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Hatsuyuki Tanaka
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Samukawa, JP
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last 30 patents
Information
Patent Grant
Developer solution for acitinic ray sensitive resist
Patent number
6,329,126
Issue date
Dec 11, 2001
Tokyo Ohka Kogyo Co., Ltd.
Hatsuyuki Tanaka
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Developer solution for photoresist composition
Patent number
5,985,525
Issue date
Nov 16, 1999
Tokyo Ohta Kogyo Co., Ltd.
Mitsuru Sato
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Method for forming a protective coating film on electronic parts an...
Patent number
5,662,961
Issue date
Sep 2, 1997
Tokyo Ohka Kogyo Co., Ltd.
Katsuya Tanitsu
G02 - OPTICS
Information
Patent Grant
Method and liquid coating composition for the formation of silica-b...
Patent number
5,614,251
Issue date
Mar 25, 1997
Tokyo Ohka Kogyo Co., Ltd.
Yoshinori Sakamoto
C03 - GLASS MINERAL OR SLAG WOOL
Information
Patent Grant
Developer solution for actinic ray-sensitive resist
Patent number
5,543,268
Issue date
Aug 6, 1996
Tokyo Ohka Kogyo Co., Ltd.
Hatsuyuki Tanaka
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Method for forming a protective coating film on electronic parts an...
Patent number
5,520,952
Issue date
May 28, 1996
Tokyo Ohka Kogyo Co., Ltd.
Katsuya Tanitsu
G02 - OPTICS
Information
Patent Grant
Method and liquid coating composition for the formation of silica-b...
Patent number
5,496,402
Issue date
Mar 5, 1996
Tokyo Ohka Kogyo Co, Ltd.
Yoshinori Sakamoto
C03 - GLASS MINERAL OR SLAG WOOL
Information
Patent Grant
Liquid coating composition
Patent number
5,457,153
Issue date
Oct 10, 1995
Tokyo Ohka Kogyo Co., Ltd.
Yoshio Hagiwara
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Negative-working radiation-sensitive resist composition
Patent number
5,368,783
Issue date
Nov 29, 1994
Tokyo Ohka Kogyo Co., Ltd.
Masakazu Kobayashi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Positive-working photoresist containing o-naphthoquinone diazide su...
Patent number
5,281,508
Issue date
Jan 25, 1994
Tokyo Ohka Kogyo Co., Ltd.
Hidekatsu Kohara
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Positive-working photoresist composition containing quinone diazide...
Patent number
5,100,758
Issue date
Mar 31, 1992
Tokyo Ohka Kobyo Co., Ltd.
Hatsuyuki Tanaka
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Developer solution for positive-working resist composition
Patent number
4,997,748
Issue date
Mar 5, 1991
Tokyo Ohka Kogyo Co., Ltd.
Yasuyuki Takeda
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Remover solution for resist
Patent number
4,944,893
Issue date
Jul 31, 1990
Tokyo Ohka Kogyo Co., Ltd.
Hatsuyuki Tanaka
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Positive-working photoresist composition with quinone diazide sulfo...
Patent number
4,906,549
Issue date
Mar 6, 1990
Tokyo Ohka Kogyo Co., Ltd.
Shingo Asaumi
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Positive-working photosensitive quinone diazide composition with al...
Patent number
4,882,260
Issue date
Nov 21, 1989
Tokyo Ohka Kogyo Co., Ltd.
Hidekatsu Kohara
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Method for forming a resist pattern on a substrate surface and a sc...
Patent number
4,873,177
Issue date
Oct 10, 1989
Tokyo Ohka Kogyo Co., Ltd.
Hatsuyuki Tanaka
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Developing solution for positive-working photoresist comprising tma...
Patent number
4,833,067
Issue date
May 23, 1989
Tokyo Ohka Kogyo Co., Ltd.
Hatsuyuki Tanaka
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Method for rinse treatment of a substrate
Patent number
4,824,762
Issue date
Apr 25, 1989
Tokyo Ohka Kogyo Co., Ltd.
Masakazu Kobayashi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Highly heat-resistant positive-working o-quinone diazide containing...
Patent number
4,804,612
Issue date
Feb 14, 1989
Tokyo Ohka Kogyo Co., Ltd.
Shingo Asaumi
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Developing solution for positive-working photoresist comprising a m...
Patent number
4,784,937
Issue date
Nov 15, 1988
Tokyo Ohka Kogyo Co., Ltd.
Hatsuyuki Tanaka
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Positive-working naphthoquinone diazide photoresist composition wit...
Patent number
4,731,319
Issue date
Mar 15, 1988
Tokyo Ohka Kogy Co., Ltd.
Hidekatsu Kohara
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY