Heiko Feldmann

Person

Germany, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Imaging optical arrangement to image an object illuminated by X-rays
- Patent number 12,040,103
- Issue date Jul 16, 2024
- Carl Zeiss SMT GmbH
- Johannes Ruoff
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Optical diffraction component
- Patent number 11,947,265
- Issue date Apr 2, 2024
- Carl Zeiss SMT GmbH
- Heiko Feldmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and method for characterizing a microlithographic mask
- Patent number 11,914,303
- Issue date Feb 27, 2024
- Carl Zeiss SMT GmbH
- Johannes Ruoff
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inspection device for masks for semiconductor lithography and method
- Patent number 11,867,642
- Issue date Jan 9, 2024
- Carl Zeiss SMT GmbH
- Holger Seitz
- G01 - MEASURING TESTING
Information Patent Grant
Detection system for X-ray inspection of an object
- Patent number 11,817,231
- Issue date Nov 14, 2023
- Carl Zeiss SMT GmbH
- Johannes Ruoff
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Optical diffraction component for suppressing at least one target w...
- Patent number 11,194,256
- Issue date Dec 7, 2021
- Carl Zeiss SMT GmbH
- Heiko Feldmann
- G02 - OPTICS
Information Patent Grant
Inspection device for masks for semiconductor lithography and method
- Patent number 10,928,332
- Issue date Feb 23, 2021
- Carl Zeiss SMT GmbH
- Holger Seitz
- G01 - MEASURING TESTING
Information Patent Grant
Optical diffraction component for suppressing at least one target w...
- Patent number 10,852,640
- Issue date Dec 1, 2020
- Carl Zeiss SMT GmbH
- Heiko Feldmann
- G02 - OPTICS
Information Patent Grant
Microlithography projection objective
- Patent number 10,281,824
- Issue date May 7, 2019
- Carl Zeiss SMT GmbH
- Heiko Feldmann
- G02 - OPTICS
Information Patent Grant
Mirror and related EUV systems and methods
- Patent number 10,274,649
- Issue date Apr 30, 2019
- Carl Zeiss SMT GmbH
- Johannes Ruoff
- G02 - OPTICS
Information Patent Grant
Illumination system and projection objective of a mask inspection a...
- Patent number 10,114,293
- Issue date Oct 30, 2018
- Carl Zeiss SMT GmbH
- Heiko Feldmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chromatically corrected objective with specifically structured and...
- Patent number 10,101,668
- Issue date Oct 16, 2018
- Carl Zeiss SMT GmbH
- Alexander Epple
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Microlithographic projection exposure apparatus
- Patent number 9,733,395
- Issue date Aug 15, 2017
- Carl Zeiss SMT GmbH
- Vladimir Kamenov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Arrangement of a mirror
- Patent number 9,658,533
- Issue date May 23, 2017
- Carl Zeiss SMT GmbH
- Johannes Ruoff
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Projection lens with wavefront manipulator
- Patent number 9,651,872
- Issue date May 16, 2017
- Carl Zeiss SMT GmbH
- Heiko Feldmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for improving the imaging properties of a projection objecti...
- Patent number 9,581,813
- Issue date Feb 28, 2017
- Carl Zeiss SMT GmbH
- Olaf Conradi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical device
- Patent number 9,568,394
- Issue date Feb 14, 2017
- Carl Zeiss SMT GmbH
- Rolf Freimann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing a projection objective and projection objec...
- Patent number 9,360,775
- Issue date Jun 7, 2016
- Carl Zeiss SMT GmbH
- Heiko Feldmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure apparatus for EUV microlithography and method f...
- Patent number 9,298,097
- Issue date Mar 29, 2016
- Carl Zeiss SMT GmbH
- Marc Bienert
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection lens with wavefront manipulator
- Patent number 9,298,102
- Issue date Mar 29, 2016
- Carl Zeiss SMT GmbH
- Heiko Feldmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection lens system of a microlithographic projection exposure i...
- Patent number 9,164,396
- Issue date Oct 20, 2015
- Carl Zeiss SMT GmbH
- Helmut Beierl
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical arrangement for three-dimensionally patterning a material l...
- Patent number 9,158,205
- Issue date Oct 13, 2015
- Carl Zeiss SMT GmbH
- Heiko Feldmann
- G02 - OPTICS
Information Patent Grant
Optical imaging device and imaging method for microscopy
- Patent number 9,104,026
- Issue date Aug 11, 2015
- Carl Zeiss SMT GmbH
- Alexander Epple
- G02 - OPTICS
Information Patent Grant
Microlithography projection objective
- Patent number 9,097,984
- Issue date Aug 4, 2015
- Carl Zeiss SMT GmbH
- Heiko Feldmann
- G02 - OPTICS
Information Patent Grant
Method for improving the imaging properties of a projection objecti...
- Patent number 9,069,263
- Issue date Jun 30, 2015
- Carl Zeiss SMT GmbH
- Olaf Conradi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Microlithographic projection exposure apparatus
- Patent number 8,982,325
- Issue date Mar 17, 2015
- Carl Zeiss SMT GmbH
- Michael Totzeck
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination system for a microlithgraphic exposure apparatus
- Patent number 8,873,151
- Issue date Oct 28, 2014
- Carl Zeiss SMT GmbH
- Alexander Sohmer
- G02 - OPTICS
Information Patent Grant
Magnifying imaging optical system and metrology system with an imag...
- Patent number 8,837,041
- Issue date Sep 16, 2014
- Carl Zeiss SMT GmbH
- Hans-Juergen Mann
- G02 - OPTICS
Information Patent Grant
Optical imaging device and imaging method for microscopy
- Patent number 8,711,472
- Issue date Apr 29, 2014
- Carl Zeiss SMT GmbH
- Hans-Juergen Mann
- G02 - OPTICS
Information Patent Grant
Method and apparatus for analyzing and/or repairing of an EUV mask...
- Patent number 8,674,329
- Issue date Mar 18, 2014
- Carl Zeiss SMS GmbH
- Michael Budach
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
IMAGING OPTICAL ARRANGEMENT TO IMAGE AN OBJECT ILLUMINATED BY X-RAYS
- Publication number 20240295507
- Publication date Sep 5, 2024
- Carl Zeiss SMT GMBH
- Johannes Ruoff
- G01 - MEASURING TESTING
Information Patent Application
APPARATUS AND METHOD FOR CHARACTERIZING A MICROLITHOGRAPHIC MASK
- Publication number 20240152057
- Publication date May 9, 2024
- Carl Zeiss SMT GMBH
- Johannes Ruoff
- G01 - MEASURING TESTING
Information Patent Application
OPTICAL SYSTEM, LITHOGRAPHY APPARATUS AND METHOD
- Publication number 20230367227
- Publication date Nov 16, 2023
- Carl Zeiss SMT GMBH
- Heiko Feldmann
- G02 - OPTICS
Information Patent Application
DETECTION SYSTEM FOR X-RAY INSPECTION OF AN OBJECT
- Publication number 20230046280
- Publication date Feb 16, 2023
- Carl Zeiss SMT GMBH
- Johannes Ruoff
- G01 - MEASURING TESTING
Information Patent Application
IMAGING OPTICAL ARRANGEMENT TO IMAGE AN OBJECT ILLUMINATED BY X-RAYS
- Publication number 20230050439
- Publication date Feb 16, 2023
- Carl Zeiss SMT GMBH
- Johannes Ruoff
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
OPTICAL DIFFRACTION COMPONENT
- Publication number 20220171292
- Publication date Jun 2, 2022
- Carl Zeiss SMT GmbH
- Heiko Feldmann
- G02 - OPTICS
Information Patent Application
APPARATUS AND METHOD FOR CHARACTERIZING A MICROLITHOGRAPHIC MASK
- Publication number 20210397099
- Publication date Dec 23, 2021
- Carl Zeiss SMT GMBH
- Johannes Ruoff
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL DIFFRACTION COMPONENT FOR SUPPRESSING AT LEAST ONE TARGET W...
- Publication number 20210318622
- Publication date Oct 14, 2021
- Carl Zeiss SMT GMBH
- Heiko Feldmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INSPECTION DEVICE FOR MASKS FOR SEMICONDUCTOR LITHOGRAPHY AND METHOD
- Publication number 20210156809
- Publication date May 27, 2021
- Carl Zeiss SMT GMBH
- Holger Seitz
- G01 - MEASURING TESTING
Information Patent Application
OPTICAL DIFFRACTION COMPONENT FOR SUPPRESSING AT LEAST ONE TARGET W...
- Publication number 20200225586
- Publication date Jul 16, 2020
- Carl Zeiss SMT GMBH
- Heiko Feldmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INSPECTION DEVICE FOR MASKS FOR SEMICONDUCTOR LITHOGRAPHY AND METHOD
- Publication number 20190011376
- Publication date Jan 10, 2019
- Carl Zeiss SMT GMBH
- Holger Seitz
- G01 - MEASURING TESTING
Information Patent Application
MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
- Publication number 20170322343
- Publication date Nov 9, 2017
- Carl Zeiss SMT GMBH
- Vladimir Kamenov
- G02 - OPTICS
Information Patent Application
OPTICAL DEVICE
- Publication number 20170284893
- Publication date Oct 5, 2017
- Carl Zeiss SMT GMBH
- Rolf FREIMANN
- G01 - MEASURING TESTING
Information Patent Application
MICROLITHOGRAPHY PROJECTION OBJECTIVE
- Publication number 20170192362
- Publication date Jul 6, 2017
- Carl Zeiss SMT GMBH
- Heiko Feldmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION LENS WITH WAVEFRONT MANIPULATOR
- Publication number 20150370172
- Publication date Dec 24, 2015
- Carl Zeiss SMT GMBH
- Heiko Feldmann
- G02 - OPTICS
Information Patent Application
METHOD FOR IMPROVING THE IMAGING PROPERTIES OF A PROJECTION OBJECTI...
- Publication number 20150293352
- Publication date Oct 15, 2015
- Carl Zeiss SMT GMBH
- Olaf Conradi
- G02 - OPTICS
Information Patent Application
OPTICAL ARRANGEMENT FOR THREE-DIMENSIONALLY PATTERNING A MATERIAL L...
- Publication number 20150098071
- Publication date Apr 9, 2015
- Carl Zeiss SMT GMBH
- Heiko Feldmann
- G02 - OPTICS
Information Patent Application
MICROLITHOGRAPHY PROJECTION OBJECTIVE
- Publication number 20140333913
- Publication date Nov 13, 2014
- Heiko Feldmann
- G02 - OPTICS
Information Patent Application
MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
- Publication number 20140320955
- Publication date Oct 30, 2014
- Vladimir Kamenov
- G02 - OPTICS
Information Patent Application
MICROLITHOGRAPHY PROJECTION OBJECTIVE
- Publication number 20140293256
- Publication date Oct 2, 2014
- Heiko Feldmann
- G02 - OPTICS
Information Patent Application
PROJECTION LENS WITH WAVEFRONT MANIPULATOR
- Publication number 20140268084
- Publication date Sep 18, 2014
- Heiko Feldmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ARRANGEMENT OF A MIRROR
- Publication number 20140240686
- Publication date Aug 28, 2014
- Johannes Ruoff
- B82 - NANO-TECHNOLOGY
Information Patent Application
OPTICAL DEVICE
- Publication number 20140023835
- Publication date Jan 23, 2014
- Carl Zeiss SMT GMBH
- Rolf FREIMANN
- G01 - MEASURING TESTING
Information Patent Application
METHOD FOR MASK INSPECTION, AND MASK INSPECTION INSTALLATION
- Publication number 20130335552
- Publication date Dec 19, 2013
- Carl-Zeiss AG
- Heiko Feldmann
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Application
Projection Exposure Apparatus for EUV Microlithography and Method f...
- Publication number 20130250265
- Publication date Sep 26, 2013
- Carl Zeiss SMT GMBH
- Marc Bienert
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHROMATICALLY CORRECTED OBJECTIVE WITH SPECIFICALLY STRUCTURED AND...
- Publication number 20130201464
- Publication date Aug 8, 2013
- Carl Zeiss SMT GMBH
- Alexander EPPLE
- G02 - OPTICS
Information Patent Application
Mirror and Related EUV Systems and Methods
- Publication number 20130188163
- Publication date Jul 25, 2013
- Carl Zeiss SMT GMBH
- Johannes Ruoff
- G02 - OPTICS
Information Patent Application
METHOD AND APPARATUS FOR ANALYZING AND/OR REPAIRING OF AN EUV MASK...
- Publication number 20130156939
- Publication date Jun 20, 2013
- Michael Budach
- B82 - NANO-TECHNOLOGY
Information Patent Application
PROJECTION LENS SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE I...
- Publication number 20130070224
- Publication date Mar 21, 2013
- Carl Zeiss SMT GMBH
- Helmut Beierl
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION SYSTEM AND PROJECTION OBJECTIVE OF A MASK INSPECTION A...
- Publication number 20130038850
- Publication date Feb 14, 2013
- CARL ZEISS SMT GMBH
- Heiko Feldmann
- G01 - MEASURING TESTING

Heiko Feldmann

Person

Patents Grantslast 30 patents

Imaging optical arrangement to image an object illuminated by X-rays

Optical diffraction component

Apparatus and method for characterizing a microlithographic mask

Inspection device for masks for semiconductor lithography and method

Detection system for X-ray inspection of an object

Optical diffraction component for suppressing at least one target w...

Inspection device for masks for semiconductor lithography and method

Optical diffraction component for suppressing at least one target w...

Microlithography projection objective

Mirror and related EUV systems and methods

Illumination system and projection objective of a mask inspection a...

Chromatically corrected objective with specifically structured and...

Microlithographic projection exposure apparatus

Arrangement of a mirror

Projection lens with wavefront manipulator

Method for improving the imaging properties of a projection objecti...

Optical device

Method of manufacturing a projection objective and projection objec...

Projection exposure apparatus for EUV microlithography and method f...

Projection lens with wavefront manipulator

Projection lens system of a microlithographic projection exposure i...

Optical arrangement for three-dimensionally patterning a material l...

Optical imaging device and imaging method for microscopy

Microlithography projection objective

Method for improving the imaging properties of a projection objecti...

Microlithographic projection exposure apparatus

Illumination system for a microlithgraphic exposure apparatus

Magnifying imaging optical system and metrology system with an imag...

Optical imaging device and imaging method for microscopy

Method and apparatus for analyzing and/or repairing of an EUV mask...

Patents Applicationslast 30 patents

IMAGING OPTICAL ARRANGEMENT TO IMAGE AN OBJECT ILLUMINATED BY X-RAYS

APPARATUS AND METHOD FOR CHARACTERIZING A MICROLITHOGRAPHIC MASK

OPTICAL SYSTEM, LITHOGRAPHY APPARATUS AND METHOD

DETECTION SYSTEM FOR X-RAY INSPECTION OF AN OBJECT

IMAGING OPTICAL ARRANGEMENT TO IMAGE AN OBJECT ILLUMINATED BY X-RAYS

OPTICAL DIFFRACTION COMPONENT

APPARATUS AND METHOD FOR CHARACTERIZING A MICROLITHOGRAPHIC MASK

OPTICAL DIFFRACTION COMPONENT FOR SUPPRESSING AT LEAST ONE TARGET W...

INSPECTION DEVICE FOR MASKS FOR SEMICONDUCTOR LITHOGRAPHY AND METHOD

OPTICAL DIFFRACTION COMPONENT FOR SUPPRESSING AT LEAST ONE TARGET W...

INSPECTION DEVICE FOR MASKS FOR SEMICONDUCTOR LITHOGRAPHY AND METHOD

MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

OPTICAL DEVICE

MICROLITHOGRAPHY PROJECTION OBJECTIVE

PROJECTION LENS WITH WAVEFRONT MANIPULATOR

METHOD FOR IMPROVING THE IMAGING PROPERTIES OF A PROJECTION OBJECTI...

OPTICAL ARRANGEMENT FOR THREE-DIMENSIONALLY PATTERNING A MATERIAL L...

MICROLITHOGRAPHY PROJECTION OBJECTIVE

MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

MICROLITHOGRAPHY PROJECTION OBJECTIVE

PROJECTION LENS WITH WAVEFRONT MANIPULATOR

ARRANGEMENT OF A MIRROR

OPTICAL DEVICE

METHOD FOR MASK INSPECTION, AND MASK INSPECTION INSTALLATION

Projection Exposure Apparatus for EUV Microlithography and Method f...

CHROMATICALLY CORRECTED OBJECTIVE WITH SPECIFICALLY STRUCTURED AND...

Mirror and Related EUV Systems and Methods

METHOD AND APPARATUS FOR ANALYZING AND/OR REPAIRING OF AN EUV MASK...

PROJECTION LENS SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE I...

ILLUMINATION SYSTEM AND PROJECTION OBJECTIVE OF A MASK INSPECTION A...