Helen H. Zhu

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Systems and methods for ultrahigh selective nitride etch
- Patent number 10,192,751
- Issue date Jan 29, 2019
- Lam Research Corporation
- Dengliang Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for achieving ultra-high selectivity while etching silicon n...
- Patent number 9,911,620
- Issue date Mar 6, 2018
- Lam Research Corporation
- Helen H. Zhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for selectively etching tungsten in a downstrea...
- Patent number 9,837,286
- Issue date Dec 5, 2017
- Lam Research Corporation
- Dengliang Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Contact clean in high-aspect ratio structures
- Patent number 9,558,928
- Issue date Jan 31, 2017
- Lam Research Corporation
- Bayu Thedjoisworo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sidewall forming processes
- Patent number 7,772,122
- Issue date Aug 10, 2010
- Lam Research Corporation
- Peter Cirigliano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Preventing damage to low-k materials during resist stripping
- Patent number 7,385,287
- Issue date Jun 10, 2008
- Lam Research Corporation
- Siyi Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of plasma etching low-k dielectric materials
- Patent number 7,311,852
- Issue date Dec 25, 2007
- Lam Research Corporation
- Si Yi Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for resist strip in presence of regular low k and/or porous...
- Patent number 7,288,488
- Issue date Oct 30, 2007
- Lam Research Corporation
- Helen Zhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Preventing damage to low-k materials during resist stripping
- Patent number 7,226,852
- Issue date Jun 5, 2007
- Lam Research Corporation
- Siyi Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nitrous oxide stripping process for organosilicate glass
- Patent number 7,202,177
- Issue date Apr 10, 2007
- Lam Research Corporation
- Helen Zhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective oxygen-free etching process for barrier materials
- Patent number 7,129,171
- Issue date Oct 31, 2006
- Lam Research Corporation
- Helen Zhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method providing an improved bi-layer photoresist pattern
- Patent number 7,049,052
- Issue date May 23, 2006
- Lam Research Corporation
- Hanzhong Xiao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of plasma etching silicon nitride
- Patent number 6,962,879
- Issue date Nov 8, 2005
- Lam Research Corporation
- Helen H. Zhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for the optimization of photo resist etching...
- Patent number 6,949,469
- Issue date Sep 27, 2005
- Lam Research Corporation
- Yu Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Line edge roughness reduction for trench etch
- Patent number 6,949,460
- Issue date Sep 27, 2005
- Lam Research Corporation
- Eric Wagganer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etch back process using nitrous oxide
- Patent number 6,916,697
- Issue date Jul 12, 2005
- Lam Research Corporation
- Helen Zhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Unique process chemistry for etching organic low-k materials
- Patent number 6,841,483
- Issue date Jan 11, 2005
- Lam Research Corporation
- Helen H. Zhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of plasma etching of silicon carbide
- Patent number 6,670,278
- Issue date Dec 30, 2003
- Lam Research Corporation
- Si Yi Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of plasma etching dielectric materials
- Patent number 6,297,163
- Issue date Oct 2, 2001
- Lam Research Corporation
- Helen Zhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for selective plasma etch
- Patent number 6,090,304
- Issue date Jul 18, 2000
- Lam Research Corporation
- Helen H. Zhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching of semiconductors
- Patent number 5,626,716
- Issue date May 6, 1997
- Lam Research Corporation
- William F. Bosch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching of semiconductors
- Patent number 5,611,888
- Issue date Mar 18, 1997
- Lam Research Corporation
- William F. Bosch
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
APPARATUS FOR ACHIEVING ULTRA-HIGH SELECTIVITY WHILE ETCHING SILICO...
- Publication number 20180158692
- Publication date Jun 7, 2018
- LAM RESEARCH CORPORATION
- Helen H. Zhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR ULTRAHIGH SELECTIVE NITRIDE ETCH
- Publication number 20170110335
- Publication date Apr 20, 2017
- LAM RESEARCH CORPORATION
- Dengliang Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR SELECTIVELY ETCHING TUNGSTEN IN A DOWNSTREA...
- Publication number 20170069511
- Publication date Mar 9, 2017
- LAM RESEARCH CORPORATION
- Dengliang Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR ACHIEVING ULTRA-HIGH SELECTIVITY WHILE ETCHING SILICON N...
- Publication number 20160247688
- Publication date Aug 25, 2016
- LAM RESEARCH CORPORATION
- Helen H. Zhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE NITRIDE ETCH
- Publication number 20160181116
- Publication date Jun 23, 2016
- LAM RESEARCH CORPORATION
- Ivan L. Berry
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CONTACT CLEAN IN HIGH-ASPECT RATIO STRUCTURES
- Publication number 20160064212
- Publication date Mar 3, 2016
- LAM RESEARCH CORPORATION
- Bayu Thedjoisworo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SIDEWALL FORMING PROCESSES
- Publication number 20100068885
- Publication date Mar 18, 2010
- LAM RESEARCH CORPORATION
- Peter CIRIGLIANO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ORGANIC ARC ETCH SELECTIVE FOR IMMERSION PHOTORESIST
- Publication number 20090311871
- Publication date Dec 17, 2009
- LAM RESEARCH CORPORATION
- Helen H. Zhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PREVENTING DAMAGE TO LOW-K MATERIALS DURING RESIST STRIPPING
- Publication number 20070287292
- Publication date Dec 13, 2007
- LAM RESEARCH CORPORATION
- Siyi LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for resist strip in presence of regular low k and/or porous...
- Publication number 20060258148
- Publication date Nov 16, 2006
- LAM RESEARCH CORPORATION
- Helen Zhu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method providing an improved bi-layer photoresist pattern
- Publication number 20060166145
- Publication date Jul 27, 2006
- Hanzhong Xiao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Line edge roughness reduction for trench etch
- Publication number 20050277289
- Publication date Dec 15, 2005
- Eric Wagganer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Line edge roughness reduction for trench etch
- Publication number 20050101126
- Publication date May 12, 2005
- Lam Research Corporation
- Eric Wagganer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Minimizing the loss of barrier materials during photoresist stripping
- Publication number 20050101135
- Publication date May 12, 2005
- LAM RESEARCH CORPORATION
- Rao Annapragada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ETCH BACK PROCESS USING NITROUS OXIDE
- Publication number 20050079704
- Publication date Apr 14, 2005
- LAM RESEARCH CORPORATION
- Helen Zhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Selective oxygen-free etching process for barrier materials
- Publication number 20050079725
- Publication date Apr 14, 2005
- LAM RESEARCH CORPORATION
- Helen Zhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Nitrous oxide stripping process for organosilicate glass
- Publication number 20050079710
- Publication date Apr 14, 2005
- LAM RESEARCH CORPORATION
- Helen Zhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method providing an improved bi-layer photoresist pattern
- Publication number 20040224264
- Publication date Nov 11, 2004
- Lam Research Corporation
- Hanzhong Xiao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Line edge roughness control
- Publication number 20040171260
- Publication date Sep 2, 2004
- Lam Research Corporation
- Youngjin Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of plasma etching low-k dielectric materials
- Publication number 20030024902
- Publication date Feb 6, 2003
- Si Yi Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of plasma etching silicon nitride
- Publication number 20020182880
- Publication date Dec 5, 2002
- Helen H. Zhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of plasma etching of silicon carbide
- Publication number 20020177322
- Publication date Nov 28, 2002
- Si Yi Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Unique process chemistry for etching organic low-k materials
- Publication number 20020111036
- Publication date Aug 15, 2002
- Lam Research Corporation
- Helen H. Zhu
- H01 - BASIC ELECTRIC ELEMENTS

Helen H. Zhu

Person

Patents Grantslast 30 patents

Systems and methods for ultrahigh selective nitride etch

Method for achieving ultra-high selectivity while etching silicon n...

Systems and methods for selectively etching tungsten in a downstrea...

Contact clean in high-aspect ratio structures

Sidewall forming processes

Preventing damage to low-k materials during resist stripping

Method of plasma etching low-k dielectric materials

Method for resist strip in presence of regular low k and/or porous...

Preventing damage to low-k materials during resist stripping

Nitrous oxide stripping process for organosilicate glass

Selective oxygen-free etching process for barrier materials

Method providing an improved bi-layer photoresist pattern

Method of plasma etching silicon nitride

Methods and apparatus for the optimization of photo resist etching...

Line edge roughness reduction for trench etch

Etch back process using nitrous oxide

Unique process chemistry for etching organic low-k materials

Method of plasma etching of silicon carbide

Method of plasma etching dielectric materials

Methods for selective plasma etch

Plasma etching of semiconductors

Plasma etching of semiconductors

Patents Applicationslast 30 patents

APPARATUS FOR ACHIEVING ULTRA-HIGH SELECTIVITY WHILE ETCHING SILICO...

SYSTEMS AND METHODS FOR ULTRAHIGH SELECTIVE NITRIDE ETCH

SYSTEMS AND METHODS FOR SELECTIVELY ETCHING TUNGSTEN IN A DOWNSTREA...

METHOD FOR ACHIEVING ULTRA-HIGH SELECTIVITY WHILE ETCHING SILICON N...

SELECTIVE NITRIDE ETCH

CONTACT CLEAN IN HIGH-ASPECT RATIO STRUCTURES

SIDEWALL FORMING PROCESSES

ORGANIC ARC ETCH SELECTIVE FOR IMMERSION PHOTORESIST

PREVENTING DAMAGE TO LOW-K MATERIALS DURING RESIST STRIPPING

Method for resist strip in presence of regular low k and/or porous...

Method providing an improved bi-layer photoresist pattern

Line edge roughness reduction for trench etch

Line edge roughness reduction for trench etch

Minimizing the loss of barrier materials during photoresist stripping

ETCH BACK PROCESS USING NITROUS OXIDE

Selective oxygen-free etching process for barrier materials

Nitrous oxide stripping process for organosilicate glass

Method providing an improved bi-layer photoresist pattern

Line edge roughness control

Method of plasma etching low-k dielectric materials

Method of plasma etching silicon nitride

Method of plasma etching of silicon carbide

Unique process chemistry for etching organic low-k materials