Hao-Chieh Liu

Person

Taipei, TW

People

Patents Grantslast 30 patents

Information Patent Grant
Etching process
- Patent number 6,565,759
- Issue date May 20, 2003
- Vanguard International Semiconductor Corporation
- Bi-Ling Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming a plug or damascene trench on a semiconductor de...
- Patent number 6,391,763
- Issue date May 21, 2002
- Winbond Electronics Corp.
- Hao-Chieh Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming self-aligned contacts using a hard mask
- Patent number 6,265,296
- Issue date Jul 24, 2001
- Vanguard International Semiconductor Corporation
- Tzu-Shih Yen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a contact hole in a semiconductor device
- Patent number 6,103,588
- Issue date Aug 15, 2000
- Vanguard International Semiconductor Corporation
- Erik S. Jeng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming multi-level contacts using a H-containing fluoro...
- Patent number 6,080,662
- Issue date Jun 27, 2000
- Vanguard International Semiconductor Corporation
- Bi-Ling Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming multi-level contacts
- Patent number 6,074,952
- Issue date Jun 13, 2000
- Vanguard International Semiconductor Corporation
- Hao-Chieh Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for simultaneously fabricating capacitor structures, for gig...
- Patent number 6,037,216
- Issue date Mar 14, 2000
- Vanguard International Semiconductor Corporation
- Hao-Chieh Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating reduced contacts using retardation layers
- Patent number 5,972,789
- Issue date Oct 26, 1999
- Vanguard International Semiconductor Corporation
- Erik S. Jeng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for etching high aspect-ratio multilevel contacts
- Patent number 5,906,948
- Issue date May 25, 1999
- Vanguard International Semiconductor Corporation
- Hao-Chieh Liu
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
DRAM STRUCTURE WITH BURIED WORD LINES AND FABRICATION THEREOF, AND...
- Publication number 20140042548
- Publication date Feb 13, 2014
- NANYA TECHNOLOGY CORPORATION
- Hao-Chieh Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRAM STRUCTURE WITH BURIED WORD LINES AND FABRICATION THEREOF, AND...
- Publication number 20120292716
- Publication date Nov 22, 2012
- NANYA TECHNOLOGY CORPORATION
- Hao-Chieh Liu
- H01 - BASIC ELECTRIC ELEMENTS

Hao-Chieh Liu

Person

Patents Grantslast 30 patents

Etching process

Method for forming a plug or damascene trench on a semiconductor de...

Method for forming self-aligned contacts using a hard mask

Method of forming a contact hole in a semiconductor device

Method for forming multi-level contacts using a H-containing fluoro...

Method for forming multi-level contacts

Method for simultaneously fabricating capacitor structures, for gig...

Method for fabricating reduced contacts using retardation layers

Method for etching high aspect-ratio multilevel contacts

Patents Applicationslast 30 patents

DRAM STRUCTURE WITH BURIED WORD LINES AND FABRICATION THEREOF, AND...

DRAM STRUCTURE WITH BURIED WORD LINES AND FABRICATION THEREOF, AND...