Henning Haffner

Person

Dresden, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Method of inspecting a mask or reticle for detecting a defect, and...
- Patent number 7,221,788
- Issue date May 22, 2007
- Infineon Technologies AG
- Steffen Schulze
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for communicating a measuring position of a structural eleme...
- Patent number 7,124,379
- Issue date Oct 17, 2006
- Infineon Technologies AG
- Bettine Buechner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask for projecting a structure pattern onto a semiconductor substrate
- Patent number 7,056,628
- Issue date Jun 6, 2006
- Infineon Technologies AG
- Shahid Butt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure mask with repaired dummy structure and method of repairing...
- Patent number 6,756,164
- Issue date Jun 29, 2004
- Infineon Technologies AG
- Torsten Franke
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Generating mask layout data for simulation of lithographic processes
- Patent number 6,631,511
- Issue date Oct 7, 2003
- Infineon Technologies AG
- Henning Haffner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor device fabrication using a photomask designed using m...
- Patent number 6,571,383
- Issue date May 27, 2003
- Infineon Technologies, AG
- Shahid Butt
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
Method and device for control of the data flow on application of re...
- Publication number 20050090925
- Publication date Apr 28, 2005
- Infineon Technologies AG
- Thomas Albrecht
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of inspecting a mask or reticle for detecting a defect, and...
- Publication number 20050002554
- Publication date Jan 6, 2005
- Steffen Schulze
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Mask for projecting a structure pattern onto a semiconductor substrate
- Publication number 20040131950
- Publication date Jul 8, 2004
- Shahid Butt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for communicating a measuring position of a structural eleme...
- Publication number 20040128643
- Publication date Jul 1, 2004
- Bettine Buechner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure mask with repaired dummy structure and method of repairing...
- Publication number 20030003377
- Publication date Jan 2, 2003
- Torsten Franke
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optical proximity correction (OPC) using automated shape and edge p...
- Publication number 20020138810
- Publication date Sep 26, 2002
- Mark A. Lavin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Generating mask layout data for simulation of lithographic processes
- Publication number 20020083408
- Publication date Jun 27, 2002
- Henning Haffner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Henning Haffner

Person

Patents Grantslast 30 patents

Method of inspecting a mask or reticle for detecting a defect, and...

Method for communicating a measuring position of a structural eleme...

Mask for projecting a structure pattern onto a semiconductor substrate

Exposure mask with repaired dummy structure and method of repairing...

Generating mask layout data for simulation of lithographic processes

Semiconductor device fabrication using a photomask designed using m...

Patents Applicationslast 30 patents

Method and device for control of the data flow on application of re...

Method of inspecting a mask or reticle for detecting a defect, and...

Mask for projecting a structure pattern onto a semiconductor substrate

Method for communicating a measuring position of a structural eleme...

Exposure mask with repaired dummy structure and method of repairing...

Optical proximity correction (OPC) using automated shape and edge p...

Generating mask layout data for simulation of lithographic processes