, CT, US

People

Patents Grantslast 30 patents

Information Patent Grant
Multi-beam hybrid solenoid lens electron beam system
- Patent number 6,710,361
- Issue date Mar 23, 2004
- International Business Machines Corporation
- Hans C. Pfeiffer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Solenoid electron beam lenses with high demagnification and low abe...
- Patent number 6,633,040
- Issue date Oct 14, 2003
- International Business Machines Corporation
- Hans C. Pfeiffer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Compensation of within-subfield linewidth variation in e-beam proje...
- Patent number 6,296,976
- Issue date Oct 2, 2001
- Nikon Corporation
- Timothy R. Groves
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Multi-element deflection aberration correction for electron beam li...
- Patent number 6,180,947
- Issue date Jan 30, 2001
- Nikon Corporation
- Werner Stickel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle beam system with dynamic focusing
- Patent number 6,130,432
- Issue date Oct 10, 2000
- International Business Machines Corporation
- Hans C. Pfeiffer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron beam projection lithography system (EBPS)
- Patent number 6,069,684
- Issue date May 30, 2000
- International Business Machines Corporation
- Steven D. Golladay
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Manufacturing method for membrane lithography mask with mask fields
- Patent number 5,935,739
- Issue date Aug 10, 1999
- International Business Machines Corporation
- Thomas Bayer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Scattering reticle for electron beam systems
- Patent number 5,674,413
- Issue date Oct 7, 1997
- International Business Machines Corporation
- Hans Christian Pfeiffer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Electron beam lithography system with low brightness
- Patent number 5,633,507
- Issue date May 27, 1997
- International Business Machines Corporation
- Hans C. Pfeiffer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron beam lithography system
- Patent number 5,545,902
- Issue date Aug 13, 1996
- International Business Machines Corporation
- Hans C. Pfeiffer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron beam lithography system
- Patent number 5,466,904
- Issue date Nov 14, 1995
- International Business Machines Corporation
- Hans C. Pfeiffer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Tri-deflection electron beam system
- Patent number 4,945,246
- Issue date Jul 31, 1990
- International Business Machines Corporation
- Donald E. Davis
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Telecentric sub-field deflection with vail
- Patent number 4,859,856
- Issue date Aug 22, 1989
- International Business Machines Corporation
- Timothy R. Groves
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam contactless testing system with grid bias switching
- Patent number 4,843,330
- Issue date Jun 27, 1989
- International Business Machines Corporation
- Steven D. Golladay
- G01 - MEASURING TESTING
Information Patent Grant
Electron beam writing method and system using large range deflectio...
- Patent number 4,818,885
- Issue date Apr 4, 1989
- International Business Machines Corporation
- Donald E. Davis
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Variable axis immersion lens electron beam projection system
- Patent number 4,544,846
- Issue date Oct 1, 1985
- International Business Machines Corporation
- Gunther O. Langner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for controlling alignment of an electron beam...
- Patent number 4,423,305
- Issue date Dec 27, 1983
- International Business Machines Corporation
- Hans C. Pfeiffer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System for contactless electrical property testing of multi-layer c...
- Patent number 4,417,203
- Issue date Nov 22, 1983
- International Business Machines Corporation
- Hans C. Pfeiffer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
System for contactless testing of multi-layer ceramics
- Patent number 4,415,851
- Issue date Nov 15, 1983
- International Business Machines Corporation
- Guenther O. Langner
- G01 - MEASURING TESTING
Information Patent Grant
Variable axis electron beam projection system
- Patent number 4,376,249
- Issue date Mar 8, 1983
- International Business Machines Corporation
- Hans C. Pfeiffer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Compensated magnetic deflection coil for electron beam lithography...
- Patent number 4,251,728
- Issue date Feb 17, 1981
- International Business Machines Corporation
- Hans C. Pfeiffer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for forming a variable size electron beam
- Patent number 4,243,866
- Issue date Jan 6, 1981
- International Business Machines Corporation
- Hans C. Pfeiffer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron beam system with character projection capability
- Patent number 4,213,053
- Issue date Jul 15, 1980
- International Business Machines Corporation
- Hans C. Pfeiffer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for controlling brightness and alignment of a...
- Patent number 4,000,440
- Issue date Dec 28, 1976
- International Business Machines Corporation
- Alan V. Hall
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Shielded magnetic lens and deflection yoke structure for electron b...
- Patent number 3,984,687
- Issue date Oct 5, 1976
- International Business Machines Corporation
- Karl H. Loeffler
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Multi-beam hybrid solenoid lens electron beam system
- Publication number 20030197131
- Publication date Oct 23, 2003
- Hans C. Pfeiffer
- B82 - NANO-TECHNOLOGY

Hans C. Pfeiffer

Person

Patents Grantslast 30 patents

Multi-beam hybrid solenoid lens electron beam system

Solenoid electron beam lenses with high demagnification and low abe...

Compensation of within-subfield linewidth variation in e-beam proje...

Multi-element deflection aberration correction for electron beam li...

Particle beam system with dynamic focusing

Electron beam projection lithography system (EBPS)

Manufacturing method for membrane lithography mask with mask fields

Scattering reticle for electron beam systems

Electron beam lithography system with low brightness

Electron beam lithography system

Electron beam lithography system

Tri-deflection electron beam system

Telecentric sub-field deflection with vail

Electron beam contactless testing system with grid bias switching

Electron beam writing method and system using large range deflectio...

Variable axis immersion lens electron beam projection system

Method and apparatus for controlling alignment of an electron beam...

System for contactless electrical property testing of multi-layer c...

System for contactless testing of multi-layer ceramics

Variable axis electron beam projection system

Compensated magnetic deflection coil for electron beam lithography...

Method and apparatus for forming a variable size electron beam

Electron beam system with character projection capability

Method and apparatus for controlling brightness and alignment of a...

Shielded magnetic lens and deflection yoke structure for electron b...

Patents Applicationslast 30 patents

Multi-beam hybrid solenoid lens electron beam system