Smith et al., “Investigation of OPC and Non-Uniformities on the Performance of Resistivity and Linewidth Measurements,” Proc. IEEE 1999 Int. Conf. on Microelectronic Test Structures, vol. 12, pp. 161-166.* |
Kotani et al., “High accurate process proximity correction based on empirical model for 0.18μm generation and beyond,” Microprocesses and Nanotechnology Conference, Jun. 1999, pp. 94-95.* |
Garofalo et al., “Automatic Proximity Correction for 0.35μm I-line Phtolithography,” NUPAD 1994 IEEE, pp. 92-94.* |
Avanticorp.com;; Taurus-OPC, Optical Proximity Correction; Sep. 29, 1999 10 pages; www.avanticorp.com/Avanti/SolutionsProducts/Products/Item/,1172,33,00.html. |
Chang-Nam Ahn, et al.; “A novel approximate mode for resist process”, Optical Microlithography X, Santa Clara, CA Feb. 27, 1998, Proceedings of the SPIE - The International Society for Optical Engineering, 1998, SPIE-INT. SOC. OPT. ENG. USA, pp. 752-763. |
Zhao, J, et al.; “Applications of enchanced optical proximity correction models”, Optical Microlithography XI, Santa Clara, CA Feb. 27, 1998, Proceedings of the SPIE - The International Society for Optical Engineering, 1998, SPIE-INT. SOC. OPT. ENG. USA, pp. 234-244. |
Dolainsky, C, et al.; “Evaluation of resist models for fast optical proximity correction”, 17th Annual Symposium on Photomask Technology and Management, Redwood City, CA Sep. 19, 1997; Proceedings of the SPIE - The International Society for Optical Engineering, 1998, SPIE-INT. SOC. OPT. ENG., USA, pp.202-207. |
Jungmann, A., et al.; “Benchmarking of software tools for optical proximity correction”, Microlithography XI, Santa Clara, CA Feb. 27, 1998, Proceedings of the SPIE - The International Society for Optical Engineering, 1998, SPIE-INT, SOC. OPT. ENG. USA, pp. 921-931. |