Haruhito Ono

Person

Kanagawa, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Imprint method for imprinting a pattern of a mold onto a resin mate...
- Patent number 8,361,336
- Issue date Jan 29, 2013
- Canon Kabushiki Kaisha
- Shingo Okushima
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for forming etching mask, method for fabricating three-dimen...
- Patent number 8,337,712
- Issue date Dec 25, 2012
- Canon Kabushiki Kaisha
- Kenji Tamamori
- G02 - OPTICS
Information Patent Grant
Liquid ejection head utilizing deflection members
- Patent number 8,191,994
- Issue date Jun 5, 2012
- Canon Kabushiki Kaisha
- Toru Nakakubo
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Method of manufacturing a nano structure by etching, using a substr...
- Patent number 8,084,365
- Issue date Dec 27, 2011
- Canon Kabushiki Kaisha
- Taiko Motoi
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Nano structure and method of manufacturing nano structure
- Patent number 7,902,637
- Issue date Mar 8, 2011
- Canon Kabushiki Kaisha
- Taiko Motoi
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Process for formation of three-dimensional photonic crystal
- Patent number 7,727,410
- Issue date Jun 1, 2010
- Canon Kabushiki Kaisha
- Shinan Wang
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for fabricating three-dimensional photonic crystal
- Patent number 7,700,390
- Issue date Apr 20, 2010
- Canon Kabushiki Kaisha
- Shinan Wang
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged beam processing apparatus
- Patent number 7,611,810
- Issue date Nov 3, 2009
- Canon Kabushiki Kaisha
- Masahiko Okunuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electrooptic system array, charged-particle beam exposure apparatus...
- Patent number 7,126,141
- Issue date Oct 24, 2006
- Canon Kabushiki Kaisha
- Haruhito Ono
- G01 - MEASURING TESTING
Information Patent Grant
Deflector, method of manufacturing deflector, and charged particle...
- Patent number 7,109,494
- Issue date Sep 19, 2006
- Canon Kabushiki Kaisha
- Haruhito Ono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-charged beam lens and charged beam exposure apparatus using t...
- Patent number 7,060,984
- Issue date Jun 13, 2006
- Canon Kabushiki Kaisha
- Kenichi Nagae
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrooptic system array, charged-particle beam exposure apparatus...
- Patent number 7,038,226
- Issue date May 2, 2006
- Canon Kabushiki Kaisha
- Haruhito Ono
- G01 - MEASURING TESTING
Information Patent Grant
Electrooptic system array, charged-particle beam exposure apparatus...
- Patent number 6,965,153
- Issue date Nov 15, 2005
- Canon Kabushiki Kaisha
- Haruhito Ono
- G01 - MEASURING TESTING
Information Patent Grant
Multi-charged beam lens, charged-particle beam exposure apparatus u...
- Patent number 6,946,662
- Issue date Sep 20, 2005
- Canon Kabushiki Kaisha
- Haruhito Ono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron optical system, charged-particle beam exposure apparatus u...
- Patent number 6,903,345
- Issue date Jun 7, 2005
- Canon Kabushiki Kaisha
- Haruhito Ono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron optical system array, method of manufacturing the same, ch...
- Patent number 6,872,952
- Issue date Mar 29, 2005
- Canon Kabushiki Kaisha
- Yasuhiro Shimada
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Electron optical system array, charged-particle beam exposure appar...
- Patent number 6,872,951
- Issue date Mar 29, 2005
- Canon Kabushiki Kaisha
- Takayuki Yagi
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Electron optical system array, method of fabricating the same, char...
- Patent number 6,872,950
- Issue date Mar 29, 2005
- Canon Kabushiki Kaisha
- Yasuhiro Shimada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged-particle beam exposure apparatus and device manufacturing m...
- Patent number 6,603,128
- Issue date Aug 5, 2003
- Canon Kabushiki Kaisha
- Hiroshi Maehara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask pattern transfer method, mask pattern transfer apparatus using...
- Patent number 6,559,463
- Issue date May 6, 2003
- Canon Kabushiki Kaisha
- Haruhito Ono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged beam mask having strut wider than charged beam, with shape...
- Patent number 6,335,127
- Issue date Jan 1, 2002
- Canon Kabushiki Kaisha
- Haruhito Ono
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multi-electron beam source with driving circuit for preventing volt...
- Patent number 6,157,137
- Issue date Dec 5, 2000
- Canon Kabushiki Kaisha
- Hidetoshi Suzuki
- G09 - EDUCATION CRYPTOGRAPHY DISPLAY ADVERTISING SEALS
Information Patent Grant
Image forming apparatus
- Patent number 6,011,567
- Issue date Jan 4, 2000
- Canon Kabushiki Kaisha
- Naoto Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam-generating device, and image-forming apparatus and re...
- Patent number 6,005,333
- Issue date Dec 21, 1999
- Canon Kabushiki Kaisha
- Tetsuya Kaneko
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Electron-beam generator and image display apparatus making use of it
- Patent number 5,757,123
- Issue date May 26, 1998
- Canon Kabushiki Kaisha
- Ichiro Nomura
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Multi-electron beam source and image display device using the same
- Patent number 5,682,085
- Issue date Oct 28, 1997
- Canon Kabushiki Kaisha
- Hidetoshi Suzuki
- G09 - EDUCATION CRYPTOGRAPHY DISPLAY ADVERTISING SEALS
Information Patent Grant
Multi-electron beam source with a cut off circuit and image device...
- Patent number 5,627,436
- Issue date May 6, 1997
- Canon Kabushiki Kaisha
- Hidetoshi Suzuki
- G09 - EDUCATION CRYPTOGRAPHY DISPLAY ADVERTISING SEALS
Information Patent Grant
Electron beam apparatus and method for driving the same
- Patent number 5,233,196
- Issue date Aug 3, 1993
- Canon Kabushiki Kaisha
- Masahiko Okunuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron-beam generator and image display apparatus making use of it
- Patent number 5,185,554
- Issue date Feb 9, 1993
- Canon Kabushiki Kaisha
- Ichiro Nomura
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Semiconductor electron emitting device
- Patent number 5,138,402
- Issue date Aug 11, 1992
- Canon Kabushiki Kaisha
- Takeo Tsukamoto
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
LIQUID EJECTION HEAD
- Publication number 20110249063
- Publication date Oct 13, 2011
- Canon Kabushiki Kaisha
- Toru Nakakubo
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
IMPRINT METHOD AND PROCESSING METHOD OF SUBSTRATE USING THE IMPRINT...
- Publication number 20110042352
- Publication date Feb 24, 2011
- Canon Kabushiki Kaisha
- Shingo Okushima
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
Method of Manufacturing A Nano Structure By Etching, Using A Substr...
- Publication number 20110027998
- Publication date Feb 3, 2011
- Canon Kabushiki Kaisha
- Taiko Motoi
- B82 - NANO-TECHNOLOGY
Information Patent Application
IMPRINT METHOD AND PROCESSING METHOD OF SUBSTRATE
- Publication number 20100233432
- Publication date Sep 16, 2010
- Canon Kabushiki Kaisha
- Shingo Okushima
- B82 - NANO-TECHNOLOGY
Information Patent Application
NANO STRUCTURE AND MANUFACTURING METHOD OF NANO STRUCTURE
- Publication number 20090315153
- Publication date Dec 24, 2009
- Canon Kabushiki Kaisha
- Taiko Motoi
- B82 - NANO-TECHNOLOGY
Information Patent Application
PHOTONIC CRYSTAL STRUCTURE AND METHOD OF MANUFACTURING THE SAME
- Publication number 20080298744
- Publication date Dec 4, 2008
- Canon Kabushiki Kaisha
- Shinan Wang
- G02 - OPTICS
Information Patent Application
PROCESS FOR PRODUCING THREE-DIMENSIONAL PHOTONIC CRYSTAL AND THE TH...
- Publication number 20080283487
- Publication date Nov 20, 2008
- Canon Kabushiki Kaisha
- Shinan Wang
- G02 - OPTICS
Information Patent Application
METHOD FOR FORMING ETCHING MASK, METHOD FOR FABRICATING THREE-DIMEN...
- Publication number 20080283493
- Publication date Nov 20, 2008
- Canon Kabushiki Kaisha
- Kenji Tamamori
- G02 - OPTICS
Information Patent Application
METHOD FOR FABRICATING THREE-DIMENSIONAL PHOTONIC CRYSTAL
- Publication number 20080286892
- Publication date Nov 20, 2008
- Canon Kabushiki Kaisha
- Shinan Wang
- G02 - OPTICS
Information Patent Application
CHARGED BEAM PROCESSING APPARATUS
- Publication number 20080067437
- Publication date Mar 20, 2008
- Canon Kabushiki Kaisha
- Masahiko OKUNUKI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Process for formation of three-dimensional photonic crystal
- Publication number 20070196066
- Publication date Aug 23, 2007
- Canon Kabushiki Kaisha
- Shinan Wang
- G02 - OPTICS
Information Patent Application
Electrooptic system array, charged-particle beam exposure apparatus...
- Publication number 20050253082
- Publication date Nov 17, 2005
- Canon Kabushiki Kaisha
- Haruhito Ono
- G01 - MEASURING TESTING
Information Patent Application
Multi-charged beam lens and charged beam exposure apparatus using t...
- Publication number 20050077475
- Publication date Apr 14, 2005
- Canon Kabushiki Kaisha
- Kenichi Nagae
- B82 - NANO-TECHNOLOGY
Information Patent Application
Deflector, method of manufacturing deflector, and charged particle...
- Publication number 20040169147
- Publication date Sep 2, 2004
- Canon Kabushiki Kaisha
- Haruhito Ono
- B82 - NANO-TECHNOLOGY
Information Patent Application
Multi-charged beam lens, charged-particle beam exposure apparatus u...
- Publication number 20040061064
- Publication date Apr 1, 2004
- Canon Kabushiki Kaisha
- Haruhito Ono
- B82 - NANO-TECHNOLOGY
Information Patent Application
Electrooptic system array, charged-particle beam exposure apparatus...
- Publication number 20030209673
- Publication date Nov 13, 2003
- Canon Kabushiki Kaisha
- Haruhito Ono
- G01 - MEASURING TESTING
Information Patent Application
MASK PATTERN TRANSFER METHOD, MASK PATTERN TRANSFER APPARATUS USING...
- Publication number 20030034460
- Publication date Feb 20, 2003
- Haruhito Ono
- B82 - NANO-TECHNOLOGY
Information Patent Application
Charged-particle beam exposure apparatus and device manufacturing m...
- Publication number 20020009901
- Publication date Jan 24, 2002
- Hiroshi Maehara
- B82 - NANO-TECHNOLOGY
Information Patent Application
Electrooptic system array, charged-particle beam exposure apparatus...
- Publication number 20020005491
- Publication date Jan 17, 2002
- Takayuki Yagi
- B82 - NANO-TECHNOLOGY
Information Patent Application
Electron optical system, charged-particle beam exposure apparatus u...
- Publication number 20020000766
- Publication date Jan 3, 2002
- Haruhito Ono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electron optical system array, method of fabricating the same, char...
- Publication number 20010054690
- Publication date Dec 27, 2001
- Yasuhiro Shimada
- B82 - NANO-TECHNOLOGY
Information Patent Application
Electron optical system array, method of manufacturing the same, ch...
- Publication number 20010052576
- Publication date Dec 20, 2001
- Yasuhiro Shimada
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING

Haruhito Ono

Person

Patents Grantslast 30 patents

Imprint method for imprinting a pattern of a mold onto a resin mate...

Method for forming etching mask, method for fabricating three-dimen...

Liquid ejection head utilizing deflection members

Method of manufacturing a nano structure by etching, using a substr...

Nano structure and method of manufacturing nano structure

Process for formation of three-dimensional photonic crystal

Method for fabricating three-dimensional photonic crystal

Charged beam processing apparatus

Electrooptic system array, charged-particle beam exposure apparatus...

Deflector, method of manufacturing deflector, and charged particle...

Multi-charged beam lens and charged beam exposure apparatus using t...

Electrooptic system array, charged-particle beam exposure apparatus...

Electrooptic system array, charged-particle beam exposure apparatus...

Multi-charged beam lens, charged-particle beam exposure apparatus u...

Electron optical system, charged-particle beam exposure apparatus u...

Electron optical system array, method of manufacturing the same, ch...

Electron optical system array, charged-particle beam exposure appar...

Electron optical system array, method of fabricating the same, char...

Charged-particle beam exposure apparatus and device manufacturing m...

Mask pattern transfer method, mask pattern transfer apparatus using...

Charged beam mask having strut wider than charged beam, with shape...

Multi-electron beam source with driving circuit for preventing volt...

Image forming apparatus

Electron beam-generating device, and image-forming apparatus and re...

Electron-beam generator and image display apparatus making use of it

Multi-electron beam source and image display device using the same

Multi-electron beam source with a cut off circuit and image device...

Electron beam apparatus and method for driving the same

Electron-beam generator and image display apparatus making use of it

Semiconductor electron emitting device

Patents Applicationslast 30 patents

LIQUID EJECTION HEAD

IMPRINT METHOD AND PROCESSING METHOD OF SUBSTRATE USING THE IMPRINT...

Method of Manufacturing A Nano Structure By Etching, Using A Substr...

IMPRINT METHOD AND PROCESSING METHOD OF SUBSTRATE

NANO STRUCTURE AND MANUFACTURING METHOD OF NANO STRUCTURE

PHOTONIC CRYSTAL STRUCTURE AND METHOD OF MANUFACTURING THE SAME

PROCESS FOR PRODUCING THREE-DIMENSIONAL PHOTONIC CRYSTAL AND THE TH...

METHOD FOR FORMING ETCHING MASK, METHOD FOR FABRICATING THREE-DIMEN...

METHOD FOR FABRICATING THREE-DIMENSIONAL PHOTONIC CRYSTAL

CHARGED BEAM PROCESSING APPARATUS

Process for formation of three-dimensional photonic crystal

Electrooptic system array, charged-particle beam exposure apparatus...

Multi-charged beam lens and charged beam exposure apparatus using t...

Deflector, method of manufacturing deflector, and charged particle...

Multi-charged beam lens, charged-particle beam exposure apparatus u...

Electrooptic system array, charged-particle beam exposure apparatus...

MASK PATTERN TRANSFER METHOD, MASK PATTERN TRANSFER APPARATUS USING...

Charged-particle beam exposure apparatus and device manufacturing m...

Electrooptic system array, charged-particle beam exposure apparatus...

Electron optical system, charged-particle beam exposure apparatus u...

Electron optical system array, method of fabricating the same, char...

Electron optical system array, method of manufacturing the same, ch...