Hans-Michael STIEPAN

Person

Aalen, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Mirror, in particular for a microlithographic projection exposure a...
- Patent number 12,210,289
- Issue date Jan 28, 2025
- Carl Zeiss SMT GmbH
- Kerstin Hild
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical system, heating arrangement, and method for heating an opti...
- Patent number 12,085,780
- Issue date Sep 10, 2024
- Carl Zeiss SMT GmbH
- Andrea Berner
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Mirror, in particular for a microlithographic projection exposure a...
- Patent number 11,809,085
- Issue date Nov 7, 2023
- Carl Zeiss SMT GmbH
- Hans Michael Stiepan
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Method and device for characterizing a wafer patterned using at lea...
- Patent number 10,509,330
- Issue date Dec 17, 2019
- Carl Zeiss SMT GmbH
- Hans-Michael Stiepan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Measuring method and measuring arrangement for an imaging optical s...
- Patent number 10,502,545
- Issue date Dec 10, 2019
- Carl Zeiss SMT GmbH
- Ulrich Wegmann
- G01 - MEASURING TESTING
Information Patent Grant
Test device and method for testing a mirror
- Patent number 10,422,718
- Issue date Sep 24, 2019
- Carl Zeiss SMT GmbH
- Hans-Michael Stiepan
- G01 - MEASURING TESTING
Information Patent Grant
Interferometric measuring arrangement
- Patent number 10,337,850
- Issue date Jul 2, 2019
- Carl Zeiss SMT GmbH
- Jochen Hetzler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PARAMETERIZING X-RAY SCATTERING MEASUREMENT USING SLICE-AND-IMAGE T...
- Publication number 20230343619
- Publication date Oct 26, 2023
- Carl Zeiss SMT GMBH
- Hans-Michael Stiepan
- G01 - MEASURING TESTING
Information Patent Application
PRODUCTION METHOD AND MEASUREMENT METHOD
- Publication number 20230243644
- Publication date Aug 3, 2023
- Carl Zeiss SMT GMBH
- Hans Michael STIEPAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL SYSTEM AND METHOD OF OPERATING AN OPTICAL SYSTEM
- Publication number 20230176492
- Publication date Jun 8, 2023
- Carl Zeiss SMT GMBH
- Toralf GRUNER
- G02 - OPTICS
Information Patent Application
A PROJECTION OBJECTIVE INCLUDING AN OPTICAL DEVICE
- Publication number 20230142187
- Publication date May 11, 2023
- Carl Zeiss SMT GMBH
- Johannes Lippert
- G02 - OPTICS
Information Patent Application
MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE A...
- Publication number 20230122333
- Publication date Apr 20, 2023
- Carl Zeiss SMT GMBH
- Kerstin HILD
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL SYSTEM, HEATING ARRANGEMENT, AND METHOD FOR HEATING AN OPTI...
- Publication number 20220299732
- Publication date Sep 22, 2022
- Carl Zeiss SMT GMBH
- Andrea Berner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DIFFRACTIVE OPTICAL ELEMENT FOR A TEST INTERFEROMETER
- Publication number 20220170735
- Publication date Jun 2, 2022
- Carl Zeiss SMT GMBH
- Alexander Winkler
- G01 - MEASURING TESTING
Information Patent Application
MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE A...
- Publication number 20220113634
- Publication date Apr 14, 2022
- Carl Zeiss SMT GMBH
- Hans Michael STIEPAN
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
MEASUREMENT METHOD FOR INTERFEROMETRICALLY DETERMINING A SURFACE SHAPE
- Publication number 20220011095
- Publication date Jan 13, 2022
- Carl Zeiss SMT GMBH
- Hans Michael STIEPAN
- G01 - MEASURING TESTING
Information Patent Application
METROLOGY TARGET
- Publication number 20200011650
- Publication date Jan 9, 2020
- Carl Zeiss SMT GMBH
- Hans-Michael Stiepan
- G01 - MEASURING TESTING
Information Patent Application
METHOD AND DEVICE FOR CHARACTERIZING A WAFER PATTERNED BY AT LEAST...
- Publication number 20180217509
- Publication date Aug 2, 2018
- Carl Zeiss SMT GMBH
- Hans-Michael Stiepan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND DEVICE FOR CHARACTERIZING A WAFER PATTERNED USING AT LEA...
- Publication number 20180203369
- Publication date Jul 19, 2018
- Carl Zeiss SMT GMBH
- Hans-Michael Stiepan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INTERFEROMETRIC MEASURING ARRANGEMENT
- Publication number 20180106591
- Publication date Apr 19, 2018
- Carl Zeiss SMT GMBH
- Jochen HETZLER
- B21 - MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL PUNCHING...
Information Patent Application
MEASURING METHOD AND MEASURING ARRANGEMENT FOR AN IMAGING OPTICAL S...
- Publication number 20180087891
- Publication date Mar 29, 2018
- Carl Zeiss SMT GMBH
- Ulrich WEGMANN
- G01 - MEASURING TESTING
Information Patent Application
TEST DEVICE AND METHOD FOR TESTING A MIRROR
- Publication number 20170343449
- Publication date Nov 30, 2017
- Carl Zeiss SMT GMBH
- Hans-Michael STIEPAN
- G01 - MEASURING TESTING

Hans-Michael STIEPAN

Person

Patents Grantslast 30 patents

Mirror, in particular for a microlithographic projection exposure a...

Optical system, heating arrangement, and method for heating an opti...

Mirror, in particular for a microlithographic projection exposure a...

Method and device for characterizing a wafer patterned using at lea...

Measuring method and measuring arrangement for an imaging optical s...

Test device and method for testing a mirror

Interferometric measuring arrangement

Patents Applicationslast 30 patents

PARAMETERIZING X-RAY SCATTERING MEASUREMENT USING SLICE-AND-IMAGE T...

PRODUCTION METHOD AND MEASUREMENT METHOD

OPTICAL SYSTEM AND METHOD OF OPERATING AN OPTICAL SYSTEM

A PROJECTION OBJECTIVE INCLUDING AN OPTICAL DEVICE

MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE A...

OPTICAL SYSTEM, HEATING ARRANGEMENT, AND METHOD FOR HEATING AN OPTI...

DIFFRACTIVE OPTICAL ELEMENT FOR A TEST INTERFEROMETER

MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE A...

MEASUREMENT METHOD FOR INTERFEROMETRICALLY DETERMINING A SURFACE SHAPE

METROLOGY TARGET

METHOD AND DEVICE FOR CHARACTERIZING A WAFER PATTERNED BY AT LEAST...

METHOD AND DEVICE FOR CHARACTERIZING A WAFER PATTERNED USING AT LEA...

INTERFEROMETRIC MEASURING ARRANGEMENT

MEASURING METHOD AND MEASURING ARRANGEMENT FOR AN IMAGING OPTICAL S...

TEST DEVICE AND METHOD FOR TESTING A MIRROR