Haruki Mori

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Yokohama, JP

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Patents Grantslast 30 patents

Information Patent Grant
Etching method and apparatus
- Patent number 5,766,494
- Issue date Jun 16, 1998
- Kabushiki Kaisha Toshiba
- Haruki Mori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of etching silicon nitride film
- Patent number 5,756,402
- Issue date May 26, 1998
- Kabushiki Kaisha Toshiba
- Sadayuki Jimbo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 5,445,710
- Issue date Aug 29, 1995
- Kabushiki Kaisha Toshiba
- Masaru Hori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus etching tunnel-type
- Patent number 5,383,984
- Issue date Jan 24, 1995
- Tokyo Electron Limited
- Yutaka Shimada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 5,302,240
- Issue date Apr 12, 1994
- Kabushiki Kaisha Toshiba
- Masaru Hori
- H01 - BASIC ELECTRIC ELEMENTS