Haruo Sudo

Person

Kitakanbara-gun, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Thermal processing method for silicon wafer
- Patent number 11,162,191
- Issue date Nov 2, 2021
- Globalwafers Japan Co., Ltd
- Susumu Maeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Evaluation method of silicon wafer
- Patent number 11,060,983
- Issue date Jul 13, 2021
- Globalwafers Japan Co., Ltd
- Haruo Sudo
- G01 - MEASURING TESTING
Information Patent Grant
Silicon wafer
- Patent number 10,648,101
- Issue date May 12, 2020
- Globalwafers Japan Co., Ltd
- Susumu Maeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon wafer and method for manufacturing the same
- Patent number 10,141,180
- Issue date Nov 27, 2018
- Globalwafers Japan Co., Ltd
- Koji Araki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon wafer and method for heat-treating silicon wafer
- Patent number 8,999,864
- Issue date Apr 7, 2015
- Global Wafers Japan Co., Ltd.
- Takeshi Senda
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method of manufacturing single crystal silicon wafer from ingot gro...
- Patent number 8,476,149
- Issue date Jul 2, 2013
- Global Wafers Japan Co., Ltd.
- Hiromichi Isogai
- C30 - CRYSTAL GROWTH
Information Patent Grant
Method for heat treating a silicon wafer
- Patent number 8,399,341
- Issue date Mar 19, 2013
- Covalent Materials Corporation
- Takeshi Senda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of heat treating silicon wafer
- Patent number 8,252,700
- Issue date Aug 28, 2012
- Covalent Materials Corporation
- Takeshi Senda
- C30 - CRYSTAL GROWTH

Patents Applicationslast 30 patents

Information Patent Application
HEAT TREATMENT APPARATUS, METHOD OF MAINTAINING HEAT TREATMENT APPA...
- Publication number 20240393052
- Publication date Nov 28, 2024
- GlobalWafers Japan Co., Ltd.
- Haruo SUDO
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Application
HEAT TREATMENT APPARATUS AND SEMICONDUCTOR SUBSTRATE MANUFACTURING...
- Publication number 20240395584
- Publication date Nov 28, 2024
- GlobalWafers Japan Co., Ltd.
- Takuya KAKUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR WAFERS AND METHOD OF MANUFACT...
- Publication number 20240379341
- Publication date Nov 14, 2024
- GlobalWafers Japan Co., Ltd.
- Ken HAYAKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR WAFER AND SEMICONDUCTOR DEVICE
- Publication number 20240363363
- Publication date Oct 31, 2024
- GlobalWafers Japan Co., Ltd.
- Ken HAYAKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SILICON WAFERS
- Publication number 20240339315
- Publication date Oct 10, 2024
- GlobalWafers Japan Co., Ltd.
- Susumu MAEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON WAFER AND METHOD FOR PRODUCING SILICON WAFER
- Publication number 20230243062
- Publication date Aug 3, 2023
- GLOBALWAFERS JAPAN CO., LTD.
- Haruo SUDO
- C30 - CRYSTAL GROWTH
Information Patent Application
MANUFACTURING METHOD FOR SEMICONDUCTOR SILICON WAFER
- Publication number 20230073641
- Publication date Mar 9, 2023
- GlobalWafers Japan Co., Ltd.
- Takeshi SENDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
EVALUATION METHOD OF SILICON WAFER
- Publication number 20210055232
- Publication date Feb 25, 2021
- GlobalWafers Japan Co., Ltd.
- Haruo SUDO
- G01 - MEASURING TESTING
Information Patent Application
THERMAL PROCESSING METHOD FOR SILICON WAFER
- Publication number 20200181802
- Publication date Jun 11, 2020
- GLOBALWAFERS JAPAN CO., LTD.
- Susumu MAEDA
- C30 - CRYSTAL GROWTH
Information Patent Application
SILICON WAFER
- Publication number 20190119828
- Publication date Apr 25, 2019
- GLOBALWAFERS JAPAN CO., LTD.
- Susumu MAEDA
- C30 - CRYSTAL GROWTH
Information Patent Application
METHOD FOR MANUFACTURING A SILICON WAFER
- Publication number 20160293446
- Publication date Oct 6, 2016
- GlobalWafers Japan Co., Ltd.
- Haruo SUDO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON WAFER AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20150044422
- Publication date Feb 12, 2015
- GLOBALWAFERS JAPAN CO., LTD.
- Koji ARAKI
- C30 - CRYSTAL GROWTH
Information Patent Application
METHOD FOR HEAT-TREATING SILICON WAFER
- Publication number 20130078588
- Publication date Mar 28, 2013
- Covalent Silicon Corporation
- Takeshi Senda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR HEAT TREATING A SILICON WAFER
- Publication number 20120184091
- Publication date Jul 19, 2012
- Covalent Materials Corporation
- Takeshi Senda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON WAFER AND METHOD FOR HEAT-TREATING SILICON WAFER
- Publication number 20120139088
- Publication date Jun 7, 2012
- Covalent Materials Corporation
- Takeshi Senda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of heat treating silicon wafer
- Publication number 20100197146
- Publication date Aug 5, 2010
- COVALENT MATERIALS CORPORATION
- Takeshi Senda
- C30 - CRYSTAL GROWTH
Information Patent Application
SILICON WAFER, METHOD FOR MANUFACTURING THE SAME AND METHOD FOR HEA...
- Publication number 20100038757
- Publication date Feb 18, 2010
- COVALENT MATERIALS CORPORATION
- Hiromichi Isogai
- C30 - CRYSTAL GROWTH

Person

Patents Grantslast 30 patents

Thermal processing method for silicon wafer

Evaluation method of silicon wafer

Silicon wafer

Silicon wafer and method for manufacturing the same

Silicon wafer and method for heat-treating silicon wafer

Method of manufacturing single crystal silicon wafer from ingot gro...

Method for heat treating a silicon wafer

Method of heat treating silicon wafer

Patents Applicationslast 30 patents

HEAT TREATMENT APPARATUS, METHOD OF MAINTAINING HEAT TREATMENT APPA...

HEAT TREATMENT APPARATUS AND SEMICONDUCTOR SUBSTRATE MANUFACTURING...

METHOD OF MANUFACTURING SEMICONDUCTOR WAFERS AND METHOD OF MANUFACT...

METHOD OF MANUFACTURING SEMICONDUCTOR WAFER AND SEMICONDUCTOR DEVICE

METHOD OF MANUFACTURING SILICON WAFERS

SILICON WAFER AND METHOD FOR PRODUCING SILICON WAFER

MANUFACTURING METHOD FOR SEMICONDUCTOR SILICON WAFER

EVALUATION METHOD OF SILICON WAFER

THERMAL PROCESSING METHOD FOR SILICON WAFER

SILICON WAFER

METHOD FOR MANUFACTURING A SILICON WAFER

SILICON WAFER AND METHOD FOR MANUFACTURING THE SAME

METHOD FOR HEAT-TREATING SILICON WAFER

METHOD FOR HEAT TREATING A SILICON WAFER

SILICON WAFER AND METHOD FOR HEAT-TREATING SILICON WAFER

Method of heat treating silicon wafer

SILICON WAFER, METHOD FOR MANUFACTURING THE SAME AND METHOD FOR HEA...