Hellmut Ahne

Person

Roettenbach, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Photoresists which are suitable for producing sub-micron size struc...
- Patent number 6,110,637
- Issue date Aug 29, 2000
- Siemens Aktinegesellschaft
- Recai Sezi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Preparation of poly-o-hydroxyamides and poly o-mercaptoamides
- Patent number 5,973,202
- Issue date Oct 26, 1999
- Siemens Aktiengesellschaft
- Recai Sezi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Preparation of poly-o-hydroxyamides and poly o-mercaptoamides
- Patent number 5,922,825
- Issue date Jul 13, 1999
- Siemens Aktiengesellschaft
- Recai Sezi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Synthesis of polybenzoxasole and polybenzothiazole precursors
- Patent number 5,883,221
- Issue date Mar 16, 1999
- Siemens Aktiengesellschaft
- Recai Sezi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Preparation of poly-O-hydroxyamides and poly O-mercaptoamides
- Patent number 5,807,969
- Issue date Sep 15, 1998
- Siemens Aktiengesellschaft
- Recai Sezi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Preparation of poly-O-hydroxyamides and poly O-mercaptoamides
- Patent number 5,783,654
- Issue date Jul 21, 1998
- Siemens Aktiengesellschaft
- Recai Sezi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for the production of poly-o-hydroxyamides
- Patent number 5,777,066
- Issue date Jul 7, 1998
- Siemens Aktiengesellschaft
- Recai Sezi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Preparation of poly-o-hydroxyamides and poly-o-mercaptoamides
- Patent number 5,760,162
- Issue date Jun 2, 1998
- Siemens Aktiengesellschaft
- Recai Sezi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Dicarboxylic acid derivatives
- Patent number 5,750,711
- Issue date May 12, 1998
- Siemens Aktiengesellschaft
- Racai Sezi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Method for the production of poly-o-hydroxyamides
- Patent number 5,750,638
- Issue date May 12, 1998
- Siemens Aktiengesesllschaft
- Recai Sezi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Dry-developable positive resist
- Patent number 5,733,706
- Issue date Mar 31, 1998
- Siemens Aktiengesellschaft
- Recai Sezi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Preparation of poly-o-hydroxyamides and poly o-mercaptoamides
- Patent number 5,726,279
- Issue date Mar 10, 1998
- Siemens Aktiengesellschaft
- Recai Sezi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Mixed polymers
- Patent number 5,703,186
- Issue date Dec 30, 1997
- Siemens Aktiengesellschaft
- Recai Sezi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Preparation of poly-o-hydroxyamides and poly-o-mercaptoamides
- Patent number 5,696,218
- Issue date Dec 9, 1997
- Siemens Aktiengesellschaft
- Recai Sezi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Methods for producing polybenzoxazol precursors and corresponding r...
- Patent number 5,688,631
- Issue date Nov 18, 1997
- Siemens Aktiengesellschaft
- Recai Sezi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Copolymers
- Patent number 5,616,667
- Issue date Apr 1, 1997
- Siemens Aktiengesellschaft
- Recai Sezi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Connection and build-up technique for multichip modules
- Patent number 5,556,812
- Issue date Sep 17, 1996
- Siemens Aktiengesellschaft
- Rainer Leuschner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Production of photolithographic structures
- Patent number 5,384,220
- Issue date Jan 24, 1995
- Siemens Aktiengesellschaft
- Recai Sezi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Highly heat-resistant positive resists comprising end-capped hydrox...
- Patent number 5,376,499
- Issue date Dec 27, 1994
- Siemens Aktiengesellschaft
- Albert Hammerschmidt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phenylquinoxaline copolymers
- Patent number 5,278,277
- Issue date Jan 11, 1994
- Siemens Aktiengesellschaft
- Hellmut Ahne
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method of dry development utilizing quinone diazide and basic polym...
- Patent number 5,275,920
- Issue date Jan 4, 1994
- Siemens Aktiengesellschaft
- Recai Sezi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for producing a resist structure
- Patent number 5,262,283
- Issue date Nov 16, 1993
- Siemens Aktiengesellschaft
- Recai Sezi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photostructuring process
- Patent number 5,250,375
- Issue date Oct 5, 1993
- Siemens Aktiengesellschaft
- Michael Sebald
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for dimensionally accurate structure transfer in bilayer tec...
- Patent number 5,234,793
- Issue date Aug 10, 1993
- Siemens Aktiengesellschaft
- Michael Sebald
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photostructuring method
- Patent number 5,234,794
- Issue date Aug 10, 1993
- Siemens Aktiengesellschaft
- Michael Sebald
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for producing a resist structure
- Patent number 5,229,258
- Issue date Jul 20, 1993
- Siemens Aktiengesellschaft
- Recai Sezi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for producing N-tertiary butoxycarbonyl-maleinimide
- Patent number 5,194,629
- Issue date Mar 16, 1993
- Siemens Aktiengesellschaft
- Eberhard Kuehn
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Etch-resistant deep ultraviolet resist process having an aromatic t...
- Patent number 5,173,393
- Issue date Dec 22, 1992
- Siemens Aktiengesellschaft
- Recai Sezi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Preparation of hydroxypolyamides
- Patent number 5,147,961
- Issue date Sep 15, 1992
- Siemens Aktiengesellschaft
- Hellmut Ahne
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Preparing highly thermoresistant relief structures
- Patent number 5,104,773
- Issue date Apr 14, 1992
- Siemens Aktiengesellschaft
- Hellmut Ahne
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Hellmut Ahne

Person

Patents Grantslast 30 patents

Photoresists which are suitable for producing sub-micron size struc...

Preparation of poly-o-hydroxyamides and poly o-mercaptoamides

Preparation of poly-o-hydroxyamides and poly o-mercaptoamides

Synthesis of polybenzoxasole and polybenzothiazole precursors

Preparation of poly-O-hydroxyamides and poly O-mercaptoamides

Preparation of poly-O-hydroxyamides and poly O-mercaptoamides

Method for the production of poly-o-hydroxyamides

Preparation of poly-o-hydroxyamides and poly-o-mercaptoamides

Dicarboxylic acid derivatives

Method for the production of poly-o-hydroxyamides

Dry-developable positive resist

Preparation of poly-o-hydroxyamides and poly o-mercaptoamides

Mixed polymers

Preparation of poly-o-hydroxyamides and poly-o-mercaptoamides

Methods for producing polybenzoxazol precursors and corresponding r...

Copolymers

Connection and build-up technique for multichip modules

Production of photolithographic structures

Highly heat-resistant positive resists comprising end-capped hydrox...

Phenylquinoxaline copolymers

Method of dry development utilizing quinone diazide and basic polym...

Method for producing a resist structure

Photostructuring process

Method for dimensionally accurate structure transfer in bilayer tec...

Photostructuring method

Method for producing a resist structure

Process for producing N-tertiary butoxycarbonyl-maleinimide

Etch-resistant deep ultraviolet resist process having an aromatic t...

Preparation of hydroxypolyamides

Preparing highly thermoresistant relief structures