Hartmut ENKISCH

Person

Aalen, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Method for producing a reflective optical element and reflective op...
- Patent number 11,073,765
- Issue date Jul 27, 2021
- Carl Zeiss SMT GmbH
- Hartmut Enkisch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective optical element
- Patent number 10,916,356
- Issue date Feb 9, 2021
- Carl Zeiss SMT GmbH
- Dmitry Kuznetsov
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Intensity adaptation filter for EUV microlithography, method for pr...
- Patent number 10,809,625
- Issue date Oct 20, 2020
- Carl Zeiss SMT GmbH
- Hartmut Enkisch
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Mirror element, in particular for a microlithographic projection ex...
- Patent number 10,598,921
- Issue date Mar 24, 2020
- Carl Zeiss SMT GmbH
- Hartmut Enkisch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection optical unit for EUV projection lithography
- Patent number 10,545,323
- Issue date Jan 28, 2020
- Carl Zeiss SMT GmbH
- Markus Schwab
- G02 - OPTICS
Information Patent Grant
Optical system, in particular for a microlithographic projection ex...
- Patent number 10,520,827
- Issue date Dec 31, 2019
- Carl Zeiss SMT GmbH
- Hartmut Enkisch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for producing a mirror element
- Patent number 10,423,073
- Issue date Sep 24, 2019
- Carl Zeiss SMT GmbH
- Hartmut Enkisch
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Mirror, in particular for a microlithographic projection exposure a...
- Patent number 10,331,048
- Issue date Jun 25, 2019
- Carl Zeiss SMT GmbH
- Oliver Dier
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflecting coating with optimized thickness
- Patent number 10,146,136
- Issue date Dec 4, 2018
- Carl Zeiss SMT GmbH
- Martin Endres
- G02 - OPTICS
Information Patent Grant
Mirror, in particular for a microlithographic projection exposure a...
- Patent number 10,061,204
- Issue date Aug 28, 2018
- Carl Zeiss SMT GmbH
- Hartmut Enkisch
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Reflective optical element, and optical system of a microlithograph...
- Patent number 9,915,873
- Issue date Mar 13, 2018
- Carl Zeiss SMT GmbH
- Hartmut Enkisch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Microlithography illumination system and microlithography illuminat...
- Patent number 9,778,576
- Issue date Oct 3, 2017
- Carl Zeiss SMT GmbH
- Damian Fiolka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection objective of a microlithographic projection exposure app...
- Patent number 9,720,329
- Issue date Aug 1, 2017
- Carl Zeiss SMT GmbH
- Hartmut Enkisch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective optical element for EUV lithography and method of manufa...
- Patent number 9,606,446
- Issue date Mar 28, 2017
- Carl Zeiss SMT GmbH
- Norbert Wabra
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Mirror for use in a microlithography projection exposure apparatus
- Patent number 9,568,845
- Issue date Feb 14, 2017
- Carl Zeiss SMT GmbH
- Martin Rocktaeschel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Deflection mirror and projection exposure apparatus for microlithog...
- Patent number 9,341,958
- Issue date May 17, 2016
- Carl Zeiss SMT GmbH
- Hartmut Enkisch
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Microlithography illumination system and microlithography illuminat...
- Patent number 9,304,405
- Issue date Apr 5, 2016
- Carl Zeiss SMT GmbH
- Damian Fiolka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imaging optical system and projection exposure system including the...
- Patent number 9,285,515
- Issue date Mar 15, 2016
- Carl Zeiss SMT GmbH
- Hans-Juergen Mann
- G02 - OPTICS
Information Patent Grant
Imaging optical system and projection exposure system including the...
- Patent number 8,605,255
- Issue date Dec 10, 2013
- Carl Zeiss SMT GmbH
- Hans-Juergen Mann
- G02 - OPTICS
Information Patent Grant
Method for producing a multilayer coating, optical element and opti...
- Patent number 8,457,281
- Issue date Jun 4, 2013
- Carl Zeiss SMT GmbH
- Hartmut Enkisch
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Optical element for radiation in the EUV and/or soft X-ray region a...
- Patent number 8,164,077
- Issue date Apr 24, 2012
- Carl Zeiss SMT GmbH
- Marco Wedowski
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Lens made of a crystalline material
- Patent number 7,672,044
- Issue date Mar 2, 2010
- Carl Zeiss SMT AG
- Birgit Enkisch
- B24 - GRINDING POLISHING
Information Patent Grant
Optical element for radiation in the EUV and/or soft X-ray region a...
- Patent number 7,646,004
- Issue date Jan 12, 2010
- Carl Zeiss SMT AG
- Marco Wedowski
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Projection objective and method for its manufacture
- Patent number 7,429,116
- Issue date Sep 30, 2008
- Carl Zeiss SMT AG
- Hans-Juergen Mann
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Lens made of a crystalline material
- Patent number 7,292,388
- Issue date Nov 6, 2007
- Carl Zeiss SMT AG
- Birgit Enkisch
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
OPTICAL SYSTEM COMPRISING AN EUV MIRROR AND METHOD FOR OPERATING AN...
- Publication number 20250060517
- Publication date Feb 20, 2025
- Carl Zeiss SMT GMBH
- Hartmut Enkisch
- G02 - OPTICS
Information Patent Application
MIRROR, OPTICAL SYSTEM AND METHOD FOR OPERATING AN OPTICAL SYSTEM
- Publication number 20230305290
- Publication date Sep 28, 2023
- Carl Zeiss SMT GMBH
- Hartmut Enkisch
- G02 - OPTICS
Information Patent Application
OPTICAL ELEMENT FOR A EUV PROJECTION EXPOSURE SYSTEM
- Publication number 20230126018
- Publication date Apr 27, 2023
- Carl Zeiss SMT GMBH
- Hartmut ENKISCH
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
REFLECTIVE OPTICAL ELEMENT
- Publication number 20200027623
- Publication date Jan 23, 2020
- Carl Zeiss SMT GMBH
- Dmitry Kuznetsov
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
INTENSITY ADAPTATION FILTER FOR EUV MICROLITHOGRAPHY, METHOD FOR PR...
- Publication number 20190285989
- Publication date Sep 19, 2019
- Carl Zeiss SMT GMBH
- Hartmut ENKISCH
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
OPTICAL SYSTEM, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EX...
- Publication number 20190212659
- Publication date Jul 11, 2019
- Carl Zeiss SMT GMBH
- Hartmut ENKISCH
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
PROJECTION OPTICAL UNIT FOR EUV PROJECTION LITHOGRAPHY
- Publication number 20190121107
- Publication date Apr 25, 2019
- Carl Zeiss SMT GMBH
- Markus Schwab
- G02 - OPTICS
Information Patent Application
METHOD FOR PRODUCING A REFLECTIVE OPTICAL ELEMENT AND REFLECTIVE OP...
- Publication number 20180341179
- Publication date Nov 29, 2018
- Carl Zeiss SMT GMBH
- Hartmut ENKISCH
- G02 - OPTICS
Information Patent Application
MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE A...
- Publication number 20180217507
- Publication date Aug 2, 2018
- Carl Zeiss SMT GMBH
- Oliver DIER
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
MIRROR ELEMENT, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EX...
- Publication number 20180101002
- Publication date Apr 12, 2018
- Carl Zeiss SMT GMBH
- Hartmut ENKISCH
- G02 - OPTICS
Information Patent Application
MIRROR ELEMENT, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EX...
- Publication number 20170176741
- Publication date Jun 22, 2017
- Carl Zeiss SMT GMBH
- Hartmut ENKISCH
- G02 - OPTICS
Information Patent Application
MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE A...
- Publication number 20160377984
- Publication date Dec 29, 2016
- Carl Zeiss SMT GMBH
- Hartmut ENKISCH
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
METHOD FOR PRODUCING A MIRROR ELEMENT
- Publication number 20160342093
- Publication date Nov 24, 2016
- Carl Zeiss SMT GMBH
- Hartmut ENKISCH
- G02 - OPTICS
Information Patent Application
REFLECTIVE OPTICAL ELEMENT, AND OPTICAL SYSTEM OF A MICROLITHOGRAPH...
- Publication number 20160266499
- Publication date Sep 15, 2016
- Carl Zeiss SMT GMBH
- Hartmut ENKISCH
- G02 - OPTICS
Information Patent Application
PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APP...
- Publication number 20160195817
- Publication date Jul 7, 2016
- Carl Zeiss SMT GMBH
- Hartmut Enkisch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MICROLITHOGRAPHY ILLUMINATION SYSTEM AND MICROLITHOGRAPHY ILLUMINAT...
- Publication number 20160195820
- Publication date Jul 7, 2016
- Carl Zeiss SMT GMBH
- Damian Fiolka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTING COATING WITH OPTIMIZED THICKNESS
- Publication number 20160048083
- Publication date Feb 18, 2016
- Carl Zeiss SMT GMBH
- Martin ENDRES
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Reflective Optical Element for EUV Lithography and Method of Manufa...
- Publication number 20150316851
- Publication date Nov 5, 2015
- Carl Zeiss SMT GMBH
- Norbert WABRA
- G02 - OPTICS
Information Patent Application
IMAGING OPTICAL SYSTEM AND PROJECTION EXPOSURE SYSTEM INCLUDING THE...
- Publication number 20140132941
- Publication date May 15, 2014
- Carl Zeiss SMT GMBH
- Hans-Juergen Mann
- G02 - OPTICS
Information Patent Application
Deflection Mirror and Projection Exposure Apparatus for Microlithog...
- Publication number 20140022525
- Publication date Jan 23, 2014
- Carl Zeiss SMT GMBH
- Hartmut ENKISCH
- B82 - NANO-TECHNOLOGY
Information Patent Application
Projection objective of a microlithographic projection exposure app...
- Publication number 20130242278
- Publication date Sep 19, 2013
- Carl Zeiss SMT GMBH
- Hartmut Enkisch
- G02 - OPTICS
Information Patent Application
METHOD FOR PRODUCING FACET MIRRORS AND PROJECTION EXPOSURE APPARATUS
- Publication number 20130100426
- Publication date Apr 25, 2013
- Carl Zeiss SMT GMBH
- Berndt Warm
- G02 - OPTICS
Information Patent Application
MIRROR FOR USE IN A MICROLITHOGRAPHY PROJECTION EXPOSURE APPARATUS
- Publication number 20120229784
- Publication date Sep 13, 2012
- Carl Zeiss SMT GMBH
- Martin ROCKTAESCHEL
- G02 - OPTICS
Information Patent Application
METHOD FOR PRODUCING A MULTILAYER COATING, OPTICAL ELEMENT AND OPTI...
- Publication number 20110222144
- Publication date Sep 15, 2011
- Carl Zeiss SMT GMBH
- Hartmut ENKISCH
- G02 - OPTICS
Information Patent Application
MICROLITHOGRAPHY ILLUMINATION SYSTEM AND MICROLITHOGRAPHY ILLUMINAT...
- Publication number 20110122392
- Publication date May 26, 2011
- Carl Zeiss SMT GMBH
- Damian Fiolka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMAGING OPTICAL SYSTEM AND PROJECTION EXPOSURE INSTALLATION
- Publication number 20100265481
- Publication date Oct 21, 2010
- Carl Zeiss SMT AG
- Hans-Juergen Mann
- G02 - OPTICS
Information Patent Application
OPTICAL ELEMENT FOR RADIATION IN THE EUV AND/OR SOFT X-RAY REGION A...
- Publication number 20100067653
- Publication date Mar 18, 2010
- Carl Zeiss SMT AG
- Marco Wedowski
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD FOR PRODUCING FACET MIRRORS AND PROJECTION EXPOSURE APPARATUS
- Publication number 20100007866
- Publication date Jan 14, 2010
- Carl Zeiss SMT AG
- Berndt Warm
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
PROJECTION OBJECTIVE AND METHOD FOR ITS MANUFACTURE
- Publication number 20090015951
- Publication date Jan 15, 2009
- Carl Zeiss SMT AG
- Hans-Juergen Mann
- G02 - OPTICS
Information Patent Application
Lens Made of a Crystalline Material
- Publication number 20080019013
- Publication date Jan 24, 2008
- Carl Zeiss SMT AG
- Birgit Enkisch
- B24 - GRINDING POLISHING

Hartmut ENKISCH

Person

Patents Grantslast 30 patents

Method for producing a reflective optical element and reflective op...

Reflective optical element

Intensity adaptation filter for EUV microlithography, method for pr...

Mirror element, in particular for a microlithographic projection ex...

Projection optical unit for EUV projection lithography

Optical system, in particular for a microlithographic projection ex...

Method for producing a mirror element

Mirror, in particular for a microlithographic projection exposure a...

Reflecting coating with optimized thickness

Mirror, in particular for a microlithographic projection exposure a...

Reflective optical element, and optical system of a microlithograph...

Microlithography illumination system and microlithography illuminat...

Projection objective of a microlithographic projection exposure app...

Reflective optical element for EUV lithography and method of manufa...

Mirror for use in a microlithography projection exposure apparatus

Deflection mirror and projection exposure apparatus for microlithog...

Microlithography illumination system and microlithography illuminat...

Imaging optical system and projection exposure system including the...

Imaging optical system and projection exposure system including the...

Method for producing a multilayer coating, optical element and opti...

Optical element for radiation in the EUV and/or soft X-ray region a...

Lens made of a crystalline material

Optical element for radiation in the EUV and/or soft X-ray region a...

Projection objective and method for its manufacture

Lens made of a crystalline material

Patents Applicationslast 30 patents

OPTICAL SYSTEM COMPRISING AN EUV MIRROR AND METHOD FOR OPERATING AN...

MIRROR, OPTICAL SYSTEM AND METHOD FOR OPERATING AN OPTICAL SYSTEM

OPTICAL ELEMENT FOR A EUV PROJECTION EXPOSURE SYSTEM

REFLECTIVE OPTICAL ELEMENT

INTENSITY ADAPTATION FILTER FOR EUV MICROLITHOGRAPHY, METHOD FOR PR...

OPTICAL SYSTEM, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EX...

PROJECTION OPTICAL UNIT FOR EUV PROJECTION LITHOGRAPHY

METHOD FOR PRODUCING A REFLECTIVE OPTICAL ELEMENT AND REFLECTIVE OP...

MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE A...

MIRROR ELEMENT, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EX...

MIRROR ELEMENT, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EX...

MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE A...

METHOD FOR PRODUCING A MIRROR ELEMENT

REFLECTIVE OPTICAL ELEMENT, AND OPTICAL SYSTEM OF A MICROLITHOGRAPH...

PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APP...

MICROLITHOGRAPHY ILLUMINATION SYSTEM AND MICROLITHOGRAPHY ILLUMINAT...

REFLECTING COATING WITH OPTIMIZED THICKNESS

Reflective Optical Element for EUV Lithography and Method of Manufa...

IMAGING OPTICAL SYSTEM AND PROJECTION EXPOSURE SYSTEM INCLUDING THE...

Deflection Mirror and Projection Exposure Apparatus for Microlithog...

Projection objective of a microlithographic projection exposure app...

METHOD FOR PRODUCING FACET MIRRORS AND PROJECTION EXPOSURE APPARATUS

MIRROR FOR USE IN A MICROLITHOGRAPHY PROJECTION EXPOSURE APPARATUS

METHOD FOR PRODUCING A MULTILAYER COATING, OPTICAL ELEMENT AND OPTI...

MICROLITHOGRAPHY ILLUMINATION SYSTEM AND MICROLITHOGRAPHY ILLUMINAT...

IMAGING OPTICAL SYSTEM AND PROJECTION EXPOSURE INSTALLATION

OPTICAL ELEMENT FOR RADIATION IN THE EUV AND/OR SOFT X-RAY REGION A...

METHOD FOR PRODUCING FACET MIRRORS AND PROJECTION EXPOSURE APPARATUS

PROJECTION OBJECTIVE AND METHOD FOR ITS MANUFACTURE

Lens Made of a Crystalline Material