Hareesh Thridandam

Person

Vista, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma enhanced cyclic chemical vapor deposition of silicon-contain...
- Patent number 8,828,505
- Issue date Sep 9, 2014
- Air Products and Chemicals, Inc.
- Hareesh Thridandam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process for producing silicon oxide films for organoaminosilane pre...
- Patent number 7,875,312
- Issue date Jan 25, 2011
- Air Products and Chemicals, Inc.
- Hareesh Thridandam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cyclic chemical vapor deposition of metal-silicon containing films
- Patent number 7,678,422
- Issue date Mar 16, 2010
- Air Products and Chemicals, Inc.
- Xinjian Lei
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Diethylsilane as a silicon source in the deposition of metal silica...
- Patent number 7,582,574
- Issue date Sep 1, 2009
- Air Products and Chemicals, Inc.
- Robert Daniel Clark
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ionic additives for extreme low dielectric constant chemical formul...
- Patent number 7,265,062
- Issue date Sep 4, 2007
- Applied Materials, Inc.
- Robert P. Mandal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Organometallic complexes and their use as precursors to deposit met...
- Patent number 7,064,224
- Issue date Jun 20, 2006
- Air Products and Chemicals, Inc.
- Xinjian Lei
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ionic additives for extreme low dielectric constant chemical formul...
- Patent number 6,896,955
- Issue date May 24, 2005
- Air Products and Chemicals, Inc.
- Robert P. Mandal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ionic additives for extreme low dielectric constant chemical formul...
- Patent number 6,576,568
- Issue date Jun 10, 2003
- Applied Materials, Inc.
- Robert P Mandal
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
High Purity Ethylenediamine for Semiconductor Applications
- Publication number 20180022691
- Publication date Jan 25, 2018
- Versum Materials US, LLC
- Hareesh Thridandam
- B08 - CLEANING
Information Patent Application
Plasma Enhanced Cyclic Chemical Vapor Deposition of Silicon- Contai...
- Publication number 20120171874
- Publication date Jul 5, 2012
- Air Products and Chemicals, Inc.
- Hareesh Thridandam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma Enhanced Cyclic Chemical Vapor Deposition of Silicon-Contain...
- Publication number 20080207007
- Publication date Aug 28, 2008
- Air Products and Chemicals, Inc.
- Hareesh Thridandam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Cyclic Chemical Vapor Deposition of Metal-Silicon Containing Films
- Publication number 20080145535
- Publication date Jun 19, 2008
- Air Products and Chemicals, Inc.
- Xinjian Lei
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ORGANOSILANE COMPOUNDS FOR MODIFYING DIELECTRICAL PROPERTIES OF SIL...
- Publication number 20080124946
- Publication date May 29, 2008
- Air Products and Chemicals, Inc.
- MANCHAO XIAO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Diethylsilane As A Silicon Source In The Deposition Of Metal Silica...
- Publication number 20070281475
- Publication date Dec 6, 2007
- Robert Daniel Clark
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Process for producing silicon oxide films from organoaminosilane pr...
- Publication number 20070275166
- Publication date Nov 29, 2007
- Hareesh Thridandam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Preparation of metal silicon nitride films via cyclic deposition
- Publication number 20060182885
- Publication date Aug 17, 2006
- Xinjian Lei
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Ionic additives for extreme low dielectric constant chemical formul...
- Publication number 20040087184
- Publication date May 6, 2004
- APPLIED MATERIALS INC., a Delaware corporation
- Robert P. Mandal
- C01 - INORGANIC CHEMISTRY
Information Patent Application
Ionic additives for extreme low dielectric constant chemical formul...
- Publication number 20030008525
- Publication date Jan 9, 2003
- Applied Materials Inc.
- Robert P. Mandal
- C01 - INORGANIC CHEMISTRY
Information Patent Application
Ionic additives for extreme low dielectric constant chemical formul...
- Publication number 20020042210
- Publication date Apr 11, 2002
- Robert P. Mandal
- C01 - INORGANIC CHEMISTRY

Hareesh Thridandam

Person

Patents Grantslast 30 patents

Plasma enhanced cyclic chemical vapor deposition of silicon-contain...

Process for producing silicon oxide films for organoaminosilane pre...

Cyclic chemical vapor deposition of metal-silicon containing films

Diethylsilane as a silicon source in the deposition of metal silica...

Ionic additives for extreme low dielectric constant chemical formul...

Organometallic complexes and their use as precursors to deposit met...

Ionic additives for extreme low dielectric constant chemical formul...

Ionic additives for extreme low dielectric constant chemical formul...

Patents Applicationslast 30 patents

High Purity Ethylenediamine for Semiconductor Applications

Plasma Enhanced Cyclic Chemical Vapor Deposition of Silicon- Contai...

Plasma Enhanced Cyclic Chemical Vapor Deposition of Silicon-Contain...

Cyclic Chemical Vapor Deposition of Metal-Silicon Containing Films

ORGANOSILANE COMPOUNDS FOR MODIFYING DIELECTRICAL PROPERTIES OF SIL...

Diethylsilane As A Silicon Source In The Deposition Of Metal Silica...

Process for producing silicon oxide films from organoaminosilane pr...

Preparation of metal silicon nitride films via cyclic deposition

Ionic additives for extreme low dielectric constant chemical formul...

Ionic additives for extreme low dielectric constant chemical formul...

Ionic additives for extreme low dielectric constant chemical formul...